KR920007801A - 화학흡착 단분자 누적막 및 그의 제조방법 - Google Patents
화학흡착 단분자 누적막 및 그의 제조방법 Download PDFInfo
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- KR920007801A KR920007801A KR1019910018799A KR910018799A KR920007801A KR 920007801 A KR920007801 A KR 920007801A KR 1019910018799 A KR1019910018799 A KR 1019910018799A KR 910018799 A KR910018799 A KR 910018799A KR 920007801 A KR920007801 A KR 920007801A
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- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
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- B82—NANOTECHNOLOGY
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
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- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
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- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00965—Uses not provided for elsewhere in C04B2111/00 for household applications, e.g. use of materials as cooking ware
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도(a) 내지 제1도(d)는 본 발명의 제1실시예에 있어서의 유기단분자막의 누적방법의 공정을 도시한 개략단면도.
제2도는 본 발명의 제2실시예에 있어서의 유기단분자막의 누적을 도시한 개략단면도.
제3도 내지 제5도는 본 발명의 제3실시예에 있어서의 유기단분자막의 누적방법의 공정을 도시한 개략단면도.
* 도면의 주요 부분에 대한 부호의 설명
1 : 기체 1' : 거울유리표면
2,12 : 수산기 3 : 클로로실란단분자막
4,13 : 실록산단분자막 5,12,14:불소를 함유하는 화학흡착 단분자막
11: 백미러
Claims (10)
- 기체표면에 화학결합으로 형성된 실록산계 단분자막과, 이 실록산계 단분자막상에 형성된 화학흡착단분자막으로 이루어진 화학흡착 단분자누적막.
- 제l항에 있어서, 상기 화합흡착 단분자막이 불소를 함유하는 것을 특징으로 하는 화학흡착 단분자누적막.
- 제1항에 있어서, 상기 기체표면과 실록산계 단분자막이 화학흡착 공유결합으로 형성되고, 실록산계단분자막과 화학흡착 단분자막이 화학흡착 공유결합으로 형성되는 것을 특징으로 하는 화학흡착 단분자누적막.
- 제1항에 있어서, 상기 기체가 금속, 세라믹 및 플라스틱으로 이루어진 군으로부터 선택된 부재인 것을 특징으로 하는 화학흡착 단분자누적막.
- 표면에 수산기를 함유하는 기체를, 분자중에 클로로실릴기를 함유하는 물질을 포함한 비수계 용매에 접촉시키는 공정과, 상기 기체를 비수계 유기용매를 사용하여 세정해서 반응하지 않고 기체에 남아있던 상기 물질을 제거하는 공정과, 일단부에 각각 클로실란기를 가지는 직쇄형상의 탄화수소분자로 이루어진 클로로실란계 계면활성제를, 상기 단분자막 형성공정후에 상기 기체상에 화학흡착시켜 단분자흡착막을·누적하는 공정을 포함하는 것을 특징으로 하는 화학흡착 단분자누적막의 제조방법.
- 제5항에 있어서, 상기 기체가 금속 및 세라믹으로 이루어진 군으로부터 선택된 부재인 것을 특징으로 하는 화학흡착 단분자누적막의 제조방법.
- 제5항에 있어서, 상기 기체가, 미리 표면을 산소를 포함하는 플라즈마분위기중에서 처리해서 친수화한 플라스틱 기체인 것을 특징으로 하는 화학흡착 단분자누적막의 제조방법.
- 제5항에 있어서, 상기 분자중에 클로로실릴기를 함유하는 SlC14, SiHC13, SiH2Cl2및 C1-(SiCl2O)nSiCI3(n은 정수)로 이루어진 군으로부터 선택된 부재인 것을 특징으로 하는 화학흡착 단분자누적막의제조방법.
- 제5항에 있어서, 상기 클로로실란계 계면활성제의 탄화수소사슬이 부분적으로 -CF2-기로 치환되어 있는 것을 특징으로 하는 화학흡착 단분자누적막의 제조방법.
