KR910000644A - 신규한 티오포름아미드 유도체, 그의 제조 방법 및 그를 포함한 제약학적 조성물 - Google Patents

신규한 티오포름아미드 유도체, 그의 제조 방법 및 그를 포함한 제약학적 조성물 Download PDF

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KR910000644A
KR910000644A KR1019900008826A KR900008826A KR910000644A KR 910000644 A KR910000644 A KR 910000644A KR 1019900008826 A KR1019900008826 A KR 1019900008826A KR 900008826 A KR900008826 A KR 900008826A KR 910000644 A KR910000644 A KR 910000644A
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윌리엄 하트 테란스
나르드 봉 잭 바쉐르 베르
존 애치슨 월시 로저
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로오느-푸우 랜크 상뜨
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Abstract

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Description

신규한 티오포름아미드 유도체, 그의 제조 방법 및 그를 포함한 제약학적 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 하기 일반식의 티오포름아미드 유도체 및 제약학적으로 허용 가능한 그들의 염:
    상기식에서, R은 C1-C4를 함유한 직쇄 또는 분지쇄 알킬 라디칼을 나타내고, A는 피리드-3-일, 이소퀴놀린-4-일, 테트라히드로퀴놀린-3-일, 퀴놀린-3-일 피리다진-4-일, 피리미드-5-일, 타이졸-5-일, 티에노[2,3-b]피리딘-5-일, 피라진-2-일, 인돌-3-일 및 티에노[3,2-b]피리딘-6-일 중에서 선택된, 하나 또는 두 개의 질소원자(C1-C4를 함유한 직쇄 또는 분지쇄 알킬 또는 알콕시라디칼 또는 할로겐원자에 의해 임의로 치환됨)를 함유한 방향족 헤테로시클릭 라디칼을 나타내거나, 임의로 치환된 페닐기를 나타내고, Y는 원자가 결합, 또는 메틸렌 또는 에틸렌 라디카을 나타내고, R2는 수소원자, 임의로 치환된 알킬, 시클로알킬, 시클로알킬알킬, 아릴, 아르알킬, 아릴옥시알킬, 방향족헤테로시클릴알킬 또는 방향족 헤테로시클릭옥시알킬기 또는 기 BC(=O)-(여기서, B는 임의로 치환된 알킬, 아릴 또는 방향족 헤테로 시클릭시를 나타냄)를 나타내고, n은 0또는 1을 나타내고, n이 0을 나타낼 때 R1은 수소원자, 임의로 치환된 알킬, 시클로알킬, 시클로알킬알킬, 아릴, 아르알킬, 아릴옥시알킬, 방향족 헤테로 시클릭알킬 또는 방향족 헤테로시클릭옥시알킬기 또는 기 BE(=O)-, 또는 BSO2-를 나타낼 수 있고, n이 1을 나타낼 때, R1은 C2-4-알케닐, 카르복시, C2-5-알콕시카르보닐, 히드록시, C1-4-알콕시, 카르바모일(하나 또는 두 개의 C1-4-알킬기로 치환 또는 비치환됨) 아미노, C1-4-알킬아미노 및 디-C1-4-알킬아미노기 중에서 선택된 하나이상의 치환체로 치환 또는 비치환된 C1-4를 함유한 직쇄 또는 분지쇄 알킬 라디칼을 나타내거나, 그 각각이 고리상에서, 하나이상의 할로겐원자 또는 히드록시, C1-4알킬, C1-4-알콕시(알콕시는 R1에 의해 표시된 알킬기에 대해 정의된 바와 같이 치환 또는 비치환됨), 시아노, 니트로, 트리플루오로메틸, 카르복시, C1-4-알킬아미노, C2-5-알카노 일아미노 또는 C2-5-알콕시카르보닐기로 치환될 수 있는 벤질, 펜에틸, 1-나프틸메틸, 2-나프틸메틸, 또는 피리드-3-일메틸 라디칼을 나타낸다.
