DE3676054D1 - Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind. - Google Patents
Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind.Info
- Publication number
- DE3676054D1 DE3676054D1 DE8686903785T DE3676054T DE3676054D1 DE 3676054 D1 DE3676054 D1 DE 3676054D1 DE 8686903785 T DE8686903785 T DE 8686903785T DE 3676054 T DE3676054 T DE 3676054T DE 3676054 D1 DE3676054 D1 DE 3676054D1
- Authority
- DE
- Germany
- Prior art keywords
- urethanic
- curable
- aqueous alkali
- compositions suitable
- acrylate compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/343—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
- C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/4263—Polycondensates having carboxylic or carbonic ester groups in the main chain containing carboxylic acid groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/68—Unsaturated polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/735,411 US4717740A (en) | 1985-05-17 | 1985-05-17 | Aqueous alkaline developable, UV curable urethane acrylate compounds and compositions useful for forming solder mask coatings |
US06/747,090 US4753860A (en) | 1985-06-20 | 1985-06-20 | UV curable compositions for making improved solder mask coatings |
US06/747,478 US4614704A (en) | 1985-06-21 | 1985-06-21 | Stable UV curable compositions comprising triphenyl phosphite for forming solder mask coatings of high cure depth |
PCT/US1986/001012 WO1986006730A1 (en) | 1985-05-17 | 1986-05-07 | Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3676054D1 true DE3676054D1 (de) | 1991-01-17 |
Family
ID=27419196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686903785T Expired - Fee Related DE3676054D1 (de) | 1985-05-17 | 1986-05-07 | Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind. |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0222878B1 (de) |
AU (1) | AU597257B2 (de) |
CA (1) | CA1255692A (de) |
DE (1) | DE3676054D1 (de) |
PH (1) | PH23679A (de) |
WO (1) | WO1986006730A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1332093C (en) * | 1986-12-08 | 1994-09-20 | Songvit Setthachayanon | Photoimagable solder mask coating |
DE3916340A1 (de) * | 1989-05-19 | 1990-11-22 | Huels Chemische Werke Ag | Verfahren zur herstellung waessriger, strahlenhaertbarer urethanacrylatdispersionen |
DE3927632A1 (de) * | 1989-08-22 | 1991-02-28 | Basf Ag | Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material |
US5661213A (en) * | 1992-08-06 | 1997-08-26 | Rohm And Haas Company | Curable aqueous composition and use as fiberglass nonwoven binder |
DE4404616A1 (de) * | 1994-02-14 | 1995-08-17 | Bayer Ag | Verwendung von UV-härtbaren Beschichtungsmitteln zur Beschichtung von Polycarbonatformkörpern |
US5436112A (en) * | 1994-04-01 | 1995-07-25 | Hoechst Celanese Corporation | Method for producing a negative image with color proofing element containing a urethane monomer |
AU4376296A (en) * | 1994-12-13 | 1996-07-03 | Hercules Incorporated | Photosensitive compositions and clean running photopolymer printing plates therefrom |
GB2338238A (en) * | 1998-06-13 | 1999-12-15 | Bernard Dominic Noel Cooke | Photocurable resin composition |
KR101684995B1 (ko) * | 2013-08-21 | 2016-12-09 | 현대모비스 주식회사 | 자외선 경화형 하드코팅 도료 조성물 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2012221A1 (de) * | 1970-03-14 | 1971-09-23 | Basf Ag | Oxyphosphorane enthaltende photopolymerisierbare Massen |
GB1553580A (en) * | 1975-11-21 | 1979-09-26 | Espe Pharm Praep | Photopolymerisable acrylic or methacrylic acid ester-containing compositions |
JPS53109703A (en) * | 1977-03-08 | 1978-09-25 | Teijin Ltd | Improved supporting plate |
CH611633A5 (de) * | 1977-03-16 | 1979-06-15 | Espe Pharm Praep | |
US4108840A (en) * | 1977-04-15 | 1978-08-22 | Ppg Industries, Inc. | Urea-urethane-acrylate radiation curable coating compositions and methods of making same |
CH632667A5 (de) * | 1978-01-03 | 1982-10-29 | Espe Pharm Praep | Opakes, durch uv-licht polymerisierbares zahnfuellmaterial. |
US4228232A (en) * | 1979-02-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing ethylenically unsaturated oligomers |
-
1986
- 1986-05-07 WO PCT/US1986/001012 patent/WO1986006730A1/en active IP Right Grant
- 1986-05-07 DE DE8686903785T patent/DE3676054D1/de not_active Expired - Fee Related
- 1986-05-07 AU AU59057/86A patent/AU597257B2/en not_active Ceased
- 1986-05-07 EP EP86903785A patent/EP0222878B1/de not_active Expired
- 1986-05-16 CA CA000509364A patent/CA1255692A/en not_active Expired
- 1986-05-16 PH PH33782A patent/PH23679A/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP0222878B1 (de) | 1990-12-05 |
EP0222878A1 (de) | 1987-05-27 |
PH23679A (en) | 1989-09-27 |
EP0222878A4 (de) | 1987-09-02 |
CA1255692A (en) | 1989-06-13 |
WO1986006730A1 (en) | 1986-11-20 |
AU5905786A (en) | 1986-12-04 |
AU597257B2 (en) | 1990-05-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |