KR960015789B1 - Fabricating method of semiconductor device - Google Patents
Fabricating method of semiconductor device Download PDFInfo
- Publication number
- KR960015789B1 KR960015789B1 KR93011361A KR930011361A KR960015789B1 KR 960015789 B1 KR960015789 B1 KR 960015789B1 KR 93011361 A KR93011361 A KR 93011361A KR 930011361 A KR930011361 A KR 930011361A KR 960015789 B1 KR960015789 B1 KR 960015789B1
- Authority
- KR
- South Korea
- Prior art keywords
- reflection
- preventing film
- photoresist
- film
- pattern
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 5
- 238000000151 deposition Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Drying Of Semiconductors (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR93011361A KR960015789B1 (en) | 1993-06-22 | 1993-06-22 | Fabricating method of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR93011361A KR960015789B1 (en) | 1993-06-22 | 1993-06-22 | Fabricating method of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950001918A KR950001918A (ko) | 1995-01-04 |
| KR960015789B1 true KR960015789B1 (en) | 1996-11-21 |
Family
ID=19357775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR93011361A KR960015789B1 (en) | 1993-06-22 | 1993-06-22 | Fabricating method of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR960015789B1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100393202B1 (ko) * | 1995-05-12 | 2003-10-10 | 삼성전자주식회사 | 패턴형성에사용되는마스크및그제조방법 |
-
1993
- 1993-06-22 KR KR93011361A patent/KR960015789B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR950001918A (ko) | 1995-01-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| G160 | Decision to publish patent application | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20091028 Year of fee payment: 14 |
|
| LAPS | Lapse due to unpaid annual fee |