CA1332093C - Photoimagable solder mask coating - Google Patents

Photoimagable solder mask coating

Info

Publication number
CA1332093C
CA1332093C CA000550900A CA550900A CA1332093C CA 1332093 C CA1332093 C CA 1332093C CA 000550900 A CA000550900 A CA 000550900A CA 550900 A CA550900 A CA 550900A CA 1332093 C CA1332093 C CA 1332093C
Authority
CA
Canada
Prior art keywords
reaction mixture
alpha
diisocyanate
carbon atoms
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA000550900A
Other languages
English (en)
French (fr)
Inventor
Songvit Setthachayanon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Armstrong World Industries Inc
Original Assignee
Armstrong World Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Industries Inc filed Critical Armstrong World Industries Inc
Application granted granted Critical
Publication of CA1332093C publication Critical patent/CA1332093C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
CA000550900A 1986-12-08 1987-11-03 Photoimagable solder mask coating Expired - Fee Related CA1332093C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US939,604 1986-12-08
US4546487A 1987-05-04 1987-05-04
US45,464 1987-05-04

Publications (1)

Publication Number Publication Date
CA1332093C true CA1332093C (en) 1994-09-20

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000550900A Expired - Fee Related CA1332093C (en) 1986-12-08 1987-11-03 Photoimagable solder mask coating

Country Status (13)

Country Link
KR (1) KR910001523B1 (es)
CN (1) CN1031227C (es)
BR (1) BR8706609A (es)
CA (1) CA1332093C (es)
CH (1) CH680622A5 (es)
DE (1) DE3741385C2 (es)
FR (1) FR2607820B1 (es)
GB (1) GB2199335B (es)
HK (1) HK60692A (es)
IT (1) IT1233418B (es)
MX (1) MX168832B (es)
NL (1) NL190785C (es)
SG (1) SG61192G (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (ko) * 1990-02-20 1991-12-20 우메모토 요시마사 수용성 광경화성 폴리우레탄 폴리(메트)아크릴레이트, 그것을 함유한 접착제 및 라미네이트된 물품의 제조방법
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
ATE385241T1 (de) * 1999-09-30 2008-02-15 Basf Ag Mit uv-strahlung und thermisch härtbare wässrige polyurethandispersionen sowie deren verwendung
TW201220974A (en) * 2010-05-21 2012-05-16 Nano Terra Inc Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
DE3676054D1 (de) * 1985-05-17 1991-01-17 Atochem North America Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind.

Also Published As

Publication number Publication date
KR910001523B1 (ko) 1991-03-15
CN1031227C (zh) 1996-03-06
SG61192G (en) 1992-09-04
CH680622A5 (es) 1992-09-30
GB2199335A (en) 1988-07-06
FR2607820B1 (fr) 1994-06-10
FR2607820A1 (fr) 1988-06-10
NL190785C (nl) 1994-08-16
DE3741385C2 (de) 1996-06-05
GB2199335B (en) 1991-01-09
MX168832B (es) 1993-06-10
GB8728631D0 (en) 1988-01-13
BR8706609A (pt) 1988-07-19
IT1233418B (it) 1992-03-31
IT8722899A0 (it) 1987-12-04
KR880014415A (ko) 1988-12-23
DE3741385A1 (de) 1988-06-09
NL190785B (nl) 1994-03-16
HK60692A (en) 1992-08-21
CN87107321A (zh) 1988-06-22
NL8702942A (nl) 1988-07-01

Similar Documents

Publication Publication Date Title
US5089376A (en) Photoimagable solder mask coating
CA1136796A (en) Photopolymerisable compositions
US4874799A (en) Aqueous akaline developable, UV curable urethane acrylate compounds and compositions useful for forming liquid 100 percent solids, solvent-free solder mask coatings
US4666821A (en) Photopolymer for use as a solder mask
JPS6142954B2 (es)
JPS6156247B2 (es)
US5102774A (en) Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions
CA2081931A1 (en) Carboxyl-containing plasticizers in dry film photopolymerizable compositions
CA1332093C (en) Photoimagable solder mask coating
CA1123547A (en) Radiation curable composition
EP0154237A2 (en) Photopolymer for use as a solder mask
WO2005121897A1 (en) Negative acting photoresist with improved blocking resistance
JP3846856B2 (ja) アルカリ水溶液可溶性ウレタン化エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物
US6268111B1 (en) Photoimageable composition having photopolymerizeable binder oligomer
TW525039B (en) Photoimageable composition containing flexible oligomer
JPH02146043A (ja) 感光性樹脂組成物及びこれを用いた感光性樹脂版材
JP2000199959A (ja) 改良された剥離性及び解像度を有する光画像形成性組成物
JPH0141185B2 (es)
JP4017055B2 (ja) （メタ）アクリル酸エステル、これを用いた樹脂組成物
JPH01948A (ja) 感光性樹脂組成物
JPH11217414A (ja) 感光性樹脂組成物、その製造法及びこれを用いたソルダーレジストの製造法
JP4017056B2 (ja) （メタ）アクリル酸エステル、これを用いた樹脂組成物
JP3164004B2 (ja) 活性エネルギー線硬化性樹脂組成物
JPH06157965A (ja) 液状レジストインク組成物及びプリント回路基板
JPS63220240A (ja) ポジ型フオトレジスト樹脂組成物

Legal Events

Date Code Title Description
MKLA Lapsed