DE69425001D1 - Trockene Abgasbehandlung - Google Patents

Trockene Abgasbehandlung

Info

Publication number
DE69425001D1
DE69425001D1 DE69425001T DE69425001T DE69425001D1 DE 69425001 D1 DE69425001 D1 DE 69425001D1 DE 69425001 T DE69425001 T DE 69425001T DE 69425001 T DE69425001 T DE 69425001T DE 69425001 D1 DE69425001 D1 DE 69425001D1
Authority
DE
Germany
Prior art keywords
silicon
calcium oxide
stage
exhaust treatment
gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69425001T
Other languages
English (en)
Other versions
DE69425001T2 (de
Inventor
James R Smith
Peter L Timms
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOC Ltd Great Britain
Original Assignee
BOC Ltd Great Britain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Ltd Great Britain filed Critical BOC Ltd Great Britain
Publication of DE69425001D1 publication Critical patent/DE69425001D1/de
Application granted granted Critical
Publication of DE69425001T2 publication Critical patent/DE69425001T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8671—Removing components of defined structure not provided for in B01D53/8603 - B01D53/8668
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Cylinder Crankcases Of Internal Combustion Engines (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
DE69425001T 1993-01-26 1994-01-20 Trockene Abgasbehandlung Expired - Fee Related DE69425001T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/008,936 US5417934A (en) 1988-06-04 1993-01-26 Dry exhaust gas conditioning

Publications (2)

Publication Number Publication Date
DE69425001D1 true DE69425001D1 (de) 2000-08-03
DE69425001T2 DE69425001T2 (de) 2001-03-08

Family

ID=21734585

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69425001T Expired - Fee Related DE69425001T2 (de) 1993-01-26 1994-01-20 Trockene Abgasbehandlung

Country Status (5)

Country Link
US (1) US5417934A (de)
EP (1) EP0609028B1 (de)
JP (1) JPH07762A (de)
AT (1) ATE194087T1 (de)
DE (1) DE69425001T2 (de)

Families Citing this family (31)

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US5538702A (en) * 1993-02-11 1996-07-23 The Boc Group Plc Gas stream purification apparatus
US5853678A (en) * 1993-03-17 1998-12-29 Nipon Sanso Corporation Method for removing hydrides, alkoxides and alkylates out of a gas using cupric hydroxide
US5885845A (en) * 1993-12-22 1999-03-23 Nippon Sanso Corporation Method for detecting inorganic hydrides, inorganic halides and organometallic compounds in a gas using copper hydroxide
US5928426A (en) * 1996-08-08 1999-07-27 Novellus Systems, Inc. Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors
TW550112B (en) * 1997-11-14 2003-09-01 Hitachi Ltd Method for processing perfluorocarbon, and apparatus therefor
US5910294A (en) * 1997-11-17 1999-06-08 Air Products And Chemicals, Inc. Abatement of NF3 with metal oxalates
TW581708B (en) * 1998-09-22 2004-04-01 Japan Pionics Cleaning agent and cleaning method for halogen-containing exhaust gas
US6174349B1 (en) * 1999-04-06 2001-01-16 Seh America, Inc. Continuous effluent gas scrubber system and method
EP1201292A4 (de) * 1999-06-07 2004-07-28 Jfe Steel Corp Verfahren und vorrichtung zur zersetzung von halogeniertem kohlenwasserstoffgas
FI110311B (fi) * 1999-07-20 2002-12-31 Asm Microchemistry Oy Menetelmä ja laitteisto aineiden poistamiseksi kaasuista
US6468490B1 (en) 2000-06-29 2002-10-22 Applied Materials, Inc. Abatement of fluorine gas from effluent
US6689252B1 (en) 1999-07-28 2004-02-10 Applied Materials, Inc. Abatement of hazardous gases in effluent
US6500487B1 (en) * 1999-10-18 2002-12-31 Advanced Technology Materials, Inc Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions
US6673323B1 (en) 2000-03-24 2004-01-06 Applied Materials, Inc. Treatment of hazardous gases in effluent
US6391146B1 (en) 2000-04-11 2002-05-21 Applied Materials, Inc. Erosion resistant gas energizer
US7060132B2 (en) * 2000-04-14 2006-06-13 Asm International N.V. Method and apparatus of growing a thin film
FI117978B (fi) * 2000-04-14 2007-05-15 Asm Int Menetelmä ja laitteisto ohutkalvon kasvattamiseksi alustalle
US20030049182A1 (en) * 2000-05-01 2003-03-13 Christopher Hertzler System and method for abatement of dangerous substances from a waste gas stream
JP2001347159A (ja) * 2000-06-08 2001-12-18 Morikawa Sangyo Kk 有機ハロゲン化物のハロゲンおよび有機化合物を無機の物質に変換処理する方法およびそのための装置
US6428609B1 (en) 2000-09-08 2002-08-06 Moore Epitaxial, Inc. Exhaust particulate controller and method
GB0101769D0 (en) 2001-01-24 2001-03-07 Ineos Fluor Ltd Decomposition of fluorine compounds
US6824748B2 (en) * 2001-06-01 2004-11-30 Applied Materials, Inc. Heated catalytic treatment of an effluent gas from a substrate fabrication process
US6843830B2 (en) * 2003-04-15 2005-01-18 Advanced Technology Materials, Inc. Abatement system targeting a by-pass effluent stream of a semiconductor process tool
US20050123463A1 (en) * 2003-12-05 2005-06-09 Seeley Andrew J. Treatment of exhaust gases
US7569193B2 (en) 2003-12-19 2009-08-04 Applied Materials, Inc. Apparatus and method for controlled combustion of gaseous pollutants
GB0418125D0 (en) * 2004-08-13 2004-09-15 Boc Group Plc Treatment of effluent gases
US7736599B2 (en) * 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
WO2007053626A2 (en) * 2005-10-31 2007-05-10 Applied Materials, Inc. Process abatement reactor
US20110212010A1 (en) * 2009-09-02 2011-09-01 Despatch Industries Limited Partnership Apparatus and Method for Thermal Destruction of Volatile Organic Compounds
US8241596B2 (en) * 2010-12-31 2012-08-14 Mks Instruments, Inc. High-efficiency, hot trap apparatus and method
WO2016182648A1 (en) * 2015-05-08 2016-11-17 Applied Materials, Inc. Method for controlling a processing system

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033019A (en) * 1975-07-21 1977-07-05 Kamatics Corporation Method of assembling bearings
SU990273A1 (ru) * 1980-12-01 1983-01-23 Ленинградский Институт Авиационного Приборостроения Способ очистки отход щих газов от паров тIсL @
JPS61101231A (ja) * 1984-10-23 1986-05-20 Central Glass Co Ltd フツ素ガスの除去方法
DE3447066A1 (de) * 1984-12-22 1986-07-03 Bergwerksverband Gmbh Verfahren zur katalytischen entfernung von chlorkohlenwasserstoffen aus deponiegasen
JPS61204025A (ja) * 1985-03-06 1986-09-10 Central Glass Co Ltd Ｎｆ↓３の除害方法
EP0194366B1 (de) * 1985-03-13 1988-01-27 Japan Pionics., Ltd. Method zum Reinigen von Abgasen
US4629611A (en) * 1985-04-29 1986-12-16 International Business Machines Corporation Gas purifier for rare-gas fluoride lasers
JPS62152519A (ja) * 1985-12-26 1987-07-07 Iwatani & Co ハロゲン系廃ガスの乾式処理方法
US4753818A (en) * 1986-07-25 1988-06-28 Hughes Aircraft Company Process for photochemical vapor deposition of oxide layers at enhanced deposition rates
DE3869480D1 (de) * 1987-06-01 1992-04-30 Japan Pionics Verfahren zum reinigen von abgas.
GB8813270D0 (en) * 1988-06-04 1988-07-06 Plasma Products Ltd Dry exhaust gas conditioning
US5112439A (en) * 1988-11-30 1992-05-12 Mcnc Method for selectively depositing material on substrates
EP0382986A1 (de) * 1989-02-13 1990-08-22 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Verfahren und Vorrichtung zur Entgiftung von Stickstoff- oder Kohlenstoffhalogeniden
GB8927314D0 (en) * 1989-12-02 1990-01-31 Plasma Products Limited Exhaust gas conditioning
US4977106A (en) * 1990-05-01 1990-12-11 Texas Instruments Incorporated Tin chemical vapor deposition using TiCl4 and SiH4
US5164330A (en) * 1991-04-17 1992-11-17 Intel Corporation Etchback process for tungsten utilizing a NF3/AR chemistry
US5212118A (en) * 1991-08-09 1993-05-18 Saxena Arjun N Method for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates

Also Published As

Publication number Publication date
EP0609028A1 (de) 1994-08-03
JPH07762A (ja) 1995-01-06
US5417934A (en) 1995-05-23
DE69425001T2 (de) 2001-03-08
EP0609028B1 (de) 2000-06-28
ATE194087T1 (de) 2000-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee