KR880004544A - 고분자 방사선 감응재료 - Google Patents

고분자 방사선 감응재료 Download PDF

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Publication number
KR880004544A
KR880004544A KR1019870009433A KR870009433A KR880004544A KR 880004544 A KR880004544 A KR 880004544A KR 1019870009433 A KR1019870009433 A KR 1019870009433A KR 870009433 A KR870009433 A KR 870009433A KR 880004544 A KR880004544 A KR 880004544A
Authority
KR
South Korea
Prior art keywords
sensitive material
radiation sensitive
polymeric radiation
perchlorate
tetraalkylammonium
Prior art date
Application number
KR1019870009433A
Other languages
English (en)
Other versions
KR910001290B1 (ko
Inventor
고오도꾸 구와노
요시카즈 쯔지노
유우지 하마도
Original Assignee
산요덴끼 가부시끼가이샤
이우에 사또시
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 산요덴끼 가부시끼가이샤, 이우에 사또시 filed Critical 산요덴끼 가부시끼가이샤
Publication of KR880004544A publication Critical patent/KR880004544A/ko
Application granted granted Critical
Publication of KR910001290B1 publication Critical patent/KR910001290B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Abstract

내용 없음

Description

고분자 방사선 감응재료
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 용매로서의 초산셀로 솔브에 중량평균 분자량이 60만 내지 150만의 폴리메타크릴산메틸과 배향저해제로서 과염소산테트라 알킬암모늄을 용해하여 형성된 고분자 방사선 감응재료.
  2. 제1항에 있어서, 상술한 과염소산테트라 알킬암모늄이 과염소산테트라-n-부틸암모늄인 고분자 방사선 감응재료.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019870009433A 1986-09-01 1987-08-28 고분자 방사선 감응재료 KR910001290B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP205283 1985-09-19
JP20528386 1986-09-01
JP62144430A JPH0197950A (ja) 1986-09-01 1987-06-09 高分子放射線感応材料
JP144430 1987-06-09

Publications (2)

Publication Number Publication Date
KR880004544A true KR880004544A (ko) 1988-06-07
KR910001290B1 KR910001290B1 (ko) 1991-02-28

Family

ID=26475841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870009433A KR910001290B1 (ko) 1986-09-01 1987-08-28 고분자 방사선 감응재료

Country Status (4)

Country Link
US (1) US4855214A (ko)
JP (1) JPH0197950A (ko)
KR (1) KR910001290B1 (ko)
CH (1) CH673462A5 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10160662A1 (de) * 2001-12-11 2003-06-18 Baerlocher Gmbh Stabilisatorzusammensetzung, deren Herstellung und Verwendung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS57163233A (en) * 1981-03-31 1982-10-07 Sanyo Electric Co Ltd Radiation sensitive positive type polymer
JPS57162430A (en) * 1981-03-31 1982-10-06 Sanyo Electric Co Ltd Process for positive type fine pattern formation
JPS5882241A (ja) * 1981-11-11 1983-05-17 Sanyo Electric Co Ltd ポジ型放射線感応材料

Also Published As

Publication number Publication date
KR910001290B1 (ko) 1991-02-28
JPH0197950A (ja) 1989-04-17
CH673462A5 (ko) 1990-03-15
JPH054664B2 (ko) 1993-01-20
US4855214A (en) 1989-08-08

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