KR970008325A - 진공실을 급속히 진공시키기 위한 장치 - Google Patents

진공실을 급속히 진공시키기 위한 장치 Download PDF

Info

Publication number
KR970008325A
KR970008325A KR1019960027015A KR19960027015A KR970008325A KR 970008325 A KR970008325 A KR 970008325A KR 1019960027015 A KR1019960027015 A KR 1019960027015A KR 19960027015 A KR19960027015 A KR 19960027015A KR 970008325 A KR970008325 A KR 970008325A
Authority
KR
South Korea
Prior art keywords
pump
vacuum chamber
check valve
vacuum
rapidly evacuating
Prior art date
Application number
KR1019960027015A
Other languages
English (en)
Other versions
KR100221782B1 (ko
Inventor
게베레 토마스
부쉬벡크 볼프강
Original Assignee
페. 좀머캄프ㆍ에, 듀테
발처스 운트 레이볼트 도이칠란트 홀딩 악티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7766147&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR970008325(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 페. 좀머캄프ㆍ에, 듀테, 발처스 운트 레이볼트 도이칠란트 홀딩 악티엔게젤샤프트 filed Critical 페. 좀머캄프ㆍ에, 듀테
Publication of KR970008325A publication Critical patent/KR970008325A/ko
Application granted granted Critical
Publication of KR100221782B1 publication Critical patent/KR100221782B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/08—Preparation of the foundation plate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/007—Installations or systems with two or more pumps or pump cylinders, wherein the flow-path through the stages can be changed, e.g. from series to parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Jet Pumps And Other Pumps (AREA)

Abstract

제1진공펌프(14), 바람직하게는 송풍펌프와, 이 제1펌프(14)의 흡입측을 진공실(5)과 연결시키고 제1첵크밸브(16)와 연결된 흡입연결편과, 결합관(20)에 의해 제1펌프(14)와 연결된 제2진공펌프(15)와, 결합관(20)과 연결된 송출나비밸브(17)로 구성된 진공실(5)의 급속진공화를 위한 장치에는, 제2펌프(15)의 흡수측에 연결되고 제2첵크 밸브(13)가 중간에 연결되고 진공챔버(5)와 연결되어 있는 보조관(19)과, 결합관(20)에 연결된 제3첵크밸브(12)가 구비된다.

Description

진공실을 급속히 진공시키기 위한 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 직렬 및 병렬식 접속이 가능한 펌프를 갖춘 본 발명에 따르는 장치의 도면.

Claims (1)

  1. 제1진공펌프(14), 바람직하게는 송풍펌프와, 이 제1펌프(14)의 흡입측을 진공실(5)과 연결시키고 제1첵크밸브(16)와 연결된 흡입연결편과, 결합관(20)에 의해 제1펌프(14)와 연결된 제2진공펌프(15)와, 결합관(20)과 연결된 송출나비밸브(17)로 구성된 진공실(5)의 급속진공화를 위한 장치에 있어서, 제2펌프(15)의 흡수측에 연결되고 제2첵크밸브(13)가 중간에 연결되고 진공챔버(5)와 연결되어 있는 보조관(19)과, 결합관(20)에 연결된 제3첵크밸브(12)로 구성된 것을 특징으로 하는 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960027015A 1995-07-06 1996-07-04 진공실을 급속히 진공시키기 위한 장치 KR100221782B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19524609.8 1995-07-06
DE19524609A DE19524609A1 (de) 1995-07-06 1995-07-06 Vorrichtung zum raschen Evakuieren einer Vakuumkammer

Publications (2)

Publication Number Publication Date
KR970008325A true KR970008325A (ko) 1997-02-24
KR100221782B1 KR100221782B1 (ko) 1999-10-01

Family

ID=7766147

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960027015A KR100221782B1 (ko) 1995-07-06 1996-07-04 진공실을 급속히 진공시키기 위한 장치

Country Status (6)

