KR970030868A - 고체촬상소자 및 그 제조방법 - Google Patents
고체촬상소자 및 그 제조방법 Download PDFInfo
- Publication number
- KR970030868A KR970030868A KR1019950044907A KR19950044907A KR970030868A KR 970030868 A KR970030868 A KR 970030868A KR 1019950044907 A KR1019950044907 A KR 1019950044907A KR 19950044907 A KR19950044907 A KR 19950044907A KR 970030868 A KR970030868 A KR 970030868A
- Authority
- KR
- South Korea
- Prior art keywords
- photodiode
- solid state
- transfer
- image pickup
- pickup device
- Prior art date
Links
- 239000007787 solid Substances 0.000 title claims abstract description 7
- 238000003384 imaging method Methods 0.000 title claims 2
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 206010034960 Photophobia Diseases 0.000 claims abstract 2
- 208000013469 light sensitivity Diseases 0.000 claims abstract 2
- 239000012535 impurity Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
고체촬상소자 및 그 제조방법에 대해 기재되어 있다. 이는, 제1광다이오드와 제1광다이오드 보다 전위 우물이 깊고 광감도가 낮은 제2광다이오드로 구성되는 수광부 및 제1광다이오드에 축적되는 전하를 전송소자로 전달하는 제1전달게이트와 제2광다이오드에 축척되는 전하를 전송소자로 전달하는 제2전달게이트로 구성되는 전달부를 포함하는 것을 특징으로 한다. 따라서, 넓은 다이나믹 범위를 가질 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 본 발명에 의한 고체촬상소자의 수광부 및 전달부를 개략적으로 도시한 평면도이다.
Claims (4)
- 제1광다이오드와 상기 제1광다이오드 보다 전위 우물이 깊고 광감도가 낮은 제2광다이오드로 구성되는 수광부; 및 상기 제1광다이오드에 축적되는 전하를 전송소자로 전달하는 제1전달게이트와 상기 제2광다이오드에 축적되는 전하를 전송소자로 전달하는 제2전달게이트로 구성되는 전달부를 포함하는 것을 특징으로 하는 고체촬상소자.
- 제1항에 있어서, 상기 제2광다이오드에 도핑되어 있는 불순물이온의 농도는 상기 제1광다이오드에 도핑되어 있는 불순물이온의 농도보다 높은 것을 특징으로 하는 고체촬상소자.
- 제1항에 있어서, 상기 제2광다이오드는 상기 제1광다이오드 보다 작은 것을 특징으로 하는 고체촬상소자.
- 제1항에 있어서, 그 촛점이 상기 제1광다이오드에 맞춰지도록 형성된 마이크로 렌즈를 더 포함하는 것을 특징으로 하는 고체촬상소자.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950044907A KR0183761B1 (ko) | 1995-11-29 | 1995-11-29 | 고체촬상소자 및 그 제조방법 |
JP8316407A JPH09181976A (ja) | 1995-11-29 | 1996-11-27 | 固体撮像素子 |
US08/758,045 US5714753A (en) | 1995-11-29 | 1996-11-27 | Solid state imaging device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950044907A KR0183761B1 (ko) | 1995-11-29 | 1995-11-29 | 고체촬상소자 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970030868A true KR970030868A (ko) | 1997-06-26 |
KR0183761B1 KR0183761B1 (ko) | 1999-03-20 |
Family
ID=19436549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950044907A KR0183761B1 (ko) | 1995-11-29 | 1995-11-29 | 고체촬상소자 및 그 제조방법 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5714753A (ko) |
JP (1) | JPH09181976A (ko) |
KR (1) | KR0183761B1 (ko) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3440722B2 (ja) * | 1996-09-20 | 2003-08-25 | ソニー株式会社 | 固体撮像装置およびその駆動方法並びにカメラ |
US6815791B1 (en) * | 1997-02-10 | 2004-11-09 | Fillfactory | Buried, fully depletable, high fill factor photodiodes |
US7199410B2 (en) * | 1999-12-14 | 2007-04-03 | Cypress Semiconductor Corporation (Belgium) Bvba | Pixel structure with improved charge transfer |
US6972794B1 (en) * | 1999-06-15 | 2005-12-06 | Micron Technology, Inc. | Dual sensitivity image sensor |