  2. 제1항에 있어서, Y가 메틸렌을 나타내는 화합물.
  3. 제1항 또는 제2항에 있어서, A가, 3 및/또는 5위치에서 전자 끄는기로 치환되고, 이의로 할로겐원자(들), C1-4-알킬 또는 C6-12-아릴(예컨대, 페닐)기(들)로 더치환된 페닐, 3-피리딜, 6-클로로피리드-3-일, 5-브로모 피리드-3-일, 3-퀴놀리닐, 4-이소퀴놀리닐 또는 5-피리미딜은 나타내거나, 페닐기 A가 할로겐 원자(들), C1-4-알킬, 또는 C6-12-아릴기(들) 또는 함께 융합 고리를 형성하는 치환체로 치환될 수 있는 화합물.
  4. 제3항에 있어서, 전자-끄는기가, 시아노, 니트로, 트리플루오로메틸, 카르바모일, 카르복시, C2-5-알카노일, C2-5-알콕시카르보닐 도는 C1-4알킬술포닐기 또는 불소, 염소 또는 브롬원자인 화합물.
  5. 제1항 내지 제4항 중 어느 한 항에 있어서, A가, 페닐, 4-클로로페닐, 3-트리플루오로메틸 페닐, 3-니트로페닐, 3,4-디클로로페닐 또는 2-나프틸을 나타내는 화합물.
  6. 제1항 내지 제5항 중 어느 한 항에 있어서, B가, 그 각각이, 할로겐원자 또는 히드록시, C1-4-알킬, C2-4-알케닐, C1-4-알콕시, 테트라히드로피라닐옥시, 시아노, 니트로, 트리플루오로메틸, 카르복시, 벤조일아미노, 4차암모늄, 아미노, C1-4-알킬아미노 및 디-C1-4-알킬아미노기(히드록시기로 임의로 치환됨), C2-5알콕시 카르보닐아미노, C2-5-알카노일아미노 또는 C2-5-알콕시카르보닐기 또는 카르바모일(하나 또는 두 개의 C1-4-알킬기로 치환 또는 비치환되고, 차례로 임의로 히드록시기로 치환됨)중에서 선택된 하나이상의 치환체로 임의로 치환될 수 있는 페닐, 피리드-3-일 또는 티엔-2-일기 또는 직쇄 또는 분지쇄알킬기(C1~C6을 함유함)를 나타내고, 질소원자상의 두 치환체는, 함께 연쇄내에 임의의 헤테로원자를 더 함유할 수 있는 4-6원자를 함유한 직쇄 또는 분지쇄 2가 라디칼을 형성할 수 있거나, B가 벤질, 펜어틸, 1-나프틸메틸, 2-나프틸메틸 또는 피리드-3-일 메틸라디칼을 나타내는 화합물.
  7. 제1항 내지 제6항중 어느 한 항에 있어서, B가 페닐, 4-플루오로페닐, 3,4-디플루오로페닐, 4-메톡시페닐, 2-카르복시페닐, 피리드-3-일, 티엔-2-일, 메틸, 부틸, 2-카르복시에틸,2-메톡시카르보닐에틸, 히드록시메틸, 테트라히드로피라닐옥시메틸, 아미노메틸, t-부톡시카르보닐 아미노메틸, 벤질아미노메틸, 벤질, 펜에틸 또는 N-메틸피페리디노카르보닐에틸기를 나타내는 화합물.
  8. 제1항 내지 제7항중 어느 한 항에 있어서, R2가 수소원자를 나타내는 화합물.
  9. 제1항 내지 제8항중 어느 한 항에 있어서, 아미노기 R1R2N-이1-페닐에틸아미노, 1-(1-나프틸)에틸아미노, 1-시클로헥실에틸아미노 또는 1-(피리드-3-일)에틸아미노인 화합물.
  10. 제1항에 있어서, 하기 특징 중 하나이상을 포함하는 화합물: (i) R은 메틸을 나타내고: (ii) A는 3-피리딜을 나타내고: (iii) Y는 메틸렌을 나타내고: (iv) B는 저급알킬 또는 임의로 치환된 페닐을 나타내고: (v) R2는 수소를 나타내고: (vi) R1은 수소, 나프틸 및 임의로 치환된 페닐 또는 3-피리딜, 중에서 선택된 치환체를 임의로 수반한 저급알킬, 시클로알킬 및 히드록시기를 나타내거나, 저급 알카노일 또는 아로일 또는 아릴술포닐기를 나타낸다.
  11. (A) R2가 수소원자를 나타낼 때, 하기 일반식(Ⅲ)
