KR970025773U - 반도체 장치 - Google Patents

반도체 장치

Info

Publication number
KR970025773U
KR970025773U KR2019950032285U KR19950032285U KR970025773U KR 970025773 U KR970025773 U KR 970025773U KR 2019950032285 U KR2019950032285 U KR 2019950032285U KR 19950032285 U KR19950032285 U KR 19950032285U KR 970025773 U KR970025773 U KR 970025773U
Authority
KR
South Korea
Prior art keywords
semiconductor device
semiconductor
Prior art date
Application number
KR2019950032285U
Other languages
English (en)
Other versions
KR0134664Y1 (ko
Inventor
임창문
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950032285U priority Critical patent/KR0134664Y1/ko
Publication of KR970025773U publication Critical patent/KR970025773U/ko
Application granted granted Critical
Publication of KR0134664Y1 publication Critical patent/KR0134664Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
KR2019950032285U 1995-11-03 1995-11-03 반도체 장치 KR0134664Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950032285U KR0134664Y1 (ko) 1995-11-03 1995-11-03 반도체 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950032285U KR0134664Y1 (ko) 1995-11-03 1995-11-03 반도체 장치

Publications (2)

Publication Number Publication Date
KR970025773U true KR970025773U (ko) 1997-06-20
KR0134664Y1 KR0134664Y1 (ko) 1999-03-20

Family

ID=19428132

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950032285U KR0134664Y1 (ko) 1995-11-03 1995-11-03 반도체 장치

Country Status (1)

Country Link
KR (1) KR0134664Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100410960B1 (ko) * 2001-07-27 2003-12-18 삼성전기주식회사 편향요크

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100343140B1 (ko) * 1999-12-06 2002-07-05 윤종용 종방향 및 횡방향 패턴간의 선폭 차이에 대한 보정이가능한 노광장치 및 이에 사용되는 어퍼쳐

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100410960B1 (ko) * 2001-07-27 2003-12-18 삼성전기주식회사 편향요크

Also Published As

Publication number Publication date
KR0134664Y1 (ko) 1999-03-20

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