JPS57162430A - Process for positive type fine pattern formation - Google Patents

Process for positive type fine pattern formation

Info

Publication number
JPS57162430A
JPS57162430A JP4885481A JP4885481A JPS57162430A JP S57162430 A JPS57162430 A JP S57162430A JP 4885481 A JP4885481 A JP 4885481A JP 4885481 A JP4885481 A JP 4885481A JP S57162430 A JPS57162430 A JP S57162430A
Authority
JP
Japan
Prior art keywords
positive type
methylcellosolve
subjected
high polymer
ammonium perchlorate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4885481A
Other languages
Japanese (ja)
Other versions
JPH0125055B2 (en
Inventor
Hitoshi Kato
Shugo Yamazaki
Yoshikazu Tsujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP4885481A priority Critical patent/JPS57162430A/en
Publication of JPS57162430A publication Critical patent/JPS57162430A/en
Publication of JPH0125055B2 publication Critical patent/JPH0125055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a fine positive type pattern by a method wherein a coating of positive type high polymer radiation sensitive substance with some tetraalkyl ammonium perchlorate added thereto is formed, subjected to heat treatment and radiation, and then to development. CONSTITUTION:A substrate is uniformly coated with polymethyl methacrylate containing 1-25wt% of tetra-n-butyl ammonium perchlorate, treated at temperatures 160-200 deg.C, and then is subjected to en electron beam of a 10<-6>-10<-7> coulomb/cm<2> quantity illuminated in a desired pattern. Development follows in a methylcellosolve or a mixture of a methylcellosolve and some isopropyl alcohol. By this procedure, a highly sensitive positive type substance standing a fine work is obtained after a short time of exposure. This technique is applicable to other various positive type high polymer made radiation sensitive materials as well as polymethy metacrylate and X-ray, gamma ray, or an ion beam can also be used for illumination.
JP4885481A 1981-03-31 1981-03-31 Process for positive type fine pattern formation Granted JPS57162430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4885481A JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4885481A JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Publications (2)

Publication Number Publication Date
JPS57162430A true JPS57162430A (en) 1982-10-06
JPH0125055B2 JPH0125055B2 (en) 1989-05-16

Family

ID=12814847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4885481A Granted JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Country Status (1)

Country Link
JP (1) JPS57162430A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0197950A (en) * 1986-09-01 1989-04-17 Sanyo Electric Co Ltd Polymeric radiation sensitive material
JPH02264259A (en) * 1989-04-03 1990-10-29 Toppan Printing Co Ltd Positive type resist composition and pattern forming method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0197950A (en) * 1986-09-01 1989-04-17 Sanyo Electric Co Ltd Polymeric radiation sensitive material
US4855214A (en) * 1986-09-01 1989-08-08 Sanyo Electric Co., Ltd. Radiation-sensitive high-polymeric material
JPH054664B2 (en) * 1986-09-01 1993-01-20 Sanyo Electric Co
JPH02264259A (en) * 1989-04-03 1990-10-29 Toppan Printing Co Ltd Positive type resist composition and pattern forming method

Also Published As

Publication number Publication date
JPH0125055B2 (en) 1989-05-16

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