KR920004143A - 고열전도율 복합체 및 그 제조방법과 열전도복합층을 갖는 전자장치 - Google Patents

고열전도율 복합체 및 그 제조방법과 열전도복합층을 갖는 전자장치 Download PDF

Info

Publication number
KR920004143A
KR920004143A KR1019910014628A KR910014628A KR920004143A KR 920004143 A KR920004143 A KR 920004143A KR 1019910014628 A KR1019910014628 A KR 1019910014628A KR 910014628 A KR910014628 A KR 910014628A KR 920004143 A KR920004143 A KR 920004143A
Authority
KR
South Korea
Prior art keywords
metal substrate
composite
thermal conductivity
electronic device
high thermal
Prior art date
Application number
KR1019910014628A
Other languages
English (en)
Inventor
수팬 에드워드씨.
에프. 돌로위 제이알 조세프
에이. 웨브 브래들리
Original Assignee
라리 윌리엄 에반스
더 스탠다드 오일 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 라리 윌리엄 에반스, 더 스탠다드 오일 캄파니 filed Critical 라리 윌리엄 에반스
Publication of KR920004143A publication Critical patent/KR920004143A/ko

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3733Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon having a heterogeneous or anisotropic structure, e.g. powder or fibres in a matrix, wire mesh, porous structures
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C26/00Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3732Diamonds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12014All metal or with adjacent metals having metal particles
    • Y10T428/12028Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12049Nonmetal component
    • Y10T428/12056Entirely inorganic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Powder Metallurgy (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

내용 없음

Description

고열전도율 복합체 및 그 제조방법과 열전도복합층을 가는 전자장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (20)

  1. 금속기판; 및 다이아몬드 입자로 이루어지며, 상기 다이아몬드입자는 금소기판용의 보강부를 구성하고 1~50㎛범위의 입자크기를 갖는 고열전도율 복합체.
  2. 제1항에 있어서, 상기 다이아몬드 입자는 복합체의 약 5~80체적 퍼센트의 범위내인 고열전도율 복합체.
  3. 제1항에 있어서, 상기 다이아몬드 입자는 복합체의 약 10~30㎛ 범위내인 고열전도율 복합체.
  4. 제1항에 있어서, 상기 다이아몬드 입자는 약 1~10㎛ 범위내인 고열전도율 복합체.
  5. 제1항에 있어서, 상기 금속기판은 알루미늄의 고열전도율 복합체.
  6. 제1항에 있어서, 상기 금속기판은 마그네슘인 고열전도율 복합체.
  7. 제1항에 있어서, 상기 금속기판은 구리인 고열전도율 복합체.
  8. 제1항에 있어서, 상기 금속기판은 은인 고열전도율 복합체.
  9. 제1항에 있어서, 상기 금속기판은 Al,Ag,Cu,Mg 또는 이들의 합금으로 이루어진 군에서 선택되는 고열전도율 복합체.
  10. 1-50㎛의 입자크기를 갖는 다이아몬드 입자 5~80 체적 퍼센트를 금속분말과 혼합하여 분말 블렌드를 형성하고, 이블렌드를 가압하에 상승된 온도까지 가열하고 상기 분말을 강화하여 복합체를 형성하여 이루어 지는 고열전도율 다이아몬드/금속 복합체 제조방법.
  11. 제10항에 있어서, 상기 블렌드를 가압하에 금속기판을 용융시키기에 충분한 온도까지 가열하여 금속기판을 다이아몬드 입자들간의 공간부에 채우고, 이어서 온도를 낮추어 다이아몬드 입자 부근의 금속기판을 고화시키는 것을 더 포함하는 고열전도율 다이아몬드/금속 복합체 제조방법.
  12. 금속기판과 약 1~50㎛범위의 입자크기를 갖는 다이아몬드 입자로 이루어지는 열전도 복합층을 적어도 일면에 갖는 전자장치.
  13. 제12항에 있어서, 상기 복합층은 5~80체적 페센트의 다이아몬드 입자를 함유하는 전자장치.
  14. 제13항에 있어서, 상기 다이아몬드 입자는 1~40㎛의 입자범위를 갖는 전자장치.
  15. 제14항에 있어서, 상기 다이아몬드 입자는 10~30㎛의 입자범위를 갖는 전자장치.
  16. 제15항에 있어서, 상기 금속기판은 Al,Mg,Cu,,Ag 또는 이들의 합금으로 이루어지는 군에서 선택되는 전자 장치.
  17. 제15항에 있어서, 상기 금속기판은 Al인 전자장치.
  18. 제15항에 있어서, 상기 금속기판은 Mg인 전자장치.
  19. 제15항에 있어서, 상기 금속기판은 Cu인 전자장치.
  20. 제15항에 있어서, 상기 금속기판은 Ag인 전자장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910014628A 1990-08-27 1991-08-23 고열전도율 복합체 및 그 제조방법과 열전도복합층을 갖는 전자장치 KR920004143A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US573,609 1984-01-25
US07/573,609 US5045972A (en) 1990-08-27 1990-08-27 High thermal conductivity metal matrix composite

Publications (1)

Publication Number Publication Date
KR920004143A true KR920004143A (ko) 1992-03-27

Family

ID=24292685

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910014628A KR920004143A (ko) 1990-08-27 1991-08-23 고열전도율 복합체 및 그 제조방법과 열전도복합층을 갖는 전자장치

Country Status (5)

Country Link
US (1) US5045972A (ko)
EP (1) EP0475575A1 (ko)
JP (1) JPH04259305A (ko)
KR (1) KR920004143A (ko)
CA (1) CA2048005A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101161040B1 (ko) * 2004-04-29 2012-06-28 에꼴 뽈리떼끄닉 뻬데랄 드 로잔느 (으뻬에프엘) 붕소를 포함하는 다이아몬드-구리 복합 재료로 제조되는 히트 싱크

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5315480A (en) * 1991-11-14 1994-05-24 Digital Equipment Corporation Conformal heat sink for electronic module
US5366688A (en) * 1992-12-09 1994-11-22 Iowa State University Research Foundation, Inc. Heat sink and method of fabricating
US5523049A (en) * 1992-12-09 1996-06-04 Iowa State University Research Foundation, Inc. Heat sink and method of fabricating
US5677372A (en) * 1993-04-06 1997-10-14 Sumitomo Electric Industries, Ltd. Diamond reinforced composite material
US5455738A (en) * 1993-07-28 1995-10-03 E-Systems, Inc. High thermal conductivity, matched CTE. low density mounting plate for a semiconductor circuit
US5354717A (en) * 1993-07-29 1994-10-11 Motorola, Inc. Method for making a substrate structure with improved heat dissipation
US5388027A (en) * 1993-07-29 1995-02-07 Motorola, Inc. Electronic circuit assembly with improved heatsinking
EP0637078A1 (en) * 1993-07-29 1995-02-01 Motorola, Inc. A semiconductor device with improved heat dissipation
JP3617232B2 (ja) 1997-02-06 2005-02-02 住友電気工業株式会社 半導体用ヒートシンクおよびその製造方法ならびにそれを用いた半導体パッケージ
US6355086B2 (en) * 1997-08-12 2002-03-12 Rolls-Royce Corporation Method and apparatus for making components by direct laser processing
JP3893681B2 (ja) * 1997-08-19 2007-03-14 住友電気工業株式会社 半導体用ヒートシンクおよびその製造方法
US6147301A (en) * 1998-06-04 2000-11-14 Intel Corporation Graphite-fiber enhanced molded plastic for electronic enclosures
EP1167559B1 (en) * 1998-12-07 2006-03-08 Hitachi, Ltd. Composite material and use thereof
US6214263B1 (en) * 1999-02-12 2001-04-10 Chip Coolers, Inc. Method of molding a reinforced article
US6139783A (en) * 1999-02-12 2000-10-31 Chip Coolers, Inc. Method of molding a thermally conductive article
JP3690171B2 (ja) 1999-03-16 2005-08-31 株式会社日立製作所 複合材料とその製造方法及び用途
KR100460585B1 (ko) 1999-12-24 2004-12-09 니뽄 가이시 가부시키가이샤 히트 싱크재 및 그 제조 방법
US6540948B2 (en) * 2000-01-11 2003-04-01 Cool Options, Inc. Injection molding apparatus with bleed off pocket for overmolding heat pipes
US6482248B1 (en) * 2000-11-28 2002-11-19 Magnum Research, Inc. Aluminum composite for gun barrels
US6756005B2 (en) * 2001-08-24 2004-06-29 Cool Shield, Inc. Method for making a thermally conductive article having an integrated surface and articles produced therefrom
EP2428590B1 (en) 2001-11-09 2018-08-15 Sumitomo Electric Industries, Ltd. Sintered diamond having high thermal conductivity and method for producing the same and heat sink employing it
US6833617B2 (en) 2001-12-18 2004-12-21 Hitachi, Ltd. Composite material including copper and cuprous oxide and application thereof
AU2003284065A1 (en) * 2002-10-11 2005-05-05 Chien-Min Sung Carbonaceous heat spreader and associated methods
US7173334B2 (en) * 2002-10-11 2007-02-06 Chien-Min Sung Diamond composite heat spreader and associated methods