- 제 5 항 또는 제 9 항에 있어서, 상기 클로로실란계 계면활성제가, CF3-(CF2)n-(R)m-SiXPC13-P(n은 0 또는 정수, R은 알킬기 또는 C=C, C≡C, 실리콘원자 또는 산소원자를 포함하는 치환기, m은 0 또는 1, X는 수소원자 또는 알킬기, 알콕시기, 불소를 함유한 알킬기 및 불소를 함유한 알콕시기로 이루어진군으로부터 선택된 치환기, P는 0,1 또는 2)인 것을 특징으로 하는 화학흡착 단분자누적막의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP90-289128 | 1990-10-25 | ||
JP28912890 | 1990-10-25 | ||
JP90-405754 | 1990-12-25 | ||
JP40575490 | 1990-12-25 | ||
JP3024025A JP2501248B2 (ja) | 1991-01-23 | 1991-01-23 | 単分子コ―ティング物体及びその製造方法 |
JP3024026A JPH089510B2 (ja) | 1991-01-23 | 1991-01-23 | 防汚性窯業製品およびその製造方法 |
JP91-24025 | 1991-01-23 | ||
JP91-24026 | 1991-01-23 | ||
JP91-8321 | 1991-01-28 | ||
JP3008321A JPH0791402B2 (ja) | 1991-01-28 | 1991-01-28 | 高分子組成物の製造方法 |
JP91-38137 | 1991-02-06 | ||
JP3038137A JPH0798026B2 (ja) | 1991-02-06 | 1991-02-06 | 調理器具およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
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KR920007801A true KR920007801A (ko) | 1992-05-27 |
KR950004153B1 KR950004153B1 (ko) | 1995-04-27 |
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Application Number | Title | Priority Date | Filing Date |
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KR1019910018799A KR950004153B1 (ko) | 1990-10-25 | 1991-10-25 | 화학흡착 단분자 누적막 및 그의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5380585A (ko) |
EP (1) | EP0484746B1 (ko) |
KR (1) | KR950004153B1 (ko) |
CA (1) | CA2054094C (ko) |
DE (1) | DE69122212T2 (ko) |
Families Citing this family (80)
Publication number | Priority date | Publication date | Assignee | Title |
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DE69129145T2 (de) * | 1990-12-25 | 1998-07-16 | Matsushita Electric Ind Co Ltd | Transparentes Substrat mit aufgebrachtem monomolekularem Film und Verfahren zu seiner Herstellung |
EP0501298B1 (en) * | 1991-02-27 | 1996-06-05 | Matsushita Electric Industrial Co., Ltd. | Self-lubricating device |
DE69220717T2 (de) * | 1991-04-30 | 1997-11-06 | Matsushita Electric Ind Co Ltd | Chemisch adsorbierte Schicht und Verfahren zu deren Herstellung |
US5372851A (en) * | 1991-12-16 | 1994-12-13 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a chemically adsorbed film |
US5869136A (en) * | 1992-02-27 | 1999-02-09 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a chemically adsorbed multilayer film |
US5552236A (en) * | 1992-03-16 | 1996-09-03 | Matsushita Electric Industrial Co., Ltd. | Organic magnetic film and method of manufacturing the same |
EP0571896B1 (en) * | 1992-05-27 | 1996-08-28 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a chemically adsorbed film |
FR2694369A1 (fr) * | 1992-07-29 | 1994-02-04 | Lyon Ecole Centrale | Procédé de lubrification d'une pièce mécanique de frottement. |
EP0606174A1 (fr) * | 1993-01-05 | 1994-07-13 | Elf Atochem S.A. | Solide muni d'une couche hydrophobe et oléophobe et procédé d'application de ladite couche |
US5888290A (en) * | 1996-05-24 | 1999-03-30 | Minnesota Mining And Manufacturing Company | Composition and process for imparting durable repellency to substrates |
TW422822B (en) * | 1996-04-04 | 2001-02-21 | Matsushita Electric Ind Co Ltd | Contamination-resistant float glass and process for producing the same as well as cooking device using said contamination-resistant float glass |
TW470861B (en) * | 1996-08-26 | 2002-01-01 | Matsushita Electric Ind Co Ltd | Chemical adsorption film, method of manufacturing the same, and chemical absorption solution used for the same |
US5948476A (en) | 1996-11-08 | 1999-09-07 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for producing molecular film |
JP3773340B2 (ja) * | 1996-12-18 | 2006-05-10 | 大日本印刷株式会社 | 低屈折率SiO2 膜及びその製造方法 |
US6482524B1 (en) | 1997-03-11 | 2002-11-19 | Nippon Sheet Glass Co., Ltd. | Substrate having a treatment surface |
US5955149A (en) * | 1997-05-23 | 1999-09-21 | Material Sciences Corporation | Method and composition for producing a release coating on a bakeware substrate |
FR2769318B1 (fr) * | 1997-10-06 | 1999-12-10 | Saint Gobain Vitrage | Revetement hydrophobe notamment pour vitrage |
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-
1991
- 1991-10-23 EP EP19910118094 patent/EP0484746B1/en not_active Expired - Lifetime
- 1991-10-23 DE DE1991622212 patent/DE69122212T2/de not_active Expired - Lifetime
- 1991-10-23 CA CA 2054094 patent/CA2054094C/en not_active Expired - Lifetime
- 1991-10-25 KR KR1019910018799A patent/KR950004153B1/ko not_active IP Right Cessation
-
1993
- 1993-03-26 US US08/037,727 patent/US5380585A/en not_active Expired - Lifetime
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1994
- 1994-09-30 US US08/316,105 patent/US5466486A/en not_active Expired - Lifetime
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DE69122212T2 (de) | 1997-01-30 |
US5380585A (en) | 1995-01-10 |
KR950004153B1 (ko) | 1995-04-27 |
US5466486A (en) | 1995-11-14 |
DE69122212D1 (de) | 1996-10-24 |
CA2054094C (en) | 1999-12-21 |
EP0484746B1 (en) | 1996-09-18 |
EP0484746A2 (en) | 1992-05-13 |
CA2054094A1 (en) | 1992-04-26 |
EP0484746A3 (en) | 1992-10-28 |
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