KR970003247U - 웨이퍼 검사장치 - Google Patents

웨이퍼 검사장치

Info

Publication number
KR970003247U
KR970003247U KR2019950013499U KR19950013499U KR970003247U KR 970003247 U KR970003247 U KR 970003247U KR 2019950013499 U KR2019950013499 U KR 2019950013499U KR 19950013499 U KR19950013499 U KR 19950013499U KR 970003247 U KR970003247 U KR 970003247U
Authority
KR
South Korea
Prior art keywords
inspection device
wafer inspection
wafer
inspection
Prior art date
Application number
KR2019950013499U
Other languages
English (en)
Other versions
KR200198268Y1 (ko
Inventor
김현재
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019950013499U priority Critical patent/KR200198268Y1/ko
Publication of KR970003247U publication Critical patent/KR970003247U/ko
Application granted granted Critical
Publication of KR200198268Y1 publication Critical patent/KR200198268Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR2019950013499U 1995-06-15 1995-06-15 웨이퍼 검사장치 KR200198268Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950013499U KR200198268Y1 (ko) 1995-06-15 1995-06-15 웨이퍼 검사장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950013499U KR200198268Y1 (ko) 1995-06-15 1995-06-15 웨이퍼 검사장치

Publications (2)

Publication Number Publication Date
KR970003247U true KR970003247U (ko) 1997-01-24
KR200198268Y1 KR200198268Y1 (ko) 2000-12-01

Family

ID=19415598

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950013499U KR200198268Y1 (ko) 1995-06-15 1995-06-15 웨이퍼 검사장치

Country Status (1)

Country Link
KR (1) KR200198268Y1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100445457B1 (ko) * 2002-02-25 2004-08-21 삼성전자주식회사 웨이퍼 후면 검사 장치 및 검사 방법
CN114112653A (zh) * 2020-08-25 2022-03-01 胜高股份有限公司 半导体晶圆破裂的发生率降低方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100481074B1 (ko) * 1997-09-10 2005-06-28 삼성전자주식회사 반도체웨이퍼검사시스템
KR20020032057A (ko) * 2000-10-25 2002-05-03 고석태 기판 반송/반전 장치, 이 장치를 이용한 기판 반전/반송시스템 및 기판 반송/반전 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100445457B1 (ko) * 2002-02-25 2004-08-21 삼성전자주식회사 웨이퍼 후면 검사 장치 및 검사 방법
CN114112653A (zh) * 2020-08-25 2022-03-01 胜高股份有限公司 半导体晶圆破裂的发生率降低方法

Also Published As

Publication number Publication date
KR200198268Y1 (ko) 2000-12-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090624

Year of fee payment: 10

EXPY Expiration of term