CA935336A - Method of depositing inorganic coatings from vapour phase - Google Patents

Method of depositing inorganic coatings from vapour phase

Info

Publication number
CA935336A
CA935336A CA110968A CA110968A CA935336A CA 935336 A CA935336 A CA 935336A CA 110968 A CA110968 A CA 110968A CA 110968 A CA110968 A CA 110968A CA 935336 A CA935336 A CA 935336A
Authority
CA
Canada
Prior art keywords
vapour phase
inorganic coatings
depositing inorganic
depositing
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA110968A
Other versions
CA110968S (en
Inventor
V. Melnikov Valery
A. Domrachev Georgy
B. Kazarinov Georgy
A. Skorik Gleb
K. Fukin Konstantin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institut Khimii Akademii Nauk Sssr
Original Assignee
Institut Khimii Akademii Nauk Sssr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institut Khimii Akademii Nauk Sssr filed Critical Institut Khimii Akademii Nauk Sssr
Application granted granted Critical
Publication of CA935336A publication Critical patent/CA935336A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
CA110968A 1970-05-29 1971-04-21 Method of depositing inorganic coatings from vapour phase Expired CA935336A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU1432551 1970-05-29

Publications (1)

Publication Number Publication Date
CA935336A true CA935336A (en) 1973-10-16

Family

ID=20452367

Family Applications (1)

Application Number Title Priority Date Filing Date
CA110968A Expired CA935336A (en) 1970-05-29 1971-04-21 Method of depositing inorganic coatings from vapour phase

Country Status (6)

Country Link
US (1) US3729335A (en)
CA (1) CA935336A (en)
DE (1) DE2124400C3 (en)
FR (1) FR2090384B1 (en)
GB (1) GB1306784A (en)
SE (1) SE359322B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042006A (en) * 1973-01-05 1977-08-16 Siemens Aktiengesellschaft Pyrolytic process for producing a band-shaped metal layer on a substrate
US3961926A (en) * 1974-12-27 1976-06-08 International Telephone And Telegraph Corporation Preparation of germania cores in optical fibers
US4297150A (en) 1979-07-07 1981-10-27 The British Petroleum Company Limited Protective metal oxide films on metal or alloy substrate surfaces susceptible to coking, corrosion or catalytic activity
DE2941896A1 (en) * 1979-10-17 1981-04-30 Ruhrchemie Ag, 4200 Oberhausen METHOD FOR PRODUCING ADHESIVE LAYERS ON POLYOLEFINES
JPS57500066A (en) * 1980-01-09 1982-01-14
US4608473A (en) * 1982-05-28 1986-08-26 At&T Technologies, Inc. Modified zirconia induction furnace
US4533378A (en) * 1982-05-28 1985-08-06 At&T Technologies, Inc. Modified zirconia induction furnace
US4886683A (en) * 1986-06-20 1989-12-12 Raytheon Company Low temperature metalorganic chemical vapor depostion growth of group II-VI semiconductor materials
US4924936A (en) * 1987-08-05 1990-05-15 M&T Chemicals Inc. Multiple, parallel packed column vaporizer
CA2046335A1 (en) * 1989-02-02 1990-08-03 Michael Cox Forming a metal coating
WO1991017284A1 (en) * 1990-04-30 1991-11-14 International Business Machines Corporation Apparatus for low temperature cvd of metals
US5098326A (en) * 1990-12-13 1992-03-24 General Electric Company Method for applying a protective coating to a high-intensity metal halide discharge lamp
US9683286B2 (en) * 2006-04-28 2017-06-20 Gtat Corporation Increased polysilicon deposition in a CVD reactor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE533644C (en) * 1930-04-16 1931-09-18 Patra Patent Treuhand Process for the production of coatings on electrically conductive wires, threads, tapes or the like.

Also Published As

Publication number Publication date
DE2124400B2 (en) 1974-07-11
FR2090384B1 (en) 1976-03-05
US3729335A (en) 1973-04-24
DE2124400C3 (en) 1975-02-27
DE2124400A1 (en) 1971-12-23
GB1306784A (en) 1973-02-14
SE359322B (en) 1973-08-27
FR2090384A1 (en) 1972-01-14

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