Country Link
US (1) US6004109A (ko)
EP (1) EP0752531B2 (ko)
JP (1) JP3822675B2 (ko)
KR (1) KR100221782B1 (ko)
DE (2) DE19524609A1 (ko)
ES (1) ES2124052T5 (ko)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19831123A1 (de) * 1998-07-11 2000-01-13 Pfeiffer Vacuum Gmbh Gasballasteinrichtung für mehrstufige Verdrängerpumpen
DE19929519A1 (de) * 1999-06-28 2001-01-04 Pfeiffer Vacuum Gmbh Verfahren zum Betrieb einer Mehrkammer-Vakuumanlage
DE19962445A1 (de) * 1999-12-22 2001-06-28 Leybold Vakuum Gmbh Trockenverdichtende Vakuumpumpe mit Gasballasteinrichtung
RO118309B1 (ro) * 2000-07-04 2003-04-30 Adrian Bodea Instalatie de vid pentru tratarea otelului
DE10144210A1 (de) * 2001-09-08 2003-03-27 Sgi Prozess Technik Gmbh Pumpensystem
US6589023B2 (en) 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
SE0201335L (sv) * 2002-05-03 2003-03-25 Piab Ab Vakuumpump och sätt att tillhandahålla undertryck
GB0214273D0 (en) * 2002-06-20 2002-07-31 Boc Group Plc Apparatus for controlling the pressure in a process chamber and method of operating same
GB0401396D0 (en) * 2004-01-22 2004-02-25 Boc Group Plc Pressure control method
JP4633370B2 (ja) * 2004-02-17 2011-02-16 財団法人国際科学振興財団 真空装置
JP4931793B2 (ja) * 2004-03-05 2012-05-16 オイ コーポレイション 質量分析計の焦点面検出器アセンブリ
DE102004059486A1 (de) * 2004-12-10 2006-06-22 Leybold Vacuum Gmbh Vakuum-Anlage
FR2883934B1 (fr) * 2005-04-05 2010-08-20 Cit Alcatel Pompage rapide d'enceinte avec limitation d'energie
KR100730323B1 (ko) 2007-03-15 2007-06-19 한국뉴매틱(주) 필터 카트리지를 이용한 진공 시스템
DE102007060174A1 (de) * 2007-12-13 2009-06-25 Oerlikon Leybold Vacuum Gmbh Vakuumpumpe sowie Verfahren zum Betreiben einer Vakuumpumpe
US8042566B2 (en) * 2008-07-23 2011-10-25 Atmel Corporation Ex-situ component recovery
BR112012018803B1 (pt) * 2009-12-24 2021-09-28 Sumitomo Seika Chemicals Co., Ltd. Aparelho de bomba de vácuo dupla e sistema de purificação de gás
GB201007814D0 (en) * 2010-05-11 2010-06-23 Edwards Ltd Vacuum pumping system
FR2967219B1 (fr) * 2010-11-05 2012-12-07 Centre Nat Rech Scient Installation de pompage pour l'obtention d'un vide pousse et procede de pompage mettant en oeuvre une telle installation
DE102011015464B4 (de) * 2010-11-30 2012-09-06 Von Ardenne Anlagentechnik Gmbh Vakuumpumpeinrichtung und -verfahren für staubhaltige Gase
CH706231B1 (fr) 2012-03-05 2016-07-29 Ateliers Busch Sa Installation de pompage et procédé de contrôle d'une telle installation.
KR101995358B1 (ko) 2012-06-28 2019-07-02 스털링 인더스트리 컨설트 게엠베하 챔버를 배기시키기 위한 방법 및 펌프 장치
DE102013108090A1 (de) * 2013-07-29 2015-01-29 Hella Kgaa Hueck & Co. Pumpenanordnung
DE102013219464A1 (de) * 2013-09-26 2015-03-26 Inficon Gmbh Evakuierung einer Folienkammer
DE102013223556A1 (de) * 2013-11-19 2015-05-21 Oerlikon Leybold Vacuum Gmbh Vakuumpumpen-System sowie Verfahren zum Betreiben eines Vakuumpumpen-Systems
FR3017425A1 (fr) * 2014-02-12 2015-08-14 Adixen Vacuum Products Systeme de pompage et procede de descente en pression dans un sas de chargement et de dechargement
KR101505505B1 (ko) 2014-03-24 2015-03-24 주식회사 누리텍 유기 랭킨 사이클용 유기용매 공급장치
AT14171U1 (de) * 2014-04-15 2015-05-15 Tropper Maschinen Und Anlagen Gmbh Fahrzeug, insbesondere zur Futteraufbereitung
CN104863857B (zh) * 2015-04-15 2017-02-22 武汉新芯集成电路制造有限公司 一种抽气泵的抽气系统及抽气泵
DE202016007609U1 (de) 2016-12-15 2018-03-26 Leybold Gmbh Vakuumpumpsystem
US11460034B2 (en) * 2018-11-15 2022-10-04 Flowserve Management Company Apparatus and method for evacuating very large volumes
GB2579360A (en) 2018-11-28 2020-06-24 Edwards Ltd Multiple chamber vacuum exhaust system
US11815095B2 (en) * 2019-01-10 2023-11-14 Elival Co., Ltd Power saving vacuuming pump system based on complete-bearing-sealing and dry-large-pressure-difference root vacuuming root pumps
US11492020B2 (en) 2020-05-05 2022-11-08 Flowserve Management Company Method of intelligently managing pressure within an evacuated transportation system

