NL190785B - Lichtgevoelige bekledingssamenstelling en werkwijze voor het bereiden van een lichtgevoelig polymeer. - Google Patents

Lichtgevoelige bekledingssamenstelling en werkwijze voor het bereiden van een lichtgevoelig polymeer.

Info

Publication number
NL190785B
NL190785B NLAANVRAGE8702942,A NL8702942A NL190785B NL 190785 B NL190785 B NL 190785B NL 8702942 A NL8702942 A NL 8702942A NL 190785 B NL190785 B NL 190785B
Authority
NL
Netherlands
Prior art keywords
photosensitive
preparing
coating composition
polymer
photosensitive polymer
Prior art date
Application number
NLAANVRAGE8702942,A
Other languages
English (en)
Other versions
NL190785C (nl
NL8702942A (nl
Original Assignee
Armstrong World Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Ind Inc filed Critical Armstrong World Ind Inc
Publication of NL8702942A publication Critical patent/NL8702942A/nl
Publication of NL190785B publication Critical patent/NL190785B/nl
Application granted granted Critical
Publication of NL190785C publication Critical patent/NL190785C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
NL8702942A 1986-12-08 1987-12-07 Lichtgevoelige bekledingssamenstelling en werkwijze voor het bereiden van een lichtgevoelig polymeer. NL190785C (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US93960486 1986-12-08
US4546487A 1987-05-04 1987-05-04
US4546487 1987-05-04

Publications (3)

Publication Number Publication Date
NL8702942A NL8702942A (nl) 1988-07-01
NL190785B true NL190785B (nl) 1994-03-16
NL190785C NL190785C (nl) 1994-08-16

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8702942A NL190785C (nl) 1986-12-08 1987-12-07 Lichtgevoelige bekledingssamenstelling en werkwijze voor het bereiden van een lichtgevoelig polymeer.

Country Status (13)

Country Link
KR (1) KR910001523B1 (nl)
CN (1) CN1031227C (nl)
BR (1) BR8706609A (nl)
CA (1) CA1332093C (nl)
CH (1) CH680622A5 (nl)
DE (1) DE3741385C2 (nl)
FR (1) FR2607820B1 (nl)
GB (1) GB2199335B (nl)
HK (1) HK60692A (nl)
IT (1) IT1233418B (nl)
MX (1) MX168832B (nl)
NL (1) NL190785C (nl)
SG (1) SG61192G (nl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0443537A3 (en) * 1990-02-20 1992-05-06 Takeda Chemical Industries, Ltd. Water soluble photocurable polyurethane poly(meth-)acrylate, adhesives containing the same, and production of laminated articles
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
WO2001023453A1 (de) * 1999-09-30 2001-04-05 Basf Aktiengesellschaft Mit uv-strahlung und thermisch härtbare wässrige polyurethandispersionen sowie deren verwendung
US20120097329A1 (en) * 2010-05-21 2012-04-26 Merck Patent Gesellschaft Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
AU597257B2 (en) * 1985-05-17 1990-05-31 M And T Chemicals Inc. Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings

Also Published As

Publication number Publication date
SG61192G (en) 1992-09-04
CH680622A5 (nl) 1992-09-30
DE3741385A1 (de) 1988-06-09
DE3741385C2 (de) 1996-06-05
MX168832B (es) 1993-06-10
GB8728631D0 (en) 1988-01-13
BR8706609A (pt) 1988-07-19
KR910001523B1 (ko) 1991-03-15
NL190785C (nl) 1994-08-16
KR880014415A (ko) 1988-12-23
IT1233418B (it) 1992-03-31
FR2607820B1 (fr) 1994-06-10
IT8722899A0 (it) 1987-12-04
GB2199335B (en) 1991-01-09
GB2199335A (en) 1988-07-06
FR2607820A1 (fr) 1988-06-10
NL8702942A (nl) 1988-07-01
CN87107321A (zh) 1988-06-22
CA1332093C (en) 1994-09-20
HK60692A (en) 1992-08-21
CN1031227C (zh) 1996-03-06

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee

Effective date: 20000701