KR890701795A - 다수의 컬럼이 평행으로 내장된 증발기 - Google Patents

다수의 컬럼이 평행으로 내장된 증발기

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Publication number
KR890701795A
KR890701795A KR1019890700583A KR890700583A KR890701795A KR 890701795 A KR890701795 A KR 890701795A KR 1019890700583 A KR1019890700583 A KR 1019890700583A KR 890700583 A KR890700583 A KR 890700583A KR 890701795 A KR890701795 A KR 890701795A
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South Korea
Prior art keywords
evaporator
columns
chemical composition
evaporation
gas
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KR1019890700583A
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English (en)
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KR910006786B1 (ko
Inventor
맥노운 클램
Original Assignee
고든 시, 앤드류스
엠 엔드 티 케미칼스 아이엔시
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Publication of KR890701795A publication Critical patent/KR890701795A/ko
Application granted granted Critical
Publication of KR910006786B1 publication Critical patent/KR910006786B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/06—Evaporators with vertical tubes
    • B01D1/065—Evaporators with vertical tubes by film evaporating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Fats And Perfumes (AREA)

Abstract

내용 없음

Description

다수의 컬럼이 평행으로 내장된 증발기
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 일구체예에 따른 증발기의 정면도이다. 제2도는 제1도의 증발기의 액체 공급부에 대한 세로 방향의 단면도이다. 제3도는 제2도의 액체 공급부를 3-3선을 따라 절단한 단면도이다.

Claims (12)

  1. 기체내에 유입된 높은 농도의 증발된 화학적 조성물로 이루어지는 혼합물을 제조하기 위한, 비교적 낮은 열분해 온도를 갖는 화학적 조성물의 증발 장치로서, 상기의 증발장치가, 동체와, 내벽과 상단 및 하단 개구를 갖는, 실질적으로 수직의 방향으로 상기의 동체내에 배열되는 다수의 증발 컬럼들과, 상기의 증발 컬럼들의 상기한 상단 개구들에 대하여 상기의 화학적 조성물을 실질적으로 균등하게 분배시키기 위한 분배수단과, 상기의 증발컬럼들 내부의 상기한 화학적 조성물을 증발시키기 위하여 상기의 증발 컬럼들을 가열하기 위한 가열수단, 그리고, 상기의 혼합물을 제조하기 위하여 상기의 증발 컬럼들의 상기한 하단에 상기의 기체를 공급하기 위한 기체 공급수단으로 구성되는 증발기.
  2. 제1항에 있어서, 증발 컬럼들이 내장되는 증발기.
  3. 제1항에 있어서, 분배수단이, 증발 컬럼들의 상단개구에 화학적 조성물을 개별적으로 공급하기 위한 다수의 공급관을 포함하고 있는 증발기.
  4. 제1항에 있어서, 분배수단이 각각의 증발 컬럼들의 상단 개구 위쪽에 위치하는 다수의 분배관과, 상기의 분배관들에 화학적 조성물을 공급하기 위하여 상기의 분배관들의 상단에 고정되는 공급 분배판, 그리고, 상기의 공급 분배판에 상기의 화학적 조성물을 공급하기 위한 공급수단을 포함하고 있는 증발기.
  5. 제4항에 있어서, 각각의 분배관이 상부 V-노치부를 갖으며, 상기의 V-노치부의 하단이 공급 분배판과 실질적으로 동일 평면상에 위치되는 증발기.
  6. 제1항에 있어서, 동체가 다수의 증발 컬럼들을 밀봉시켜 에워싸고 있고, 가열수단은, 상기의 동체에 가열된 유체를 공급하기 위한 유체입구와, 상기의 동체로부터 상기의 유체를 배출하기 위한 유체 출구를 포함하고 있으며, 상기의 가열된 유체가 상기의 증발 컬럼들 내의 화학적 조성물을 열교환시켜 증발시키는 증발기.
  7. 제1항에 있어서, 동체가 증발 컬럼들을 밀봉시키는 방식으로 에워싸고 있고, 기체 공급수단이, 상기의 증발 컬럼들의 하단에 기체를 공급하기 위하여, 상기의 동체의 하단에 고정되는 하부 보닛을 포함하고 있는 증발기.
  8. 제7항에 있어서, 장치로부터 피막형성용 증기 혼합물을 배출시키기 위하여, 동체의 상단에 고정되는 상부 보닛을 또한 포함하고 있는 증발기.
  9. 제8항에 있어서, 상부 보닛이, 증발된 화학적 조성물이 장치를 빠져나갈 때 응축되는 것을 방지하기 위한 열교환기를 포함하고 있는 증발기.
  10. 제8항에 있어서, 혼합물의 온도를 탐지하기 위하여 상부 보닛내에 위치되며, 가열수단의 제어에 사용하기 위한 온도탐침을 또한 포함하고 있는 증발기.
  11. 제8항에 있어서, 유입된 작은 액체 방울들이 장치로부터 빠져 나가는 것을 방지하기 위하여, 상부 보닛 내에 위치되는 농무 제거기를 또한 포함하고 있는 증발기.
  12. 제7항에 있어서, 하부 보닛이, 장치에 공급되는 기체의 과도한 열 손실을 방지하기 위한 열교환기를 포함하고 있는 증발기.
    ※ 참고사항：최초출원 내용에 의하여 공개하는 것임.
KR1019890700583A 1987-08-05 1988-08-04 다중, 병렬 충전컬럼 증발기 KR910006786B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/082,011 US4924936A (en) 1987-08-05 1987-08-05 Multiple, parallel packed column vaporizer
US082,011 1987-08-05
PCT/US1988/002654 WO1989001055A1 (en) 1987-08-05 1988-08-04 Multiple, parallel packed column vaporizer

Publications (2)

Publication Number Publication Date
KR890701795A true KR890701795A (ko) 1989-12-21
KR910006786B1 KR910006786B1 (ko) 1991-09-02

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Country Link
US (1) US4924936A (ko)
EP (2) EP0391907A1 (ko)
JP (1) JPH03500667A (ko)
KR (1) KR910006786B1 (ko)
CN (1) CN1018717B (ko)
AT (1) ATE97010T1 (ko)
BR (1) BR8807642A (ko)
CA (1) CA1296996C (ko)
DE (1) DE3885536T2 (ko)
DK (1) DK165126C (ko)
ES (1) ES2046257T3 (ko)
FI (1) FI90567C (ko)
IE (1) IE63516B1 (ko)
IL (1) IL87303A (ko)
IN (1) IN169676B (ko)
MX (1) MX166195B (ko)
WO (1) WO1989001055A1 (ko)
ZA (1) ZA885641B (ko)

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Also Published As

Publication number Publication date
FI90567C (fi) 1994-02-25
ATE97010T1 (de) 1993-11-15
US4924936A (en) 1990-05-15
FI90567B (fi) 1993-11-15
DE3885536D1 (de) 1993-12-16
ZA885641B (en) 1989-04-26
MX166195B (es) 1992-12-23
KR910006786B1 (ko) 1991-09-02
CN1018717B (zh) 1992-10-21
EP0391907A1 (en) 1990-10-17
EP0303911A1 (en) 1989-02-22
IE882389L (en) 1989-02-05
ES2046257T3 (es) 1994-02-01
IL87303A0 (en) 1989-01-31
CA1296996C (en) 1992-03-10
IN169676B (ko) 1991-11-30
CN1032111A (zh) 1989-04-05
DK29690A (da) 1990-04-04
EP0303911B1 (en) 1993-11-10
JPH0553869B2 (ko) 1993-08-11
DK165126C (da) 1993-02-22
BR8807642A (pt) 1990-06-12
FI900450A0 (fi) 1990-01-29
IE63516B1 (en) 1995-05-03
DE3885536T2 (de) 1994-03-10
WO1989001055A1 (en) 1989-02-09
DK165126B (da) 1992-10-12
JPH03500667A (ja) 1991-02-14
IL87303A (en) 1992-11-15
DK29690D0 (da) 1990-02-05

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