KR910001290B1 - 고분자 방사선 감응재료 - Google Patents

고분자 방사선 감응재료 Download PDF

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Publication number
KR910001290B1
KR910001290B1 KR1019870009433A KR870009433A KR910001290B1 KR 910001290 B1 KR910001290 B1 KR 910001290B1 KR 1019870009433 A KR1019870009433 A KR 1019870009433A KR 870009433 A KR870009433 A KR 870009433A KR 910001290 B1 KR910001290 B1 KR 910001290B1
Authority
KR
South Korea
Prior art keywords
sensitive material
pmma
molecular weight
radiation sensitive
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019870009433A
Other languages
English (en)
Korean (ko)
Other versions
KR880004544A (ko
Inventor
고오도꾸 구와노
요시카즈 쯔지노
유우지 하마도
Original Assignee
산요덴끼 가부시끼가이샤
이우에 사또시
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 산요덴끼 가부시끼가이샤, 이우에 사또시 filed Critical 산요덴끼 가부시끼가이샤
Publication of KR880004544A publication Critical patent/KR880004544A/ko
Application granted granted Critical
Publication of KR910001290B1 publication Critical patent/KR910001290B1/ko
Expired legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Materials For Photolithography (AREA)
KR1019870009433A 1986-09-01 1987-08-28 고분자 방사선 감응재료 Expired KR910001290B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP205283 1986-09-01
JP20528386 1986-09-01
JP144430 1987-06-09
JP62144430A JPH0197950A (ja) 1986-09-01 1987-06-09 高分子放射線感応材料

Publications (2)

Publication Number Publication Date
KR880004544A KR880004544A (ko) 1988-06-07
KR910001290B1 true KR910001290B1 (ko) 1991-02-28

Family

ID=26475841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870009433A Expired KR910001290B1 (ko) 1986-09-01 1987-08-28 고분자 방사선 감응재료

Country Status (4)

Country Link
US (1) US4855214A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPH0197950A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR910001290B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH673462A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10160662A1 (de) * 2001-12-11 2003-06-18 Baerlocher Gmbh Stabilisatorzusammensetzung, deren Herstellung und Verwendung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS57162430A (en) * 1981-03-31 1982-10-06 Sanyo Electric Co Ltd Process for positive type fine pattern formation
JPS57163233A (en) * 1981-03-31 1982-10-07 Sanyo Electric Co Ltd Radiation sensitive positive type polymer
JPS5882241A (ja) * 1981-11-11 1983-05-17 Sanyo Electric Co Ltd ポジ型放射線感応材料

Also Published As

Publication number Publication date
KR880004544A (ko) 1988-06-07
US4855214A (en) 1989-08-08
JPH0197950A (ja) 1989-04-17
JPH054664B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-01-20
CH673462A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-03-15

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