KR960024379U - 웨이퍼 주변 노광장치 - Google Patents

웨이퍼 주변 노광장치

Info

Publication number
KR960024379U
KR960024379U KR2019940036813U KR19940036813U KR960024379U KR 960024379 U KR960024379 U KR 960024379U KR 2019940036813 U KR2019940036813 U KR 2019940036813U KR 19940036813 U KR19940036813 U KR 19940036813U KR 960024379 U KR960024379 U KR 960024379U
Authority
KR
South Korea
Prior art keywords
exposure device
peripheral exposure
wafer peripheral
wafer
peripheral
Prior art date
Application number
KR2019940036813U
Other languages
English (en)
Other versions
KR200169685Y1 (ko
Inventor
오만영
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940036813U priority Critical patent/KR200169685Y1/ko
Publication of KR960024379U publication Critical patent/KR960024379U/ko
Application granted granted Critical
Publication of KR200169685Y1 publication Critical patent/KR200169685Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019940036813U 1994-12-28 1994-12-28 웨이퍼 주변 노광장치 KR200169685Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940036813U KR200169685Y1 (ko) 1994-12-28 1994-12-28 웨이퍼 주변 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940036813U KR200169685Y1 (ko) 1994-12-28 1994-12-28 웨이퍼 주변 노광장치

Publications (2)

Publication Number Publication Date
KR960024379U true KR960024379U (ko) 1996-07-22
KR200169685Y1 KR200169685Y1 (ko) 2000-03-02

Family

ID=19403537

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940036813U KR200169685Y1 (ko) 1994-12-28 1994-12-28 웨이퍼 주변 노광장치

Country Status (1)

Country Link
KR (1) KR200169685Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100728476B1 (ko) * 2001-02-23 2007-06-13 가부시키가이샤 아도테크 엔지니어링 노광장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100728476B1 (ko) * 2001-02-23 2007-06-13 가부시키가이샤 아도테크 엔지니어링 노광장치

Also Published As

Publication number Publication date
KR200169685Y1 (ko) 2000-03-02

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