JP2004146413A (ja) * 2002-10-22 2004-05-20 Sumitomo Electric Ind Ltd 半導体素子収納用パッケージおよび半導体装置
US6727117B1 (en) 2002-11-07 2004-04-27 Kyocera America, Inc. Semiconductor substrate having copper/diamond composite material and method of making same
US7298046B2 (en) 2003-01-10 2007-11-20 Kyocera America, Inc. Semiconductor package having non-ceramic based window frame
AT7382U1 (de) * 2003-03-11 2005-02-25 Plansee Ag Wärmesenke mit hoher wärmeleitfähigkeit
US20060005900A1 (en) * 2003-09-27 2006-01-12 Dorfman Benjamin R High-alloy metals reinforced by diamond-like framework and method for making the same
AT7492U1 (de) * 2004-06-01 2005-04-25 Ceratizit Austria Gmbh Verschleissteil aus einem diamanthaltigen verbundwerkstoff
US20060086441A1 (en) * 2004-10-27 2006-04-27 University Of Cincinnati Particle reinforced noble metal matrix composite and method of making same
DE102004056734A1 (de) * 2004-11-24 2006-06-01 Vatcharachai Buanatra Diamantenformkörper
TW200631144A (en) * 2005-02-18 2006-09-01 Mitac Technology Corp Chip heat dissipation structure and manufacturing method thereof
TWI290012B (en) * 2005-03-03 2007-11-11 Mitac Technology Corp Printed circuit board structure and manufacturing method thereof
TW200634140A (en) * 2005-03-21 2006-10-01 Mitac Technology Corp Heat conduction interface structure and manufacturing process method thereof
US7695808B2 (en) * 2005-11-07 2010-04-13 3M Innovative Properties Company Thermal transfer coating
US7360581B2 (en) * 2005-11-07 2008-04-22 3M Innovative Properties Company Structured thermal transfer article
US20070199679A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Chip Heat Dissipation System and Manufacturing Method and Structure of Heat Dissipation Device Thereof
US20070201203A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Adhesion Material Structure and Process Method Thereof
US20070199677A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Heat Sink Fin Structure and Manufacturing Method Thereof
US20070199682A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Dissipation Heat Pipe Structure and Manufacturing Method Thereof
US20070199678A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Surface Coating Film Structure on Heat Dissipation Metal and Manufacturing Method Thereof
US20070201207A1 (en) * 2006-02-24 2007-08-30 Ming-Hang Hwang Chip Heat Dissipation System and Structure of Heat Exchange Device and Manufacturing Method Thereof
JP2008248324A (ja) * 2007-03-30 2008-10-16 Sps Syntex Inc ダイヤモンド粒子分散型金属基複合材料及びその製造方法
US7791188B2 (en) * 2007-06-18 2010-09-07 Chien-Min Sung Heat spreader having single layer of diamond particles and associated methods
US20100328895A1 (en) * 2007-09-11 2010-12-30 Dorab Bhagwagar Composite, Thermal Interface Material Containing the Composite, and Methods for Their Preparation and Use
JP2010539706A (ja) * 2007-09-11 2010-12-16 ダウ コーニング コーポレーション 放熱材料、該放熱材料を含む電子デバイス、ならびにそれらの調製方法および使用方法
EP2065734A1 (de) * 2007-11-30 2009-06-03 Plansee Se Spiegel zur Laserbearbeitung
DE102008010746A1 (de) * 2008-02-20 2009-09-03 I-Sol Ventures Gmbh Wärmespeicher-Verbundmaterial
US9017824B2 (en) 2008-07-17 2015-04-28 Denki Kagaku Kogyo Kabushiki Kaisha Aluminum-diamond composite and manufacturing method
