KR900701374A - 건조한 배출가스 처리장치 및 처리방법 - Google Patents
건조한 배출가스 처리장치 및 처리방법Info
- Publication number
- KR900701374A KR900701374A KR1019900700226A KR900700226A KR900701374A KR 900701374 A KR900701374 A KR 900701374A KR 1019900700226 A KR1019900700226 A KR 1019900700226A KR 900700226 A KR900700226 A KR 900700226A KR 900701374 A KR900701374 A KR 900701374A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon
- gas
- gas treatment
- exhaust gas
- calcium oxide
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Biomedical Technology (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Silicon Compounds (AREA)
- Sampling And Sample Adjustment (AREA)
- Catalysts (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 한 형태의 배출가스 조절장치 또는 반응기기등을 자른 개략단면도.
제2도는 제1도에서 반응기기등의 시약통장치를 후퇴시킨 단면도.
제3도는 제1도의 반응기기등을 포함한 파이프장치를 나타낸 도면.
Claims (16)
- 배출가스 처리장치로서, 상기 가스를 실리콘, 또는 실리콘이 풍부한 합금이나 물질에 노출시키는 수단, 및 그 다음으로 상기 가스를 산화칼슘, 또는 산화칼슘 화합물 또는 산화칼슘을 포함한 물질 또는 소다석회를 포함한 매체에 노출시키는 수단으로 구성된 배출가스 처리장치.
- 제1항에 있어서, 제1(실리콘)단계 및 연달아 배치된 제2(산화칼슘)단계로 구성된 배출 가스 처리장치.
- 제1또는 제2항에 있어서, 상기 산화칼슘이 석회의 형태로 나타난 배출가스 처리장치.
- 제3항에 있어서, 상기 석회가 100℃ 이상 바람직하게는 250℃와 550℃사이의 온도까지 가열되는 배출가스 처리장치.
- 상기 한항에 있어서, 상기 실리콘 또는 실리콘합금이나 물질이 200℃이상 바람직하게는 350℃와 500℃사이의 온도까지 가열되는 배출가스 처리장치.
- 상기 한 항에 상기 실리콘 또는 실리콘이 풍부한 합금이나 물질과 혼합된 구리 또는 구리가 풍부한 물질을 추가로 포함한 배출가스 처리장치.
- 상기 한 항에 있어서, 상기 가스가 연달아 통과하며 실리콘 및 산화칼슘이 들어가는 구역들이 있는 하나의 싱글 가스처리 챔버로 구성된 배출가스 처리장치.
- 상기 한 항에 있어서, 상기 가스를 산화구리 또는 산화구리가 풍부한 시약에 실질적으로 노출시키는 수단을 포함한 배출가스 처리장치.
- 제8항에 있어서, 상기 산화구리 시약이 산화구리와 석회의 혼합물인 배출가스 처리장치.
- 제1항에 따른 것으로, 제8 또는 9항에 있어서, 제1(실리콘)단계, 연달아 배치된 제2(산화칼슘)단계 및 제3(산화구리)단계로 구성된 배출가스 처리장치.
- 제10항에 있어서, 상기 단계들이 싱글 가스처리 챙버속에 포함되고 상기 가스가 연달아 상기 단계들을 통과하는 배출가스 터리장티.
- 배출가스 특히 PECVD 실행으로부터 나오는 것만이 아닌 배출가스 처리방법에 있어서, 상기 가스가 첫번째로 실리콘 또는 실리콘이 풍부한 합금이나 물질에 노출되고, 그 다음으로 산화칼슘 또는 산화칼슘을 함유한 화합물이나 물질 또는 소다석회를 함유한 매체에 노출되어 그 결과 상기 배출가스 속에 있는 염소 또는 염소화합물 첫번째로 4-할로겐화규소화합물들로 변환되고 그 다음으로 상기 4-할로겐화규소화합물이 비휘발성 칼슘 실리케이트들 및 할로겐화칼슘화합물들로 변화되어 상기 배출가스에는 염소 또는 다른 할로겐가스가 없게 되는 배출가스 처리방법.
- 제12항에 있어서, 상기 가스가 산화구리 또는 산화구리가 풍부한 시약을 뒤이어 통과하는 배출가스 처리방법.
- 제7항에 있어서, 상기 처리가 하나 또는 그 이상의 가스처리챔버나 구역들을 연속적으로 통과하는 과정으로서 실행되는 배출가스 처리방법.
