KR970030414A - Semiconductor process cleaning device - Google Patents

Semiconductor process cleaning device Download PDF

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Publication number
KR970030414A
KR970030414A KR1019950040262A KR19950040262A KR970030414A KR 970030414 A KR970030414 A KR 970030414A KR 1019950040262 A KR1019950040262 A KR 1019950040262A KR 19950040262 A KR19950040262 A KR 19950040262A KR 970030414 A KR970030414 A KR 970030414A
Authority
KR
South Korea
Prior art keywords
cleaning
semiconductor process
semiconductor
cleaning device
cleaning apparatus
Prior art date
Application number
KR1019950040262A
Other languages
Korean (ko)
Other versions
KR0161449B1 (en
Inventor
박병헌
허동철
정찬군
강태철
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950040262A priority Critical patent/KR0161449B1/en
Publication of KR970030414A publication Critical patent/KR970030414A/en
Application granted granted Critical
Publication of KR0161449B1 publication Critical patent/KR0161449B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 반도체 공정용 세척장치에 관한 것으로, 순수한 질소가스등을 사용하여 반도체 소자의 제조공정중에 발생된 각종의 오염을 제거할 수 있도록 된 반도체 공정용 세척장치에 있어서, 중앙의 작업대를 중심으로 양방향으로 세척수단을 배치한 것을 특징으로 한다. 따라서, 웨이퍼의 세척처리시의 정체를 없앨 수 있으며, 이에 따라 금속배선공정 후의 세척지연에 따른 공정불량을 줄일 수 있게 된다. 또한, 설치공간을 최소화함으로써 공간절약 및 설비 효율화를 실현할 수 있게 된다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for a semiconductor process, comprising: cleaning apparatus for a semiconductor process capable of removing various contaminants generated during a manufacturing process of a semiconductor device using pure nitrogen gas; It characterized in that the washing means arranged. Therefore, it is possible to eliminate congestion during the cleaning process of the wafer, thereby reducing process defects due to the cleaning delay after the metal wiring process. In addition, it is possible to realize space saving and facility efficiency by minimizing the installation space.

Description

반도체 공정용 세척장치Semiconductor process cleaning device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따른 반도체 공정용 세정장치를 나타낸 도면이다.2 is a view showing a cleaning apparatus for a semiconductor process according to the present invention.

Claims (2)

순수한 질소가스등을 사용하여 반도체 소자의 제조공정중에 발생된 각종의 오염을 제거할 수 있도록 된 반도체 공정용 세척장치에 있어서, 중앙의 작업대를 중심으로 양방향으로 세척수단을 배치한 것을 특징으로 하는 반도체 공정용 세척장치.A semiconductor process cleaning device capable of removing various contaminants generated during a manufacturing process of a semiconductor device using pure nitrogen gas, etc., wherein the cleaning means is disposed in both directions around a central workbench. For cleaning. 제1항에 있어서, 상기 세척수단은 큐디알 배쓰와, 화이널 배쓰 및 스핀 드라이어로 구성된 것을 특징으로 하는 반도체 공정용 세척장치.The washing apparatus of claim 1, wherein the washing means comprises a cupial bath, a final bath, and a spin dryer.
KR1019950040262A 1995-11-08 1995-11-08 Cleaning apparatus for semiconductor process KR0161449B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950040262A KR0161449B1 (en) 1995-11-08 1995-11-08 Cleaning apparatus for semiconductor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950040262A KR0161449B1 (en) 1995-11-08 1995-11-08 Cleaning apparatus for semiconductor process

Publications (2)

Publication Number Publication Date
KR970030414A true KR970030414A (en) 1997-06-26
KR0161449B1 KR0161449B1 (en) 1999-02-01

Family

ID=19433374

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950040262A KR0161449B1 (en) 1995-11-08 1995-11-08 Cleaning apparatus for semiconductor process

Country Status (1)

Country Link
KR (1) KR0161449B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10460984B2 (en) * 2015-04-15 2019-10-29 Semiconductor Energy Laboratory Co., Ltd. Method for fabricating electrode and semiconductor device

Also Published As

Publication number Publication date
KR0161449B1 (en) 1999-02-01

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