KR970046712U - 웨이퍼의 건조장치 - Google Patents

웨이퍼의 건조장치

Info

Publication number
KR970046712U
KR970046712U KR2019950039646U KR19950039646U KR970046712U KR 970046712 U KR970046712 U KR 970046712U KR 2019950039646 U KR2019950039646 U KR 2019950039646U KR 19950039646 U KR19950039646 U KR 19950039646U KR 970046712 U KR970046712 U KR 970046712U
Authority
KR
South Korea
Prior art keywords
drying device
wafer drying
wafer
drying
Prior art date
Application number
KR2019950039646U
Other languages
English (en)
Other versions
KR0132218Y1 (ko
Inventor
김희석
오동민
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950039646U priority Critical patent/KR0132218Y1/ko
Publication of KR970046712U publication Critical patent/KR970046712U/ko
Application granted granted Critical
Publication of KR0132218Y1 publication Critical patent/KR0132218Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019950039646U 1995-12-11 1995-12-11 웨이퍼의 건조장치 KR0132218Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950039646U KR0132218Y1 (ko) 1995-12-11 1995-12-11 웨이퍼의 건조장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950039646U KR0132218Y1 (ko) 1995-12-11 1995-12-11 웨이퍼의 건조장치

Publications (2)

Publication Number Publication Date
KR970046712U true KR970046712U (ko) 1997-07-31
KR0132218Y1 KR0132218Y1 (ko) 1999-02-01

Family

ID=19432923

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950039646U KR0132218Y1 (ko) 1995-12-11 1995-12-11 웨이퍼의 건조장치

Country Status (1)

Country Link
KR (1) KR0132218Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102019178B1 (ko) 2017-12-08 2019-09-06 광주여자대학교 산학협력단 바실러스 배양액에서 추출한 항균활성을 가진 화장료 조성물

Also Published As

Publication number Publication date
KR0132218Y1 (ko) 1999-02-01

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
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Payment date: 20040820

Year of fee payment: 7

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