- 첨부된 도면에 관하여 기술된 것과 실질적으로 같은 배출가스 처리장치.
- 첨부된 도면에 관하여 기술된 것과 실질적으로 같은 배출가스 처리방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB888813270A GB8813270D0 (en) | 1988-06-04 | 1988-06-04 | Dry exhaust gas conditioning |
GB8813270.9 | 1988-06-04 | ||
PCT/GB1989/000600 WO1989011905A1 (en) | 1988-06-04 | 1989-05-31 | Dry exhaust gas conditioning |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900701374A true KR900701374A (ko) | 1990-12-01 |
KR0125920B1 KR0125920B1 (ko) | 1997-12-19 |
Family
ID=10638097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900700226A KR0125920B1 (ko) | 1988-06-04 | 1989-05-31 | 건조한 배출 가스 처리 장치 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5213767A (ko) |
EP (1) | EP0419507B1 (ko) |
JP (1) | JP2795504B2 (ko) |
KR (1) | KR0125920B1 (ko) |
AT (1) | ATE194780T1 (ko) |
DE (1) | DE68929232T2 (ko) |
GB (1) | GB8813270D0 (ko) |
WO (1) | WO1989011905A1 (ko) |
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US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
US5582865A (en) * | 1988-12-12 | 1996-12-10 | Extraction Systems, Inc. | Non-woven filter composite |
US5626820A (en) * | 1988-12-12 | 1997-05-06 | Kinkead; Devon A. | Clean room air filtering |
US5486340A (en) * | 1989-12-02 | 1996-01-23 | The Boc Group Plc | Exhaust gas conditioning |
GB8927314D0 (en) * | 1989-12-02 | 1990-01-31 | Plasma Products Limited | Exhaust gas conditioning |
DE4233119C1 (de) * | 1992-10-02 | 1993-12-09 | Veitscher Magnesitwerke Ag | Verfahren zur Reduzierung des Schadstoffgehaltes von Rauchgasen in einem Ofenaggregat |
US5538702A (en) * | 1993-02-11 | 1996-07-23 | The Boc Group Plc | Gas stream purification apparatus |
US5853678A (en) * | 1993-03-17 | 1998-12-29 | Nipon Sanso Corporation | Method for removing hydrides, alkoxides and alkylates out of a gas using cupric hydroxide |
JP3340510B2 (ja) * | 1993-05-19 | 2002-11-05 | 日本パイオニクス株式会社 | 有害ガスの浄化方法 |
US5607647A (en) * | 1993-12-02 | 1997-03-04 | Extraction Systems, Inc. | Air filtering within clean environments |
US5885845A (en) * | 1993-12-22 | 1999-03-23 | Nippon Sanso Corporation | Method for detecting inorganic hydrides, inorganic halides and organometallic compounds in a gas using copper hydroxide |
JP3280173B2 (ja) * | 1994-11-29 | 2002-04-30 | 日本エア・リキード株式会社 | 排ガス処理装置 |
US5856198A (en) * | 1994-12-28 | 1999-01-05 | Extraction Systems, Inc. | Performance monitoring of gas-phase air filters |
US5468459A (en) * | 1995-02-28 | 1995-11-21 | The Boc Group, Inc. | Gas stream treatment method for removing per-fluorocarbons |
US6776970B1 (en) * | 1995-08-07 | 2004-08-17 | Giorgio Vergani | Getter materials for deoxygenating ammonia/oxygen gas mixtures at low temperature |
JP4037475B2 (ja) * | 1996-09-04 | 2008-01-23 | 忠弘 大見 | ハロゲン系化合物を含有する排ガスの処理方法 |
GB9608061D0 (en) | 1996-04-16 | 1996-06-19 | Boc Group Plc | Removal of noxious substances from gas streams |
US5928426A (en) * | 1996-08-08 | 1999-07-27 | Novellus Systems, Inc. | Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors |
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MXPA00009799A (es) | 1998-04-09 | 2002-05-08 | Uhp Materials Inc | Preparacion y purificacion de diborano. |
KR100546282B1 (ko) * | 1999-01-11 | 2006-01-26 | 삼성전자주식회사 | 칼슘화합물을 이용한 유해가스 정화방법 |
US20030049182A1 (en) * | 2000-05-01 | 2003-03-13 | Christopher Hertzler | System and method for abatement of dangerous substances from a waste gas stream |
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ATE448860T1 (de) * | 2001-06-28 | 2009-12-15 | Sued Chemie Catalysts Jp Inc | Behandlungsmittel für metallhydride enthaltendes abgas, verfahren zu dessen herstellung, sowie verfahren zur behandlung von metallhydride enthaltendem abgas mit dem besagten mittel |
US6818566B2 (en) * | 2002-10-18 | 2004-11-16 | The Boc Group, Inc. | Thermal activation of fluorine for use in a semiconductor chamber |
US20040185661A1 (en) * | 2003-03-17 | 2004-09-23 | Sherer John Michael | Scrubber system for pretreatment of an effluent waste stream containing arsenic |
US20050053535A1 (en) * | 2003-09-08 | 2005-03-10 | Seh America, Inc. | Gettering filter and associated method for removing oxygen from a gas |
US20050123463A1 (en) * | 2003-12-05 | 2005-06-09 | Seeley Andrew J. | Treatment of exhaust gases |
US7569193B2 (en) * | 2003-12-19 | 2009-08-04 | Applied Materials, Inc. | Apparatus and method for controlled combustion of gaseous pollutants |
US7736599B2 (en) | 2004-11-12 | 2010-06-15 | Applied Materials, Inc. | Reactor design to reduce particle deposition during process abatement |
US7368000B2 (en) * | 2004-12-22 | 2008-05-06 | The Boc Group Plc | Treatment of effluent gases |
WO2007053626A2 (en) * | 2005-10-31 | 2007-05-10 | Applied Materials, Inc. | Process abatement reactor |
KR100654922B1 (ko) * | 2006-01-26 | 2006-12-06 | 주식회사 코캣 | 반도체 제조공정으로부터 발생하는 배가스 처리장치 및방법 |
GB0602506D0 (en) * | 2006-02-08 | 2006-03-22 | Boc Group Plc | Method of treating a gas stream |
JP2008086913A (ja) * | 2006-10-02 | 2008-04-17 | Central Glass Co Ltd | フッ素含有ガス中のフッ素の除去方法 |
WO2010020446A1 (en) * | 2008-08-19 | 2010-02-25 | Oerlikon Solar Ip Ag, Trübbach | Trap |
WO2010020445A1 (en) * | 2008-08-19 | 2010-02-25 | Oerlikon Solar Ip Ag, Trübbach | Trap |
US20110212010A1 (en) * | 2009-09-02 | 2011-09-01 | Despatch Industries Limited Partnership | Apparatus and Method for Thermal Destruction of Volatile Organic Compounds |
JP5485669B2 (ja) * | 2009-12-03 | 2014-05-07 | 大旺新洋株式会社 | 酸性ガスの中和処理方法及びその装置 |
CA2869124C (en) * | 2012-03-30 | 2018-06-05 | Fuel Tech, Inc. | Dry processes, apparatus, compositions and systems for reducing sulfur oxides and hci |
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JPS6430626A (en) * | 1987-07-28 | 1989-02-01 | Ebara Res Co Ltd | Treatment of exhaust gas |
-
1988
- 1988-06-04 GB GB888813270A patent/GB8813270D0/en active Pending
-
1989
- 1989-05-31 AT AT89906149T patent/ATE194780T1/de not_active IP Right Cessation
- 1989-05-31 US US07/613,572 patent/US5213767A/en not_active Expired - Lifetime
- 1989-05-31 WO PCT/GB1989/000600 patent/WO1989011905A1/en active IP Right Grant
- 1989-05-31 KR KR1019900700226A patent/KR0125920B1/ko not_active IP Right Cessation
- 1989-05-31 JP JP1505673A patent/JP2795504B2/ja not_active Expired - Fee Related
- 1989-05-31 DE DE68929232T patent/DE68929232T2/de not_active Expired - Fee Related
- 1989-05-31 EP EP89906149A patent/EP0419507B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0419507A1 (en) | 1991-04-03 |
ATE194780T1 (de) | 2000-08-15 |
WO1989011905A1 (en) | 1989-12-14 |
GB8813270D0 (en) | 1988-07-06 |
DE68929232D1 (de) | 2000-08-24 |
US5213767A (en) | 1993-05-25 |
JP2795504B2 (ja) | 1998-09-10 |
DE68929232T2 (de) | 2001-01-25 |
KR0125920B1 (ko) | 1997-12-19 |
JPH04502726A (ja) | 1992-05-21 |
EP0419507B1 (en) | 2000-07-19 |
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