US6809768B1 (en) * | 2000-02-14 | 2004-10-26 | Foveon, Inc. | Double slope pixel sensor and array |
US7623168B2 (en) * | 2000-07-13 | 2009-11-24 | Eastman Kodak Company | Method and apparatus to extend the effective dynamic range of an image sensing device |
US6909461B1 (en) * | 2000-07-13 | 2005-06-21 | Eastman Kodak Company | Method and apparatus to extend the effective dynamic range of an image sensing device |
JP4050906B2 (ja) * | 2002-01-25 | 2008-02-20 | 富士フイルム株式会社 | 固体撮像装置 |
US6777661B2 (en) * | 2002-03-15 | 2004-08-17 | Eastman Kodak Company | Interlined charge-coupled device having an extended dynamic range |
JP2004048561A (ja) * | 2002-07-15 | 2004-02-12 | Fuji Photo Film Co Ltd | 撮像装置及び測光装置 |
US7489352B2 (en) * | 2002-11-15 | 2009-02-10 | Micron Technology, Inc. | Wide dynamic range pinned photodiode active pixel sensor (APS) |
JP4264251B2 (ja) * | 2002-12-09 | 2009-05-13 | 富士フイルム株式会社 | 固体撮像装置とその動作方法 |
JP4051701B2 (ja) * | 2003-01-17 | 2008-02-27 | 富士フイルム株式会社 | 固体撮像素子の欠陥画素補正方法及び撮影装置 |
US7430011B2 (en) * | 2003-01-22 | 2008-09-30 | Omnivision Technologies, Inc. | Image sensor having dual automatic exposure control |
JP4307862B2 (ja) * | 2003-02-05 | 2009-08-05 | 富士フイルム株式会社 | 信号処理方法、信号処理回路、及び撮像装置 |
US7808022B1 (en) | 2005-03-28 | 2010-10-05 | Cypress Semiconductor Corporation | Cross talk reduction |
US7750958B1 (en) | 2005-03-28 | 2010-07-06 | Cypress Semiconductor Corporation | Pixel structure |
DE102005049228B4 (de) * | 2005-10-14 | 2014-03-27 | Siemens Aktiengesellschaft | Detektor mit einem Array von Photodioden |
WO2007083704A1 (ja) * | 2006-01-18 | 2007-07-26 | National University Corporation Shizuoka University | 固体撮像装置及びその画素信号の読みだし方法 |
US20070285547A1 (en) * | 2006-05-30 | 2007-12-13 | Milligan Edward S | CMOS image sensor array optimization for both bright and low light conditions |
US7825966B2 (en) * | 2007-06-29 | 2010-11-02 | Omnivision Technologies, Inc. | High dynamic range sensor with blooming drain |
JP4954905B2 (ja) * | 2008-01-15 | 2012-06-20 | 富士フイルム株式会社 | 固体撮像装置とその動作方法 |
US8476567B2 (en) | 2008-09-22 | 2013-07-02 | Semiconductor Components Industries, Llc | Active pixel with precharging circuit |
GB201011640D0 (en) * | 2010-07-12 | 2010-08-25 | Univ Sheffield | Radiation detection and method |
GB201102478D0 (en) | 2011-02-11 | 2011-03-30 | Isdi Ltd | Radiation detector and method |
GB2525625B (en) | 2014-04-29 | 2017-05-31 | Isdi Ltd | Device and method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5648654A (en) * | 1995-12-21 | 1997-07-15 | General Electric Company | Flat panel imaging device with patterned common electrode |
-
1995
- 1995-11-29 KR KR1019950044907A patent/KR0183761B1/ko not_active IP Right Cessation
-
1996
- 1996-11-27 JP JP8316407A patent/JPH09181976A/ja active Pending
- 1996-11-27 US US08/758,045 patent/US5714753A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5714753A (en) | 1998-02-03 |
JPH09181976A (ja) | 1997-07-11 |
KR0183761B1 (ko) | 1999-03-20 |
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