KR930009047A - 개량된 리드를 갖는 반도체장치 - Google Patents
개량된 리드를 갖는 반도체장치 Download PDFInfo
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- KR930009047A KR930009047A KR1019920018856A KR920018856A KR930009047A KR 930009047 A KR930009047 A KR 930009047A KR 1019920018856 A KR1019920018856 A KR 1019920018856A KR 920018856 A KR920018856 A KR 920018856A KR 930009047 A KR930009047 A KR 930009047A
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- semiconductor device
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- lead
- palladium
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Abstract
반도체칩(2)과, 상기 반도체칩(2)이 탑재된 다이패드(3)와, 상기 다이패드(3)과 반도체칩(2)을 봉지하는 패키지(6) 및 상기 반도체칩(2)에 전지적으로 접속돼있고 상기 패키지(6)로부터 돌출된 복수의 리드(4)를 구비하고 상기 각 리드(4)가 순도 99%이상의 순수니켈(Ni)로 된 리드본체(4-1)와 그 위에 형성된 팔라듐(Pd)으로 된 제1막(7)을 갖고 있는 것을 특징으로 하는 반도체장치.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예에 의한 반도체 장치를 나타낸 횡단면도
제2도는 제1도에 도시된 반도체 장치의 제조에 사용되는 리드후레임(lead frame)을 나타낸 평면도
제3도는 팔라듐(Pd)으로 도금된 리드후레임을 나타낸 평면도
Claims (12)
- 반도체칩(2)과, 상기 반도체칩(2)이 탑재된 다이패드(3)와, 상기 다이패드(3)과 반도체칩(2)을 봉지하는 패키지(6) 및 상기 반도체칩(2)에 전지적으로 접속돼있고 상기 패키지(6)로부터 돌출된 복수의 리드(4)를 구비하고 상기 각 리드(4)가 순도 99%이상의 순수니켈(Ni)로 된 리드본체(4-1)와 그 위에 형성된 팔라듐(Pd)으로 된 제1막(7)을 갖고 있는 것을 특징으로 하는 개량된 리드를 갖는 반도체장치.
- 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)의 두께가 0.1~1.5㎛인 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)이 상기 리드본체(4-1)의 적어도 일부상에 형성돼 있고, 상기 리드(4)가 회로기판에 납땜될 때 상기 일부가 땜납과 접촉되는 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제1항에 있어서, 팔라듐(Pd)으로 된 제1막(7)이 상기 리드(4)의 절단면(P2)을 제외한 상기 리드본체(4-1)의 전면상에 형성돼 있고, 상기 절단면(P2)들은, 팔라듐(Pd)으로 된 상기 제1막(7)을 형성한 후에 상기 각 리드(4)상에 형성된 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제1항에 있어서, 상기 패키지(6)의 구성재료의 열팽창계수가 순수니켈(Ni)의 것과 거의 동일한 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제1항에 있어서, 상기 다이패드(3)가, 순도 99%이상의 순수니켈(Ni)로 된 다이패드본체(3-1)와 그 위에 형성된 제2막(7)을 갖고 상기 제2막(7)이 팔라듐(Pd)으로 된 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제6항에 있어서, 팔라듐(Pd)으로 된 상기 제2막(7)의 두께가 0.1~1.5㎛인 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제6항에 있어서, 팔라듐(Pd)으로 된 상기 제2막(7)이 상기 다이패드본체(3-1)전면상에 형성된 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제6항에 있어서, 상기 리드본체(3-1)의 일부상에 은(Ag)으로 된 막(23)이 형성돼 있고, 상기 일부에 상기 다이패드(3)상에 탑재된 상기 반도체칩(2)에 접속된 배선(5)이 접속된 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제9항에 있어서, 은(Ag)으로 된 상기 막(23)의 두께가 1.0~10㎛ 범위내인 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제6항에 있어서, 상기 리드본체(3-1)의 일부상에 금(Au)으로 된 막(23)이 형성돼 있고, 상기 일부에 상기 다이패드(3)상에 탑재된 상기 반도체칩(2)에 접속된 배선(5)이 접속된 것이 특징인 개량된 리드를 갖는 반도체장치.
