KR910001523B1 - Uv 감수성 중합체를 포함하는 코우팅 조성물과 그 중합체의 제조방법 - Google Patents

Uv 감수성 중합체를 포함하는 코우팅 조성물과 그 중합체의 제조방법 Download PDF

Info

Publication number
KR910001523B1
KR910001523B1 KR1019870014055A KR870014055A KR910001523B1 KR 910001523 B1 KR910001523 B1 KR 910001523B1 KR 1019870014055 A KR1019870014055 A KR 1019870014055A KR 870014055 A KR870014055 A KR 870014055A KR 910001523 B1 KR910001523 B1 KR 910001523B1
Authority
KR
South Korea
Prior art keywords
diisocyanate
reaction mixture
alpha
carbon atoms
acid
Prior art date
Application number
KR1019870014055A
Other languages
English (en)
Korean (ko)
Other versions
KR880014415A (ko
Inventor
세타카이아논 송비트
Original Assignee
암스트롱 월드 인더스트리이즈 인코포레이팃드
클라우드 엘 보드인
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 암스트롱 월드 인더스트리이즈 인코포레이팃드, 클라우드 엘 보드인 filed Critical 암스트롱 월드 인더스트리이즈 인코포레이팃드
Publication of KR880014415A publication Critical patent/KR880014415A/ko
Application granted granted Critical
Publication of KR910001523B1 publication Critical patent/KR910001523B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
KR1019870014055A 1986-12-08 1987-12-08 Uv 감수성 중합체를 포함하는 코우팅 조성물과 그 중합체의 제조방법 KR910001523B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US45464 1979-06-04
US93960486A 1986-12-08 1986-12-08
US939604 1986-12-08
US4546487A 1987-05-04 1987-05-04

Publications (2)

Publication Number Publication Date
KR880014415A KR880014415A (ko) 1988-12-23
KR910001523B1 true KR910001523B1 (ko) 1991-03-15

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870014055A KR910001523B1 (ko) 1986-12-08 1987-12-08 Uv 감수성 중합체를 포함하는 코우팅 조성물과 그 중합체의 제조방법

Country Status (13)

Country Link
KR (1) KR910001523B1 (xx)
CN (1) CN1031227C (xx)
BR (1) BR8706609A (xx)
CA (1) CA1332093C (xx)
CH (1) CH680622A5 (xx)
DE (1) DE3741385C2 (xx)
FR (1) FR2607820B1 (xx)
GB (1) GB2199335B (xx)
HK (1) HK60692A (xx)
IT (1) IT1233418B (xx)
MX (1) MX168832B (xx)
NL (1) NL190785C (xx)
SG (1) SG61192G (xx)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (ko) * 1990-02-20 1991-12-20 우메모토 요시마사 수용성 광경화성 폴리우레탄 폴리(메트)아크릴레이트, 그것을 함유한 접착제 및 라미네이트된 물품의 제조방법
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
US6747088B1 (en) 1999-09-30 2004-06-08 Basf Aktiengesellschaft Aqueous polyurethane dispersions which can be hardened with mit UV-radiation and thermally, and use thereof
TW201220974A (en) * 2010-05-21 2012-05-16 Nano Terra Inc Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
DE3676054D1 (de) * 1985-05-17 1991-01-17 Atochem North America Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind.

Also Published As

Publication number Publication date
HK60692A (en) 1992-08-21
NL190785B (nl) 1994-03-16
GB8728631D0 (en) 1988-01-13
NL8702942A (nl) 1988-07-01
CN87107321A (zh) 1988-06-22
KR880014415A (ko) 1988-12-23
MX168832B (es) 1993-06-10
IT1233418B (it) 1992-03-31
DE3741385A1 (de) 1988-06-09
SG61192G (en) 1992-09-04
GB2199335B (en) 1991-01-09
FR2607820B1 (fr) 1994-06-10
CN1031227C (zh) 1996-03-06
CA1332093C (en) 1994-09-20
CH680622A5 (xx) 1992-09-30
FR2607820A1 (fr) 1988-06-10
IT8722899A0 (it) 1987-12-04
NL190785C (nl) 1994-08-16
BR8706609A (pt) 1988-07-19
DE3741385C2 (de) 1996-06-05
GB2199335A (en) 1988-07-06

Similar Documents

Publication Publication Date Title
US5089376A (en) Photoimagable solder mask coating
TWI417660B (zh) A photohardenable thermosetting resin composition and a printed circuit board obtained using the same
TWI426347B (zh) A photosensitive resin composition, and a flexible circuit board using the same
US5942371A (en) Aqueous acrylic photopolymerisable compositions
KR20090058520A (ko) 광 경화성 수지 조성물, 드라이 필름, 경화물 및 인쇄 배선판
TW200813620A (en) Alkali developable solder resist, cured product of the same and printed wiring board obtained using the same
KR100325670B1 (ko) 수지조성물
KR101002832B1 (ko) 감광성 수지 조성물 및 이것을 이용한 감광성 엘리먼트
CN103135352A (zh) 导电性树脂组合物以及导电电路
US5102774A (en) Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions
KR910001523B1 (ko) Uv 감수성 중합체를 포함하는 코우팅 조성물과 그 중합체의 제조방법
JP2003277437A (ja) 官能化ポリマー
JP4257780B2 (ja) 感光性樹脂組成物、その硬化物、及びその用途
JP2007219334A (ja) 感光性樹脂組成物、並びにその硬化物
JP3288140B2 (ja) ソルダーレジスト用インキ組成物
JPH06166843A (ja) 光硬化性液状ソルダーレジスト用インキ組成物
JPH01948A (ja) 感光性樹脂組成物
JP3072811B2 (ja) 液状レジストインク組成物及びプリント回路基板
JPH0141185B2 (xx)
JPH04270345A (ja) 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
TW200304451A (en) Curable resin and curable resin composition containing the same
JPS6125139A (ja) 感光性樹脂組成物
JPH0435062B2 (xx)
JP3740208B2 (ja) 光重合性組成物
JPH05179158A (ja) 樹脂組成物、ソルダーレジスト樹脂組成物及びその硬化物

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee