KR900002081B1 - Melting circuit of semiconductor device - Google Patents

Melting circuit of semiconductor device

Info

Publication number
KR900002081B1
KR900002081B1 KR8607649A KR860007649A KR900002081B1 KR 900002081 B1 KR900002081 B1 KR 900002081B1 KR 8607649 A KR8607649 A KR 8607649A KR 860007649 A KR860007649 A KR 860007649A KR 900002081 B1 KR900002081 B1 KR 900002081B1
Authority
KR
South Korea
Prior art keywords
semiconductor device
fuse
melting circuit
circuit
melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR8607649A
Other languages
English (en)
Korean (ko)
Inventor
Hirosi Dakgagi
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of KR900002081B1 publication Critical patent/KR900002081B1/ko
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/49—Adaptable interconnections, e.g. fuses or antifuses
    • H10W20/493—Fuses, i.e. interconnections changeable from conductive to non-conductive
    • H10W20/494—Fuses, i.e. interconnections changeable from conductive to non-conductive changeable by the use of an external beam, e.g. laser beam or ion beam

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)
KR8607649A 1985-10-09 1986-09-11 Melting circuit of semiconductor device Expired KR900002081B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60226518A JPH0628290B2 (ja) 1985-10-09 1985-10-09 回路用ヒューズを備えた半導体装置

Publications (1)

Publication Number Publication Date
KR900002081B1 true KR900002081B1 (en) 1990-03-31

Family

ID=16846385

Family Applications (1)

Application Number Title Priority Date Filing Date
KR8607649A Expired KR900002081B1 (en) 1985-10-09 1986-09-11 Melting circuit of semiconductor device

Country Status (4)

Country Link
US (1) US4748491A (https=)
JP (1) JPH0628290B2 (https=)
KR (1) KR900002081B1 (https=)
DE (1) DE3634167A1 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63140550A (ja) * 1986-12-01 1988-06-13 Mitsubishi Electric Corp 冗長回路用電気ヒユ−ズ
US4935801A (en) * 1987-01-27 1990-06-19 Inmos Corporation Metallic fuse with optically absorptive layer
JP2584986B2 (ja) * 1987-03-10 1997-02-26 三菱電機株式会社 半導体装置の配線構造
US5223735A (en) * 1988-09-30 1993-06-29 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit device in which circuit functions can be remedied or changed and the method for producing the same
US5675174A (en) * 1993-01-06 1997-10-07 Rohm Co., Ltd. Method for using fuse structure in semiconductor device
JP2557019B2 (ja) * 1993-10-01 1996-11-27 エス・オー・シー株式会社 超小型チップヒューズおよびその製造方法
US5729042A (en) * 1995-08-14 1998-03-17 Vanguard International Semiconductor Corporation Raised fuse structure for laser repair
US5708291A (en) 1995-09-29 1998-01-13 Intel Corporation Silicide agglomeration fuse device
US6337507B1 (en) * 1995-09-29 2002-01-08 Intel Corporation Silicide agglomeration fuse device with notches to enhance programmability
US5976943A (en) * 1996-12-27 1999-11-02 Vlsi Technology, Inc. Method for bi-layer programmable resistor
US6057221A (en) * 1997-04-03 2000-05-02 Massachusetts Institute Of Technology Laser-induced cutting of metal interconnect
US6373371B1 (en) * 1997-08-29 2002-04-16 Microelectronic Modules Corp. Preformed thermal fuse
US20050269666A1 (en) * 2004-06-07 2005-12-08 Taiwan Semiconductor Manufacturing Company, Ltd. Electrical fuses as programmable data storage
US6774457B2 (en) * 2001-09-13 2004-08-10 Texas Instruments Incorporated Rectangular contact used as a low voltage fuse element
US7180102B2 (en) * 2003-09-30 2007-02-20 Agere Systems Inc. Method and apparatus for using cobalt silicided polycrystalline silicon for a one time programmable non-volatile semiconductor memory
US20050127475A1 (en) * 2003-12-03 2005-06-16 International Business Machines Corporation Apparatus and method for electronic fuse with improved esd tolerance
US7106164B2 (en) * 2003-12-03 2006-09-12 International Business Machines Corporation Apparatus and method for electronic fuse with improved ESD tolerance
US20050130383A1 (en) * 2003-12-10 2005-06-16 International Business Machines Corporation Silicide resistor in beol layer of semiconductor device and method
US20050285222A1 (en) 2004-06-29 2005-12-29 Kong-Beng Thei New fuse structure
JP4587761B2 (ja) 2004-09-30 2010-11-24 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
KR100629357B1 (ko) * 2004-11-29 2006-09-29 삼성전자주식회사 퓨즈 및 부하저항을 갖는 낸드 플래시메모리소자 형성방법
JP2011216240A (ja) * 2010-03-31 2011-10-27 Oki Semiconductor Co Ltd 電流ヒューズ、半導体装置及び電流ヒューズの切断方法
US10672490B2 (en) * 2018-01-17 2020-06-02 International Business Machines Corporation One-time-programmable memory in a high-density three-dimensional structure

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042950A (en) * 1976-03-01 1977-08-16 Advanced Micro Devices, Inc. Platinum silicide fuse links for integrated circuit devices
JPS5877098A (ja) * 1981-10-28 1983-05-10 Toshiba Corp プログラマブル・リ−ド・オンリ・メモリ素子
US4518981A (en) * 1981-11-12 1985-05-21 Advanced Micro Devices, Inc. Merged platinum silicide fuse and Schottky diode and method of manufacture thereof
JPS58169940A (ja) * 1982-03-30 1983-10-06 Fujitsu Ltd 半導体装置の製造方法
DE3216823A1 (de) * 1982-05-05 1983-11-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von strukturen von aus metallsilizid und polysilizium bestehenden doppelschichten auf integrierte halbleiterschaltungen enthaltenden substraten durch reaktives ionenaetzen
JPS59125640A (ja) * 1982-12-28 1984-07-20 Fujitsu Ltd 半導体装置の製造方法
JPS59148198A (ja) * 1983-02-14 1984-08-24 Hitachi Ltd 半導体装置
JPS60954A (ja) * 1983-06-17 1985-01-07 尾池工業株式会社 虹彩色再帰反射フイルム状物およびそのスリツト糸
JPS6065545A (ja) * 1983-09-21 1985-04-15 Hitachi Micro Comput Eng Ltd 半導体装置の製造方法
JPS60176250A (ja) * 1984-02-23 1985-09-10 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6285442A (ja) 1987-04-18
JPH0628290B2 (ja) 1994-04-13
DE3634167A1 (de) 1987-04-16
US4748491A (en) 1988-05-31
DE3634167C2 (https=) 1992-04-09

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