KR910003804A - 전력 ic의 과열검출회로 및 그의 구조 - Google Patents

전력 ic의 과열검출회로 및 그의 구조 Download PDF

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Publication number
KR910003804A
KR910003804A KR1019900010934A KR900010934A KR910003804A KR 910003804 A KR910003804 A KR 910003804A KR 1019900010934 A KR1019900010934 A KR 1019900010934A KR 900010934 A KR900010934 A KR 900010934A KR 910003804 A KR910003804 A KR 910003804A
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South Korea
Prior art keywords
temperature
circuit
detection
power
junction
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KR1019900010934A
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English (en)
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KR0138646B1 (ko
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다쯔히꼬 후지히라
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나까오 다께시
후지덴끼 가부시기가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
    • G01K7/01—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using semiconducting elements having PN junctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0638—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402—Field plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/732—Vertical transistors
    • H01L29/7322—Vertical transistors having emitter-base and base-collector junctions leaving at the same surface of the body, e.g. planar transistor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/8611—Planar PN junction diodes
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
    • H02H5/00—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal non-electric working conditions with or without subsequent reconnection
    • H02H5/04—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal non-electric working conditions with or without subsequent reconnection responsive to abnormal temperature
    • H02H5/044—Emergency protective circuit arrangements for automatic disconnection directly responsive to an undesired change from normal non-electric working conditions with or without subsequent reconnection responsive to abnormal temperature using a semiconductor device to sense the temperature

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
  • Protection Of Static Devices (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

내용 없음.

Description

전력 IC의 과열검출회로 및 그의 구조
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명의 제1실시예의 과열검출회로를 표시한 회로구성도,
제3도는 제2도의 실시예의 동작을 표시하는 설명도,
제6도는 본발명의 제1 및 제2실시예의 구조를 표시하는 요부의 단면도,
제7도는 비교예의 구조를 표시하는 요부의 단면도.

Claims (3)

  1. 전력 IC와 공통 기판상에 형성되어 전력 IC의 과열을 검출하는 회로로서, 역바이어스된 접합과, 이 접합의 온도에 따라서 변화하는 역누설전류를 소정레벨로 증폭하는 바이폴라트랜지스터와, 이접합의 온도에 따라서 변화하는 역누설전류를 소정레벨로 증폭하는 바이폴라 트랜지스터와, 증폭된 전류를 정전류회로의 전위강하로서 검출하여 검출전압치가 미리정한 소정레벨을 초과했을 때 상기 전력 IC가 과열온도에 도달한 것으로 판단하고 신호를 발생하는 판단회로를 구비한 것을 특징으로 하는 전력 IC의 과열검출회로.
  2. 전력 IC와 공통의 기판상에 형성되어 전력 IC의 과열을 검출하는 회로로서 역 바이어스된 접합과, 이 접합의 온도에 따라서 변화하는 역누설전류를 소정레벨로 증폭하는 바이폴라 트랜지스터와, 증폭된 전류를 정전류회로의 전위강하로서 검출하여 검출전압치가 미리정한 소정레벨을 초과하였을 때 신호를 발하는 판단회로를 가지는 서로 검출회로가 상이한 한쌍의 검출회로로 이루어지고, 검출온도가 과열온도영역에 있는 제1검출회로, 및 제1검출회로보다 소정레벨만큼 검출온도가 낮은 제2검출회로와, 상기 전력 IC의 온도 상승시에는 상기 제1검출회로의 검출온도를 초과한 것을 그 출력신호에 의하여 감지하여 과열을 통지하는 신호를 출력하고, 온도의 하강시에는 상기 제2검출회로의 검출온도 이하로 저하한 것을 그 출력신호로부터 감지할때까지 상기 과열을 통지하는 신호를 지속적으로 출력하는 히스테리시스 회로를 구비한 것을 특징으로 하는 과열검출회로.
  3. 역바이스된 접합이 형성된 반도체표면에서, 상기 접합을 형성하는 제1층에 접속된 배선층과 상기접합을 형성하는 제2층 사이에 도전성을 가지는 제3층을 설치하여, 이 제3층을 상기 제2층에 전기적으로 접속한 것을 특징으로 하는 청구범위 제1 또는 제2항기재의 전력 IC의 과열검출회로의 구조.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900010934A 1989-07-19 1990-07-19 전력 ic 의 과열검출회로 및 그 구조 KR0138646B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP18695189 1989-07-19
JP1-186951 1989-07-19
JP2053086A JP2794880B2 (ja) 1989-07-19 1990-03-05 パワーｉｃの過熱検出回路とその構造
JP2-53086 1990-03-05

Publications (2)

Publication Number Publication Date
KR910003804A true KR910003804A (ko) 1991-02-28
KR0138646B1 KR0138646B1 (ko) 1998-04-27

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Application Number Title Priority Date Filing Date
KR1019900010934A KR0138646B1 (ko) 1989-07-19 1990-07-19 전력 ic 의 과열검출회로 및 그 구조

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EP (1) EP0617497B1 (ko)
JP (1) JP2794880B2 (ko)
KR (1) KR0138646B1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998012815A1 (de) * 1996-09-18 1998-03-26 Siemens Aktiengesellschaft Temperaturgeschütztes elektrisches schalter-bauelement
DE69839469D1 (de) * 1997-02-19 2008-06-26 Nxp Bv Leistungshalbleiterbauelemente mit einem temperatursensorschaltkreis
DE19743253A1 (de) * 1997-09-30 1999-04-08 Siemens Ag Verfahren zum Schutz von Schaltungskomponenten einer integrierten Schaltung gegen zu hohe Betriebstemperaturen sowie entsprechend ausgelegte Schutzschaltung
DE102005039685B4 (de) * 2005-08-22 2007-10-11 Siemens Ag Verfahren zur Identifizierung eines kontrastierten Blutgefäßes in digitalen Bilddaten
KR100900266B1 (ko) * 2007-06-26 2009-05-29 (주)태진기술 과열방지회로
JP5034919B2 (ja) * 2007-12-13 2012-09-26 富士電機株式会社 温度センサ回路
US11213448B2 (en) 2017-07-31 2022-01-04 Allen Medical Systems, Inc. Rotation lockout for surgical support
US20220140826A1 (en) * 2020-10-29 2022-05-05 Texas Instruments Incorporated Temperature control for power devices
US20230006666A1 (en) * 2021-06-30 2023-01-05 Texas Instruments Incorporated Temperature sensors

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4345218A (en) * 1980-09-08 1982-08-17 National Semiconductor Corporation Two stage thermal shutdown
JPS583394A (ja) * 1981-06-29 1983-01-10 Toshiba Corp 圧電振動子の製造方法
JPS59223802A (ja) * 1983-06-02 1984-12-15 Ricoh Co Ltd 温度コントロ−ル装置
JPS61279901A (ja) * 1985-06-05 1986-12-10 Chino Corp 調節計
JPS6271827A (ja) * 1985-09-26 1987-04-02 Seiko Epson Corp 温度検出回路
US4730228A (en) * 1986-03-21 1988-03-08 Siemens Aktiengesellschaft Overtemperature detection of power semiconductor components
JPS63211664A (ja) * 1987-02-27 1988-09-02 Hitachi Ltd 半導体集積回路装置

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Publication number Publication date
EP0617497B1 (en) 1997-11-19
EP0617497A1 (en) 1994-09-28
JP2794880B2 (ja) 1998-09-10
KR0138646B1 (ko) 1998-04-27
JPH03148861A (ja) 1991-06-25

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