KR930009047A - 개량된 리드를 갖는 반도체장치 - Google Patents

개량된 리드를 갖는 반도체장치 Download PDF

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KR930009047A
KR930009047A KR1019920018856A KR920018856A KR930009047A KR 930009047 A KR930009047 A KR 930009047A KR 1019920018856 A KR1019920018856 A KR 1019920018856A KR 920018856 A KR920018856 A KR 920018856A KR 930009047 A KR930009047 A KR 930009047A
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semiconductor device
film
lead
palladium
die pad
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KR1019920018856A
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KR960002495B1 (ko
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가즈또 쓰지
요시유끼 요네다
준이찌 가사이
미찌오 소노
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세끼자와 다다시
후지쓰 가부시끼가이샤
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Abstract

반도체칩(2)과, 상기 반도체칩(2)이 탑재된 다이패드(3)와, 상기 다이패드(3)과 반도체칩(2)을 봉지하는 패키지(6) 및 상기 반도체칩(2)에 전지적으로 접속돼있고 상기 패키지(6)로부터 돌출된 복수의 리드(4)를 구비하고 상기 각 리드(4)가 순도 99%이상의 순수니켈(Ni)로 된 리드본체(4-1)와 그 위에 형성된 팔라듐(Pd)으로 된 제1막(7)을 갖고 있는 것을 특징으로 하는 반도체장치.

Description

개량된 리드를 갖는 반도체장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예에 의한 반도체 장치를 나타낸 횡단면도
제2도는 제1도에 도시된 반도체 장치의 제조에 사용되는 리드후레임(lead frame)을 나타낸 평면도
제3도는 팔라듐(Pd)으로 도금된 리드후레임을 나타낸 평면도

Claims (12)

  1. 반도체칩(2)과, 상기 반도체칩(2)이 탑재된 다이패드(3)와, 상기 다이패드(3)과 반도체칩(2)을 봉지하는 패키지(6) 및 상기 반도체칩(2)에 전지적으로 접속돼있고 상기 패키지(6)로부터 돌출된 복수의 리드(4)를 구비하고 상기 각 리드(4)가 순도 99%이상의 순수니켈(Ni)로 된 리드본체(4-1)와 그 위에 형성된 팔라듐(Pd)으로 된 제1막(7)을 갖고 있는 것을 특징으로 하는 개량된 리드를 갖는 반도체장치.
  2. 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)의 두께가 0.1~1.5㎛인 것이 특징인 개량된 리드를 갖는 반도체장치.
  3. 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)이 상기 리드본체(4-1)의 적어도 일부상에 형성돼 있고, 상기 리드(4)가 회로기판에 납땜될 때 상기 일부가 땜납과 접촉되는 것이 특징인 개량된 리드를 갖는 반도체장치.
  4. 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)이 상기 리드(4)의 절단면(P2)을 제외한 상기 리드본체(4-1)의 전면상에 형성돼 있고, 상기 절단면(P2)들은, 팔라듐(Pd)으로 된 상기 제1막(7)을 형성한 후에 상기 각 리드(4)상에 형성된 것이 특징인 개량된 리드를 갖는 반도체장치.
  5. 제1항에 있어서, 상기 패키지(6)의 구성재료의 열팽창계수가 순수니켈(Ni)의 것과 거의 동일한 것이 특징인 개량된 리드를 갖는 반도체장치.
  6. 제1항에 있어서, 상기 다이패드(3)가, 순도 99%이상의 순수니켈(Ni)로 된 다이패드본체(3-1)와 그 위에 형성된 제2막(7)을 갖고 상기 제2막(7)이 팔라듐(Pd)으로 된 것이 특징인 개량된 리드를 갖는 반도체장치.
  7. 제6항에 있어서, 팔라듐(Pd)으로 된 상기 제2막(7)의 두께가 0.1~1.5㎛인 것이 특징인 개량된 리드를 갖는 반도체장치.
  8. 제6항에 있어서, 팔라듐(Pd)으로 된 상기 제2막(7)이 상기 다이패드본체(3-1)전면상에 형성된 것이 특징인 개량된 리드를 갖는 반도체장치.
  9. 제6항에 있어서, 상기 리드본체(3-1)의 일부상에 은(Ag)으로 된 막(23)이 형성돼 있고, 상기 일부에 상기 다이패드(3)상에 탑재된 상기 반도체칩(2)에 접속된 배선(5)이 접속된 것이 특징인 개량된 리드를 갖는 반도체장치.
  10. 제9항에 있어서, 은(Ag)으로 된 상기 막(23)의 두께가 1.0~10㎛ 범위내인 것이 특징인 개량된 리드를 갖는 반도체장치.
  11. 제6항에 있어서, 상기 리드본체(3-1)의 일부상에 금(Au)으로 된 막(23)이 형성돼 있고, 상기 일부에 상기 다이패드(3)상에 탑재된 상기 반도체칩(2)에 접속된 배선(5)이 접속된 것이 특징인 개량된 리드를 갖는 반도체장치.
  12. 제11항에 있어서, 금(Au)으로 된 상기 막(23)의 두께가 1.0~10㎛범위내인 것이 특징인 개량된 리드를 갖는 반도체장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920018856A 1991-10-14 1992-10-14 개량된 리드를 갖는 반도체장치 KR960002495B1 (ko)

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Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072239A (en) * 1995-11-08 2000-06-06 Fujitsu Limited Device having resin package with projections
US5925930A (en) * 1996-05-21 1999-07-20 Micron Technology, Inc. IC contacts with palladium layer and flexible conductive epoxy bumps
US6558979B2 (en) * 1996-05-21 2003-05-06 Micron Technology, Inc. Use of palladium in IC manufacturing with conductive polymer bump
US6521358B1 (en) * 1997-03-04 2003-02-18 Matsushita Electric Industrial Co., Ltd. Lead frame for semiconductor device and method of producing same
US5923081A (en) 1997-05-15 1999-07-13 Micron Technology, Inc. Compression layer on the leadframe to reduce stress defects
EP0887850A3 (en) 1997-06-23 2001-05-02 STMicroelectronics, Inc. Lead-frame forming for improved thermal performance
US6087712A (en) * 1997-12-26 2000-07-11 Samsung Aerospace Industries, Ltd. Lead frame containing leads plated with tin alloy for increased wettability and method for plating the leads
WO2001028726A1 (fr) * 1998-04-20 2001-04-26 Senju Metal Industry Co., Ltd. Materiau de revetement a brasure et procede de production correspondant
US6087714A (en) * 1998-04-27 2000-07-11 Matsushita Electric Industrial Co., Ltd. Semiconductor devices having tin-based solder film containing no lead and process for producing the devices
US6229200B1 (en) * 1998-06-10 2001-05-08 Asat Limited Saw-singulated leadless plastic chip carrier
US8330270B1 (en) 1998-06-10 2012-12-11 Utac Hong Kong Limited Integrated circuit package having a plurality of spaced apart pad portions
US6194777B1 (en) * 1998-06-27 2001-02-27 Texas Instruments Incorporated Leadframes with selective palladium plating
US20030011048A1 (en) * 1999-03-19 2003-01-16 Abbott Donald C. Semiconductor circuit assembly having a plated leadframe including gold selectively covering areas to be soldered
US6544880B1 (en) * 1999-06-14 2003-04-08 Micron Technology, Inc. Method of improving copper interconnects of semiconductor devices for bonding
KR100322098B1 (ko) * 1999-11-18 2002-02-06 김순택 2차 전지
US6953986B2 (en) * 1999-12-10 2005-10-11 Texas Instruments Incorporated Leadframes for high adhesion semiconductor devices and method of fabrication
JP2001230360A (ja) * 2000-02-18 2001-08-24 Hitachi Ltd 半導体集積回路装置およびその製造方法
US6225684B1 (en) 2000-02-29 2001-05-01 Texas Instruments Tucson Corporation Low temperature coefficient leadframe
US20030151120A1 (en) * 2000-06-28 2003-08-14 Hundt Michael J. Lead-frame forming for improved thermal performance
US6790710B2 (en) 2002-01-31 2004-09-14 Asat Limited Method of manufacturing an integrated circuit package
JP3833216B2 (ja) 2001-09-24 2006-10-11 リカ デンシ アメリカ, インコーポレイテッド 電気的テストプローブ及びその製造方法
US20040109525A1 (en) * 2002-12-09 2004-06-10 Chieng Koc Vai Chieng Aka Michael Automatic chip counting system (process)
CN1957113A (zh) * 2004-05-25 2007-05-02 新光电气工业株式会社 半导体元件的外部钯镀敷结构以及半导体器件制造方法
KR20060030356A (ko) * 2004-10-05 2006-04-10 삼성테크윈 주식회사 반도체 리이드 프레임과, 이를 포함하는 반도체 패키지와,이를 도금하는 방법
US7268415B2 (en) * 2004-11-09 2007-09-11 Texas Instruments Incorporated Semiconductor device having post-mold nickel/palladium/gold plated leads
JP4499752B2 (ja) * 2006-03-03 2010-07-07 日本エレクトロプレイテイング・エンジニヤース株式会社 電子部品
DE102006023998B4 (de) 2006-05-22 2009-02-19 Infineon Technologies Ag Elektronische Schaltungsanordnung und Verfahren zur Herstellung einer solchen
JP2010055842A (ja) * 2008-08-26 2010-03-11 Panasonic Electric Works Co Ltd 照明装置
JP5894502B2 (ja) 2012-06-04 2016-03-30 ローム株式会社 ワイヤボンディング構造および半導体装置
JP6095997B2 (ja) * 2013-02-13 2017-03-15 エスアイアイ・セミコンダクタ株式会社 樹脂封止型半導体装置の製造方法
US10796986B2 (en) * 2016-03-21 2020-10-06 Infineon Technologies Ag Leadframe leads having fully plated end faces
JP7192688B2 (ja) 2019-07-16 2022-12-20 Tdk株式会社 電子部品パッケージ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4529667A (en) * 1983-04-06 1985-07-16 The Furukawa Electric Company, Ltd. Silver-coated electric composite materials
US4785137A (en) * 1984-04-30 1988-11-15 Allied Corporation Novel nickel/indium/other metal alloy for use in the manufacture of electrical contact areas of electrical devices
DE3717246A1 (de) * 1986-05-23 1987-11-26 Mitsubishi Electric Corp Material auf nickelbasis fuer eine halbleiteranordnung
EP0250146A1 (en) * 1986-06-16 1987-12-23 Texas Instruments Incorporated Palladium plated lead frame for integrated circuit
JPH0828455B2 (ja) * 1988-02-24 1996-03-21 富士通株式会社 リードフレーム及びそれを用いた電子部品の製造方法
EP0335608B1 (en) * 1988-03-28 1995-06-14 Texas Instruments Incorporated Lead frame with reduced corrosion
EP0384586A3 (en) * 1989-02-22 1991-03-06 Texas Instruments Incorporated High reliability plastic package for integrated circuits
JP2734463B2 (ja) * 1989-04-27 1998-03-30 株式会社日立製作所 半導体装置
JPH0359972A (ja) * 1989-07-27 1991-03-14 Yazaki Corp 電気接点
KR920000127A (ko) * 1990-02-26 1992-01-10 미다 가쓰시게 반도체 패키지와 그것을 위한 리드프레임
US5175609A (en) * 1991-04-10 1992-12-29 International Business Machines Corporation Structure and method for corrosion and stress-resistant interconnecting metallurgy

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