- 제11항에 있어서, 금(Au)으로 된 상기 막(23)의 두께가 1.0~10㎛범위내인 것이 특징인 개량된 리드를 갖는 반도체장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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JP26466591 | 1991-10-14 | ||
JP91-264665 | 1991-10-14 |
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KR930009047A true KR930009047A (ko) | 1993-05-22 |
KR960002495B1 KR960002495B1 (ko) | 1996-02-17 |
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KR1019920018856A KR960002495B1 (ko) | 1991-10-14 | 1992-10-14 | 개량된 리드를 갖는 반도체장치 |
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US (1) | US5521432A (ko) |
EP (1) | EP0537982A2 (ko) |
KR (1) | KR960002495B1 (ko) |
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US6072239A (en) * | 1995-11-08 | 2000-06-06 | Fujitsu Limited | Device having resin package with projections |
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US6558979B2 (en) * | 1996-05-21 | 2003-05-06 | Micron Technology, Inc. | Use of palladium in IC manufacturing with conductive polymer bump |
US6521358B1 (en) * | 1997-03-04 | 2003-02-18 | Matsushita Electric Industrial Co., Ltd. | Lead frame for semiconductor device and method of producing same |
US5923081A (en) | 1997-05-15 | 1999-07-13 | Micron Technology, Inc. | Compression layer on the leadframe to reduce stress defects |
EP0887850A3 (en) | 1997-06-23 | 2001-05-02 | STMicroelectronics, Inc. | Lead-frame forming for improved thermal performance |
US6087712A (en) * | 1997-12-26 | 2000-07-11 | Samsung Aerospace Industries, Ltd. | Lead frame containing leads plated with tin alloy for increased wettability and method for plating the leads |
WO2001028726A1 (fr) * | 1998-04-20 | 2001-04-26 | Senju Metal Industry Co., Ltd. | Materiau de revetement a brasure et procede de production correspondant |
US6087714A (en) * | 1998-04-27 | 2000-07-11 | Matsushita Electric Industrial Co., Ltd. | Semiconductor devices having tin-based solder film containing no lead and process for producing the devices |
US6229200B1 (en) * | 1998-06-10 | 2001-05-08 | Asat Limited | Saw-singulated leadless plastic chip carrier |
US8330270B1 (en) | 1998-06-10 | 2012-12-11 | Utac Hong Kong Limited | Integrated circuit package having a plurality of spaced apart pad portions |
US6194777B1 (en) * | 1998-06-27 | 2001-02-27 | Texas Instruments Incorporated | Leadframes with selective palladium plating |
US20030011048A1 (en) * | 1999-03-19 | 2003-01-16 | Abbott Donald C. | Semiconductor circuit assembly having a plated leadframe including gold selectively covering areas to be soldered |
US6544880B1 (en) * | 1999-06-14 | 2003-04-08 | Micron Technology, Inc. | Method of improving copper interconnects of semiconductor devices for bonding |
KR100322098B1 (ko) * | 1999-11-18 | 2002-02-06 | 김순택 | 2차 전지 |
US6953986B2 (en) * | 1999-12-10 | 2005-10-11 | Texas Instruments Incorporated | Leadframes for high adhesion semiconductor devices and method of fabrication |
JP2001230360A (ja) * | 2000-02-18 | 2001-08-24 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
US6225684B1 (en) | 2000-02-29 | 2001-05-01 | Texas Instruments Tucson Corporation | Low temperature coefficient leadframe |
US20030151120A1 (en) * | 2000-06-28 | 2003-08-14 | Hundt Michael J. | Lead-frame forming for improved thermal performance |
US6790710B2 (en) | 2002-01-31 | 2004-09-14 | Asat Limited | Method of manufacturing an integrated circuit package |
JP3833216B2 (ja) | 2001-09-24 | 2006-10-11 | リカ デンシ アメリカ, インコーポレイテッド | 電気的テストプローブ及びその製造方法 |
US20040109525A1 (en) * | 2002-12-09 | 2004-06-10 | Chieng Koc Vai Chieng Aka Michael | Automatic chip counting system (process) |
CN1957113A (zh) * | 2004-05-25 | 2007-05-02 | 新光电气工业株式会社 | 半导体元件的外部钯镀敷结构以及半导体器件制造方法 |
KR20060030356A (ko) * | 2004-10-05 | 2006-04-10 | 삼성테크윈 주식회사 | 반도체 리이드 프레임과, 이를 포함하는 반도체 패키지와,이를 도금하는 방법 |
US7268415B2 (en) * | 2004-11-09 | 2007-09-11 | Texas Instruments Incorporated | Semiconductor device having post-mold nickel/palladium/gold plated leads |
JP4499752B2 (ja) * | 2006-03-03 | 2010-07-07 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 電子部品 |
DE102006023998B4 (de) | 2006-05-22 | 2009-02-19 | Infineon Technologies Ag | Elektronische Schaltungsanordnung und Verfahren zur Herstellung einer solchen |
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JP5894502B2 (ja) | 2012-06-04 | 2016-03-30 | ローム株式会社 | ワイヤボンディング構造および半導体装置 |
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US4529667A (en) * | 1983-04-06 | 1985-07-16 | The Furukawa Electric Company, Ltd. | Silver-coated electric composite materials |
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DE3717246A1 (de) * | 1986-05-23 | 1987-11-26 | Mitsubishi Electric Corp | Material auf nickelbasis fuer eine halbleiteranordnung |
EP0250146A1 (en) * | 1986-06-16 | 1987-12-23 | Texas Instruments Incorporated | Palladium plated lead frame for integrated circuit |
JPH0828455B2 (ja) * | 1988-02-24 | 1996-03-21 | 富士通株式会社 | リードフレーム及びそれを用いた電子部品の製造方法 |
EP0335608B1 (en) * | 1988-03-28 | 1995-06-14 | Texas Instruments Incorporated | Lead frame with reduced corrosion |
EP0384586A3 (en) * | 1989-02-22 | 1991-03-06 | Texas Instruments Incorporated | High reliability plastic package for integrated circuits |
JP2734463B2 (ja) * | 1989-04-27 | 1998-03-30 | 株式会社日立製作所 | 半導体装置 |
JPH0359972A (ja) * | 1989-07-27 | 1991-03-14 | Yazaki Corp | 電気接点 |
KR920000127A (ko) * | 1990-02-26 | 1992-01-10 | 미다 가쓰시게 | 반도체 패키지와 그것을 위한 리드프레임 |
US5175609A (en) * | 1991-04-10 | 1992-12-29 | International Business Machines Corporation | Structure and method for corrosion and stress-resistant interconnecting metallurgy |
-
1992
- 1992-10-13 EP EP92309314A patent/EP0537982A2/en not_active Ceased
- 1992-10-14 KR KR1019920018856A patent/KR960002495B1/ko not_active IP Right Cessation
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1994
- 1994-06-01 US US08/252,540 patent/US5521432A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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KR960002495B1 (ko) | 1996-02-17 |
US5521432A (en) | 1996-05-28 |
EP0537982A2 (en) | 1993-04-21 |
EP0537982A3 (ko) | 1994-02-16 |
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