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2652188A (en) * 1948-07-08 1953-09-15 Cyr Rob Roy Automatic tank pump down
DE1024668B (de) * 1955-08-31 1958-02-20 Erwin Lothar Holland Merten Mehrstufige Hochvakuumpumpe
DE1114981B (de) * 1960-06-29 1961-10-12 Leybolds Nachfolger E Verfahren zur Evakuierung von Behaeltern, welche dampffoermige Bestandteile neben Permanentgasen enthalten, und Vorrichtung zur Durchfuehrung des Verfahrens
DD96304A1 (ko) * 1972-02-29 1973-03-12
DE2462187A1 (de) * 1974-06-24 1976-09-02 Siemens Ag Fluessigkeitsring-vakuumpumpe mit vorgeschaltetem seitenkanal-ringverdichter
DD118144B1 (de) * 1975-05-07 1988-11-30 Lothar Reissmueller Verfahren und einrichtung zur schnellen evakuierung kleiner behaelter
US4505647A (en) * 1978-01-26 1985-03-19 Grumman Allied Industries, Inc. Vacuum pumping system
DD200534A1 (de) * 1981-08-10 1983-05-11 Siegfried Panzer Verfahren zur periodischen evakuierung eines rezipienten
DE3573152D1 (en) * 1984-04-11 1989-10-26 Hitachi Ltd Screw type vacuum pump
DE3639512A1 (de) * 1986-11-20 1988-06-01 Alcatel Hochvakuumtechnik Gmbh Vakuumpumpsystem mit einer waelzkolbenpumpe
US4850806A (en) * 1988-05-24 1989-07-25 The Boc Group, Inc. Controlled by-pass for a booster pump
FR2640697B1 (fr) * 1988-12-16 1993-01-08 Cit Alcatel Ensemble de pompage pour l'obtention de vides eleves
JPH076496B2 (ja) * 1990-01-19 1995-01-30 日東工器株式会社 真空ポンプにおける吸引系切換装置
JPH04326943A (ja) * 1991-04-25 1992-11-16 Hitachi Ltd 真空排気システム及び排気方法
DE4136950A1 (de) * 1991-11-11 1993-05-13 Pfeiffer Vakuumtechnik Mehrstufiges vakuumpumpsystem
DE4213763B4 (de) * 1992-04-27 2004-11-25 Unaxis Deutschland Holding Gmbh Verfahren zum Evakuieren einer Vakuumkammer und einer Hochvakuumkammer sowie Hochvakuumanlage zu seiner Durchführung
DE19500823A1 (de) * 1995-01-13 1996-07-18 Sgi Prozess Technik Gmbh Vakuum-Pumpstand

Also Published As

Publication number Publication date
JP3822675B2 (ja) 2006-09-20
DE19524609A1 (de) 1997-01-09
ES2124052T3 (es) 1999-01-16
EP0752531B2 (de) 2003-06-18
ES2124052T5 (es) 2004-03-16
US6004109A (en) 1999-12-21
EP0752531B1 (de) 1998-11-04
EP0752531A1 (de) 1997-01-08
JPH0925876A (ja) 1997-01-28
KR100221782B1 (ko) 1999-10-01
DE59600761D1 (de) 1998-12-10

Similar Documents

Publication Publication Date Title
KR970008325A (ko) 진공실을 급속히 진공시키기 위한 장치
ATE86364T1 (de) Zweistufige trockenprimaerpumpe.
DE60200493D1 (de) Zweistufige Vakuumpumpe
ES2078708T3 (es) Detector de fuga de helio.
SE9002510D0 (sv) Apparatur for controlled delivery of liquids
ES2179985T3 (es) Vasija de lecho radial para adsorcion con oscilacion de presion/vacio.
KR920000549A (ko) 에어백
SE8306573L (sv) Anordning for avluftning av en vetska
TR199700221T1 (xx) Bir ak�tma cihaz�.
ES2073261T3 (es) Detector de fuga de gas trazador.
ES2148888T3 (es) Disposicion para succionar liquidos.
PE20020825A1 (es) Aparato de compresion
DE50114542D1 (de) Vakuumerzeugervorrichtung
ATE246315T1 (de) Vakuumpumpe
IT1298428B1 (it) Procedimento ed apparecchiatura per la sterilizzazione a vapore in particolare per usi odontoiatrici
ATE272477T1 (de) Saug- und austraggerät für eine spülflüssigkeit
KR920021911A (ko) 냉매 수송용 호스
FR2785361B1 (fr) Transport de gaz pompes dans une pompe a vide ou des canalisations
RU95121656A (ru) Стабилизированное устройство вакуумирования для промышленных многостеллажных сушилок кожи
WO1999048614A3 (en) A suction system for sucking a mixture of air and solid and/or liquid matter into a container
KR970071997A (ko) 진공계를 구비한 진공 장치
AU2108395A (en) Device for protecting a vacuum pump from evacuated liquids
KR900005075A (ko) 배기 특성을 개량한 다단 진공 펌프 장치
KR970063448A (ko) 저압 공정용 펌핑 라인
KR940008563A (ko) 기포발생기

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20070518

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee