MX168832B - Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta - Google Patents

Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta

Info

Publication number
MX168832B
MX168832B MX009667A MX966787A MX168832B MX 168832 B MX168832 B MX 168832B MX 009667 A MX009667 A MX 009667A MX 966787 A MX966787 A MX 966787A MX 168832 B MX168832 B MX 168832B
Authority
MX
Mexico
Prior art keywords
reaction mixture
component
carboxylated
hydroxyalkyl
carbon atoms
Prior art date
Application number
MX009667A
Other languages
English (en)
Inventor
Songvit Setthachayanon
Original Assignee
Armstrong World Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Ind Inc filed Critical Armstrong World Ind Inc
Publication of MX168832B publication Critical patent/MX168832B/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)

Abstract

La presente invención se refiere a una composición de revestimiento fotoreproducible o fotosencible caracterizada porque comprende un polímero seleccionado a partir del grupo que consiste de un dimetacrilato de uretano carboxilado, un diacrilato de uretano carboxilado, un triacrilado triaquilato de uretano carboxilado, y un trimetacrilato de uretano carboxilado; el polímero sencible a la radiación ultravioleta se prepara condensando una mezcla de reaccion que comprende (a) un diisiocianato que tiene desde 6 hasta 18 átomos de carbono, el componente (b), un poliol de ácido carboxílico que tiene la formula [OH] x-R6-COOH; en la que x puede ser un entero de 2 a 5, y en la que R6 es una fracción de hidrocarburo lineal o ramificado, saturada, insaturada o aromática que tiene desde 2 hasta 29 átomos de carbono y el componente (c), un miembro seleccionad a partir del grupo que consiste de un diacrilato de hidroxialquilo, un diametacrilato de hidroxialquilo, un triacrilato de hidroxialquilo, y un hidroxialquiltrimetacrilato. en el que cada alquilo tiene desde 2 hasta 28 átomos de carbono; siempre y cuando el com`ponente (a) esté presente en una cantidad de desde aproximadamente 30 hasta aproximadamente 80 por ciento por peso de la cantidad total de la mezcla de reacción; el componente (b) esté presente con una cantidad de desde aproximadamente 5 hasta aproximadamente 45 por ciento por peso de la cantidad total de la mezcla de reacción con un mínimo de 0.5 miliequivalentes de acrilato por gramo de la cantidad total de la mezcla de reacción.
MX009667A 1986-12-08 1987-12-08 Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta MX168832B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US4546487A 1987-05-04 1987-05-04

Publications (1)

Publication Number Publication Date
MX168832B true MX168832B (es) 1993-06-10

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
MX009667A MX168832B (es) 1986-12-08 1987-12-08 Composicion de revestimiento fotosencible y metodo para para la preparacion de un polimero sensible a la radiacion ultravioleta

Country Status (13)

Country Link
KR (1) KR910001523B1 (es)
CN (1) CN1031227C (es)
BR (1) BR8706609A (es)
CA (1) CA1332093C (es)
CH (1) CH680622A5 (es)
DE (1) DE3741385C2 (es)
FR (1) FR2607820B1 (es)
GB (1) GB2199335B (es)
HK (1) HK60692A (es)
IT (1) IT1233418B (es)
MX (1) MX168832B (es)
NL (1) NL190785C (es)
SG (1) SG61192G (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (ko) * 1990-02-20 1991-12-20 우메모토 요시마사 수용성 광경화성 폴리우레탄 폴리(메트)아크릴레이트, 그것을 함유한 접착제 및 라미네이트된 물품의 제조방법
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
ATE385241T1 (de) * 1999-09-30 2008-02-15 Basf Ag Mit uv-strahlung und thermisch härtbare wässrige polyurethandispersionen sowie deren verwendung
TW201220974A (en) * 2010-05-21 2012-05-16 Nano Terra Inc Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
DE3676054D1 (de) * 1985-05-17 1991-01-17 Atochem North America Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind.

Also Published As

Publication number Publication date
KR910001523B1 (ko) 1991-03-15
CN1031227C (zh) 1996-03-06
SG61192G (en) 1992-09-04
CH680622A5 (es) 1992-09-30
GB2199335A (en) 1988-07-06
FR2607820B1 (fr) 1994-06-10
FR2607820A1 (fr) 1988-06-10
NL190785C (nl) 1994-08-16
DE3741385C2 (de) 1996-06-05
GB2199335B (en) 1991-01-09
CA1332093C (en) 1994-09-20
GB8728631D0 (en) 1988-01-13
BR8706609A (pt) 1988-07-19
IT1233418B (it) 1992-03-31
IT8722899A0 (it) 1987-12-04
KR880014415A (ko) 1988-12-23
DE3741385A1 (de) 1988-06-09
NL190785B (nl) 1994-03-16
HK60692A (en) 1992-08-21
CN87107321A (zh) 1988-06-22
NL8702942A (nl) 1988-07-01

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