US8763702B2 (en) * 2008-08-05 2014-07-01 Baker Hughes Incorporated Heat dissipater for electronic components in downhole tools and methods for using the same
US8790438B2 (en) * 2009-12-29 2014-07-29 Nokia Corporation Colored metal
US8778784B2 (en) 2010-09-21 2014-07-15 Ritedia Corporation Stress regulated semiconductor devices and associated methods
US9006086B2 (en) 2010-09-21 2015-04-14 Chien-Min Sung Stress regulated semiconductor devices and associated methods
CN103221180A (zh) 2010-09-21 2013-07-24 铼钻科技股份有限公司 具有基本平坦颗粒尖端的超研磨工具及其相关方法
US9328976B1 (en) 2013-04-18 2016-05-03 Mainstream Engineering Corporation Method for production of novel materials via ultra-high energy electron beam processing
WO2014200770A1 (en) * 2013-06-10 2014-12-18 Apple Inc. Method and apparatus for forming a gold metal matrix composite
CN104046833A (zh) * 2014-06-18 2014-09-17 南昌航空大学 一种高导热性能的金刚石/铜复合材料及其制备方法
US11025031B2 (en) 2016-11-29 2021-06-01 Leonardo Electronics Us Inc. Dual junction fiber-coupled laser diode and related methods
CN108380875B (zh) * 2018-03-13 2019-10-25 合肥工业大学 一种具有高热导的钨-镀钨金刚石复合材料及其制备方法
JP7253571B2 (ja) * 2018-05-09 2023-04-06 フラウンホッファー-ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ 複合光学ミラーのミラー支持体およびその製造方法
WO2020036998A1 (en) 2018-08-13 2020-02-20 Lasertel, Inc. Use of metal-core printed circuit board (pcb) for generation of ultra-narrow, high-current pulse driver
US11056854B2 (en) 2018-08-14 2021-07-06 Leonardo Electronics Us Inc. Laser assembly and related methods
US11296481B2 (en) 2019-01-09 2022-04-05 Leonardo Electronics Us Inc. Divergence reshaping array
US11752571B1 (en) 2019-06-07 2023-09-12 Leonardo Electronics Us Inc. Coherent beam coupler
WO2021205782A1 (ja) * 2020-04-09 2021-10-14 住友電気工業株式会社 複合材料、ヒートシンク及び半導体装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3306720A (en) * 1964-05-28 1967-02-28 Gen Electric Method for the production of diamond compact abrasives
US3650715A (en) * 1969-04-04 1972-03-21 Du Pont Abrasive compositions
US3912500A (en) * 1972-12-27 1975-10-14 Leonid Fedorovich Vereschagin Process for producing diamond-metallic materials
JPS6021942B2 (ja) * 1978-06-27 1985-05-30 三井金属鉱業株式会社 メタルボンドダイヤモンド焼結体およびその製造方法
US4333986A (en) * 1979-06-11 1982-06-08 Sumitomo Electric Industries, Ltd. Diamond sintered compact wherein crystal particles are uniformly orientated in a particular direction and a method for producing the same
SE457537B (sv) * 1981-09-04 1989-01-09 Sumitomo Electric Industries Diamantpresskropp foer ett verktyg samt saett att framstaella densamma
US4518659A (en) * 1982-04-02 1985-05-21 General Electric Company Sweep through process for making polycrystalline compacts
AU571419B2 (en) * 1984-09-08 1988-04-14 Sumitomo Electric Industries, Ltd. Diamond sintered for tools and method of manufacture
US4664705A (en) * 1985-07-30 1987-05-12 Sii Megadiamond, Inc. Infiltrated thermally stable polycrystalline diamond
JPS62249462A (ja) * 1986-04-23 1987-10-30 Hitachi Vlsi Eng Corp 半導体装置
US4782893A (en) * 1986-09-15 1988-11-08 Trique Concepts, Inc. Electrically insulating thermally conductive pad for mounting electronic components
US5008737A (en) * 1988-10-11 1991-04-16 Amoco Corporation Diamond composite heat sink for use with semiconductor devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101161040B1 (ko) * 2004-04-29 2012-06-28 에꼴 뽈리떼끄닉 뻬데랄 드 로잔느 (으뻬에프엘) 붕소를 포함하는 다이아몬드-구리 복합 재료로 제조되는 히트 싱크

Also Published As

Publication number Publication date
US5045972A (en) 1991-09-03
CA2048005A1 (en) 1992-02-28
JPH04259305A (ja) 1992-09-14
EP0475575A1 (en) 1992-03-18

Similar Documents

Publication Publication Date Title
KR920004143A (ko) 고열전도율 복합체 및 그 제조방법과 열전도복합층을 갖는 전자장치
US5120495A (en) High thermal conductivity metal matrix composite
Zhang et al. A study on the resistivity and mechanical properties of modified nano-Ag coated Cu particles in electrically conductive adhesives
KR910011642A (ko) 은-금속 산화물 복합 재료 및 이의 제조방법
KR880001840A (ko) 양극 분산법(가루화 법)에 의해서 생성된 적어도 하나의 마찰면을 함유하는 결합합성물질, 이의 제조방법 및 이의 용도
KR970033481A (ko) 개선된 성질을 갖는 연마용 콤팩트의 제조 방법
KR890014205A (ko) 접합 및 시일용 저독성 합금 조성물
KR970071856A (ko) 투명 도전막 형성용 도포액, 이를 이용한 투명 도전막 및 그 형성방법
WO2001056782A3 (en) Improved electrical conductivity and high strength aluminium alloy composite material and methods of manufacturing and use
EP0332384A3 (en) A circuit system, a composite metal material for use therein, and a method for making the material
KR920000426A (ko) 은 또는 은-구리 합금 금속 산화물 복합 재료 및 그 제조 방법
JPH06244330A (ja) 電子回路装置で使用される熱管理複合材料とその製造方法
US4678720A (en) Silver-copper-titanium brazing alloy
US4793967A (en) Cermet substrate with spinel adhesion component
KR920012494A (ko) 복합 슬라이딩 부재 및 그 제조방법
CN201413076Y (zh) 一种散热结构
KR910016950A (ko) 복합화 재료의 제조방법 및 수열재료(受熱材料)와 수열재료의 제조방법
KR960705952A (ko) 은/게르마늄 합금을 사용하는 확산법에 의한 재료의 접합방법 및 이에 사용되는 은/게르마늄 합금(a method for joining materials together by a diffusion process using silver/germanium alloys and a silver/germanium alloy for use in the method)
KR910009794A (ko) 미립자를 분산시킨 고분자 복합물과 그 제조 방법
CH652737A5 (de) Metallische, silberhaltige paste mit glas und ihre verwendung zum befestigen elektronischer bauteile.
KR920001579A (ko) 진공 인터럽터용 접점
US3294530A (en) Flash sintering
Prasad et al. The nature of non-equilibrium solidification of undercooled AgCu alloys in contact with primary copper dendrites
JPS575834A (en) Heat resistant cu alloy having high electric conductivity
Li et al. Fabrication and application of co-continuous Al2O3/Al composite by reactive infiltration of molten Al into the preform of SiO2 with cordierite addition

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid