KR950000090B1 - 반도체장치의 제조방법 - Google Patents

반도체장치의 제조방법 Download PDF

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Publication number
KR950000090B1
KR950000090B1 KR1019910004026A KR910004026A KR950000090B1 KR 950000090 B1 KR950000090 B1 KR 950000090B1 KR 1019910004026 A KR1019910004026 A KR 1019910004026A KR 910004026 A KR910004026 A KR 910004026A KR 950000090 B1 KR950000090 B1 KR 950000090B1
Authority
KR
South Korea
Prior art keywords
contact hole
film
resist film
insulating film
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019910004026A
Other languages
English (en)
Korean (ko)
Inventor
다카오 아다치
케이이치 아베
Original Assignee
가부시키가이샤 도시바
아오이 죠이치
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 도시바, 아오이 죠이치 filed Critical 가부시키가이샤 도시바
Application granted granted Critical
Publication of KR950000090B1 publication Critical patent/KR950000090B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/61—Formation of materials, e.g. in the shape of layers or pillars of insulating materials using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/73—Etching of wafers, substrates or parts of devices using masks for insulating materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/081—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts
    • H10W20/082—Manufacture or treatment of dielectric parts thereof by forming openings in the dielectric parts the openings being tapered via holes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Drying Of Semiconductors (AREA)
KR1019910004026A 1990-03-16 1991-03-14 반도체장치의 제조방법 Expired - Fee Related KR950000090B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2065669A JPH03266437A (ja) 1990-03-16 1990-03-16 半導体装置の製造方法
JP02-065669 1990-03-16

Publications (1)

Publication Number Publication Date
KR950000090B1 true KR950000090B1 (ko) 1995-01-09

Family

ID=13293639

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910004026A Expired - Fee Related KR950000090B1 (ko) 1990-03-16 1991-03-14 반도체장치의 제조방법

Country Status (3)

Country Link
EP (1) EP0446939A2 (cg-RX-API-DMAC7.html)
JP (1) JPH03266437A (cg-RX-API-DMAC7.html)
KR (1) KR950000090B1 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050130075A1 (en) * 2003-12-12 2005-06-16 Mohammed Shaarawi Method for making fluid emitter orifice

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114319A (en) * 1980-02-14 1981-09-08 Fujitsu Ltd Method for forming contact hole
US4714686A (en) * 1985-07-31 1987-12-22 Advanced Micro Devices, Inc. Method of forming contact plugs for planarized integrated circuits
US4727045A (en) * 1986-07-30 1988-02-23 Advanced Micro Devices, Inc. Plugged poly silicon resistor load for static random access memory cells
JPS63258022A (ja) * 1987-04-15 1988-10-25 Rohm Co Ltd 半導体装置の製造方法
JPH01120847A (ja) * 1987-11-05 1989-05-12 Fujitsu Ltd 半導体装置
JPH0237707A (ja) * 1988-07-27 1990-02-07 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
EP0446939A3 (cg-RX-API-DMAC7.html) 1994-03-30
EP0446939A2 (en) 1991-09-18
JPH03266437A (ja) 1991-11-27

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