KR960035590U - 웨이퍼 노광용 스테이지의 접동면 클리닝장치 - Google Patents

웨이퍼 노광용 스테이지의 접동면 클리닝장치

Info

Publication number
KR960035590U
KR960035590U KR2019950007909U KR19950007909U KR960035590U KR 960035590 U KR960035590 U KR 960035590U KR 2019950007909 U KR2019950007909 U KR 2019950007909U KR 19950007909 U KR19950007909 U KR 19950007909U KR 960035590 U KR960035590 U KR 960035590U
Authority
KR
South Korea
Prior art keywords
cleaning device
exposure stage
stage cleaning
wafer exposure
wafer
Prior art date
Application number
KR2019950007909U
Other languages
English (en)
Other versions
KR200190472Y1 (ko
Inventor
김규인
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019950007909U priority Critical patent/KR200190472Y1/ko
Publication of KR960035590U publication Critical patent/KR960035590U/ko
Application granted granted Critical
Publication of KR200190472Y1 publication Critical patent/KR200190472Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR2019950007909U 1995-04-18 1995-04-18 웨이퍼 노광용 스테이지의 접동면 클리닝장치 KR200190472Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950007909U KR200190472Y1 (ko) 1995-04-18 1995-04-18 웨이퍼 노광용 스테이지의 접동면 클리닝장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950007909U KR200190472Y1 (ko) 1995-04-18 1995-04-18 웨이퍼 노광용 스테이지의 접동면 클리닝장치

Publications (2)

Publication Number Publication Date
KR960035590U true KR960035590U (ko) 1996-11-21
KR200190472Y1 KR200190472Y1 (ko) 2000-09-01

Family

ID=19411576

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950007909U KR200190472Y1 (ko) 1995-04-18 1995-04-18 웨이퍼 노광용 스테이지의 접동면 클리닝장치

Country Status (1)

Country Link
KR (1) KR200190472Y1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101397651B1 (ko) * 2011-12-05 2014-05-26 안주형 포지셔닝 장치
KR102581293B1 (ko) * 2021-09-28 2023-09-21 주토스 주식회사 Z축 경사이동식 경도 측정기

Also Published As

Publication number Publication date
KR200190472Y1 (ko) 2000-09-01

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