KR960025269U - 반도체소자제조용노광장치 - Google Patents

반도체소자제조용노광장치

Info

Publication number
KR960025269U
KR960025269U KR2019940033974U KR19940033974U KR960025269U KR 960025269 U KR960025269 U KR 960025269U KR 2019940033974 U KR2019940033974 U KR 2019940033974U KR 19940033974 U KR19940033974 U KR 19940033974U KR 960025269 U KR960025269 U KR 960025269U
Authority
KR
South Korea
Prior art keywords
semiconductor device
exposure
manufacturing
device manufacturing
exposure device
Prior art date
Application number
KR2019940033974U
Other languages
English (en)
Other versions
KR200170306Y1 (ko
Inventor
조찬섭
길명군
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940033974U priority Critical patent/KR200170306Y1/ko
Publication of KR960025269U publication Critical patent/KR960025269U/ko
Application granted granted Critical
Publication of KR200170306Y1 publication Critical patent/KR200170306Y1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019940033974U 1994-12-14 1994-12-14 반도체소자제조용노광장치 KR200170306Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940033974U KR200170306Y1 (ko) 1994-12-14 1994-12-14 반도체소자제조용노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940033974U KR200170306Y1 (ko) 1994-12-14 1994-12-14 반도체소자제조용노광장치

Publications (2)

Publication Number Publication Date
KR960025269U true KR960025269U (ko) 1996-07-22
KR200170306Y1 KR200170306Y1 (ko) 2000-03-02

Family

ID=19401282

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940033974U KR200170306Y1 (ko) 1994-12-14 1994-12-14 반도체소자제조용노광장치

Country Status (1)

Country Link
KR (1) KR200170306Y1 (ko)

Also Published As

Publication number Publication date
KR200170306Y1 (ko) 2000-03-02

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