KR950009956A - Wafer cleaning method - Google Patents
Wafer cleaning method Download PDFInfo
- Publication number
- KR950009956A KR950009956A KR1019930020199A KR930020199A KR950009956A KR 950009956 A KR950009956 A KR 950009956A KR 1019930020199 A KR1019930020199 A KR 1019930020199A KR 930020199 A KR930020199 A KR 930020199A KR 950009956 A KR950009956 A KR 950009956A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- cleaning
- cleaning method
- rotating
- drying
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 웨이퍼를 회전시키면서 상기 웨이퍼에 순수를 분사하고 브러쉬로 웨이퍼 표면을 세정하는 린스(rinse) 단계와, 연속적으로 상기 린스 공정이 이루어진 장치에서 웨이퍼를 회전 시키며 건조하는 드라이 단계를 포함하여 이루어지는 것을 특징으로 하는 웨이퍼 세정 방법에 관한 것으로, 공정의 단순화는 물론 획기적으로 불순물 및 결함을 감소시켜 소자의 수율을 향상시키는 효과가 있다.The present invention comprises a rinse step of spraying pure water on the wafer while rotating the wafer and cleaning the surface of the wafer with a brush, and a drying step of rotating and drying the wafer in a device in which the rinse process is performed continuously. The present invention relates to a wafer cleaning method characterized by the above-mentioned method, which simplifies the process and dramatically reduces impurities and defects, thereby improving the yield of the device.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제1a도는 종래기술에 따른 웨이퍼 세정후의 불순물 측정 결과 그래프.1A is a graph of a result of measuring impurities after cleaning a wafer according to the related art.
제1b도는 본 발명에 따른 웨이퍼 세정후의 불순물 측정 결과 그래프.Figure 1b is a graph of the results of impurity measurement after wafer cleaning according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930020199A KR950009956A (en) | 1993-09-28 | 1993-09-28 | Wafer cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019930020199A KR950009956A (en) | 1993-09-28 | 1993-09-28 | Wafer cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950009956A true KR950009956A (en) | 1995-04-26 |
Family
ID=66824070
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930020199A KR950009956A (en) | 1993-09-28 | 1993-09-28 | Wafer cleaning method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950009956A (en) |
-
1993
- 1993-09-28 KR KR1019930020199A patent/KR950009956A/en not_active Application Discontinuation
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Legal Events
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WITN | Withdrawal due to no request for examination |