    (여기서, R1는 수소원자를 제외한 R1에 대해 제1항에서 정의한 바와 같거나, N이 1일 때 수소를 나타냄)의 화합물을 환원시키고: (B) R1및 R2중 하나 또는 모두가 임의로 치환된 알킬, 시클로알킬, 시클로알킬알킬, 아릴, 아르알킬, 아릴옥시알킬, 방향족 헤테로시클릴알킬 또는 방향족 헤테로시클릴옥시 알킬기를 나타낼 때, 비활성 유기 용매가 존재하거나 존재하지 않는 가운데, 상응하는 알킬, 시클로알킬, 시클로알킬알킬, 아르알킬, 아릴옥시알킬, 방향족 헤테로 시클릴알킬 또는 방향족 헤테로시클릴옥시알킬 하로겐화물과, R1및 R2중 최소한 하나가 수소 원자를 나타내는 일반식(Ⅰ)의 화합물을 반응시키고: (C) R1및 R2중의 하나 또는 모두가 제1항에서 정의된 BC(=O)-기를 나타낼 때, 하기 일반식(Ⅳ):
    BCOOH (Ⅳ)
    의 산 할로겐화물 또는 그들의 반응성 산 무수물과 R1및 R2중 최소한 하나가 수소원자를 나타내는 일반식(Ⅰ)의 화합물을 반응시키고: (D) R1이 제1항에서 정의된 BSO2- 기를 나타낼 때, 하기 일반식(Ⅴ):
    BSO2X1(Ⅴ)
    (여기서, B는 상기 정의한 바와 같고 X1은 할로겐 원자를 나타냄)의 설포닐할로겐화물과, N이 0이고 R1이 수소원자를 나타내는 일반식(Ⅰ)의 화합물을 반응시킨후에: 그렇게 얻어진 티오포름아미드 유도체를 그들의 제약학적으로 허용가능한 염으로 임의로 전환시키는 것으로 구성되는, 제1항의 티오포름아미드 유도체 또는 그들의 제약학적으로 허용가능한 염의 제조 방법.
  12. 제약학적으로 허용가능한 담체 또는 코우팅과 함께 제1항의 티오포름아미드 유도체 또는 그들의 제약학적으로 허용가능한 염으로 구성되는 제약학적 조성물.
  13. 약물로 이용되는 제1항의 티오포름아미드 유도체 또는 그들의 제약학적으로 허용가능한 염.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900008826A 1989-06-16 1990-06-15 신규한 티오포름아미드 유도체, 그의 제조 방법 및 그를 포함한 제약학적 조성물 KR910000644A (ko)

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US5276045A (en) * 1989-06-16 1994-01-04 Rhone-Poulenc Sante Thioformamide derivative, process for its preparation, pharmaceutical composition thereof and treatment method
WO1993008168A1 (en) * 1991-10-14 1993-04-29 Eisai Co., Ltd. Thioformamide derivative
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IE902175L (en) 1990-12-16
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IL94748A0 (en) 1991-04-15
JPH0363260A (ja) 1991-03-19
ES2064681T3 (es) 1995-02-01
DE69014426D1 (de) 1995-01-12
HUT54983A (en) 1991-04-29
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ATE114643T1 (de) 1994-12-15
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PT94390A (pt) 1991-02-08
PL285650A1 (en) 1991-06-03

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