KR890013228A - 반도체 결정의 인상 방법 - Google Patents
반도체 결정의 인상 방법Info
- Publication number
- KR890013228A KR890013228A KR1019890002086A KR890002086A KR890013228A KR 890013228 A KR890013228 A KR 890013228A KR 1019890002086 A KR1019890002086 A KR 1019890002086A KR 890002086 A KR890002086 A KR 890002086A KR 890013228 A KR890013228 A KR 890013228A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor crystals
- raise
- raise semiconductor
- crystals
- semiconductor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63039152A JP2755588B2 (ja) | 1988-02-22 | 1988-02-22 | 結晶引上げ方法 |
JP9152 | 1988-02-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890013228A true KR890013228A (ko) | 1989-09-22 |
KR920009563B1 KR920009563B1 (ko) | 1992-10-19 |
Family
ID=12545135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890002086A KR920009563B1 (ko) | 1988-02-22 | 1989-02-22 | 반도체 결정의 인상 방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5021225A (ko) |
EP (1) | EP0330141B1 (ko) |
JP (1) | JP2755588B2 (ko) |
KR (1) | KR920009563B1 (ko) |
DE (1) | DE68908435T2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100702538B1 (ko) * | 2005-02-28 | 2007-04-04 | 네오세미테크 주식회사 | 액상봉입형 초크랄스키법에 의한 갈륨비소 단결정 성장용반응용기 인상 장치 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2585123B2 (ja) * | 1990-04-13 | 1997-02-26 | 東芝セラミックス株式会社 | シリコン単結晶の製造方法 |
JP3015656B2 (ja) * | 1994-03-23 | 2000-03-06 | 株式会社東芝 | 半絶縁性GaAs単結晶の製造方法および製造装置 |
JPH09194289A (ja) * | 1996-01-12 | 1997-07-29 | Mitsubishi Materials Shilicon Corp | 単結晶引上装置 |
JP3769800B2 (ja) * | 1996-01-12 | 2006-04-26 | 株式会社Sumco | 単結晶引上装置 |
US6179914B1 (en) * | 1999-02-02 | 2001-01-30 | Seh America, Inc. | Dopant delivery system and method |
TW499696B (en) * | 1999-04-27 | 2002-08-21 | Tokyo Electron Ltd | Processing apparatus and processing method |
MY159737A (en) | 2010-09-03 | 2017-01-31 | Gtat Ip Holding Llc | Silicon single crystal doped with gallium, indium, or aluminum |
JP2014511146A (ja) * | 2011-04-14 | 2014-05-12 | ジーティー アドヴァンスト シーズィー, エルエルシー | 均一な複数のドーパントを有するシリコンインゴット並びにそれを生成するための方法及び装置 |
MY169752A (en) * | 2011-05-06 | 2019-05-15 | Gt Advanced Cz Llc | Growth of a uniformly doped silicon ingot by doping only the initial charge |
US20140144371A1 (en) * | 2012-11-29 | 2014-05-29 | Solaicx, Inc. | Heat Shield For Improved Continuous Czochralski Process |
US20140261155A1 (en) * | 2013-03-15 | 2014-09-18 | Memc Electronic Materials, Inc. | Crucible for controlling oxygen and related methods |
US9863062B2 (en) * | 2013-03-14 | 2018-01-09 | Corner Star Limited | Czochralski crucible for controlling oxygen and related methods |
US9822466B2 (en) | 2013-11-22 | 2017-11-21 | Corner Star Limited | Crystal growing systems and crucibles for enhancing heat transfer to a melt |
KR101680213B1 (ko) * | 2015-04-06 | 2016-11-28 | 주식회사 엘지실트론 | 실리콘 단결정 잉곳의 성장 방법 |
CN108138354B (zh) * | 2015-05-01 | 2021-05-28 | 各星有限公司 | 生产被挥发性掺杂剂掺杂的单晶锭的方法 |
US10407797B2 (en) * | 2017-05-04 | 2019-09-10 | Corner Start Limited | Crystal pulling system and method including crucible and barrier |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR66315E (fr) * | 1906-09-03 | 1956-06-29 | Int Standard Electric Corp | Dispositifs amplificateurs utilisant des semi-conducteurs ou des cristaux |
US2809136A (en) * | 1954-03-10 | 1957-10-08 | Sylvania Electric Prod | Apparatus and method of preparing crystals of silicon germanium group |
NL121446C (ko) * | 1958-11-17 | |||
NL6917398A (ko) * | 1969-03-18 | 1970-09-22 | ||
DE2152801A1 (de) * | 1970-11-09 | 1972-05-10 | Little Inc A | Verfahren und Ofen zum Ziehen von Kristallen gleichförmiger Zusammensetzung nach dem Czochralski-Verfahren |
US4036595A (en) * | 1975-11-06 | 1977-07-19 | Siltec Corporation | Continuous crystal growing furnace |
US4190631A (en) * | 1978-09-21 | 1980-02-26 | Western Electric Company, Incorporated | Double crucible crystal growing apparatus |
JPS5556098A (en) * | 1978-10-17 | 1980-04-24 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method and apparatus for producing si single crystal rod |
US4353875A (en) * | 1978-11-06 | 1982-10-12 | Allied Corporation | Apparatus for growing crystalline materials |
US4456499A (en) * | 1979-05-25 | 1984-06-26 | At&T Technologies, Inc. | Double crucible Czochralski crystal growth method |
US4246064A (en) * | 1979-07-02 | 1981-01-20 | Western Electric Company, Inc. | Double crucible crystal growing process |
US4659421A (en) * | 1981-10-02 | 1987-04-21 | Energy Materials Corporation | System for growth of single crystal materials with extreme uniformity in their structural and electrical properties |
JPS58172290A (ja) * | 1982-03-31 | 1983-10-11 | Sumitomo Electric Ind Ltd | 化合物半導体単結晶の引上方法および装置 |
JPS5913693A (ja) * | 1982-07-15 | 1984-01-24 | Toshiba Corp | 化合物半導体単結晶育成装置 |
DE3316547C2 (de) * | 1983-05-06 | 1985-05-30 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Kalter Tiegel für das Erschmelzen nichtmetallischer anorganischer Verbindungen |
JPS6033294A (ja) * | 1983-07-29 | 1985-02-20 | Toshiba Ceramics Co Ltd | 単結晶半導体引上装置 |
JPS6379790A (ja) * | 1986-09-22 | 1988-04-09 | Toshiba Corp | 結晶引上げ装置 |
-
1988
- 1988-02-22 JP JP63039152A patent/JP2755588B2/ja not_active Expired - Lifetime
-
1989
- 1989-02-21 DE DE89102992T patent/DE68908435T2/de not_active Expired - Fee Related
- 1989-02-21 US US07/312,847 patent/US5021225A/en not_active Expired - Lifetime
- 1989-02-21 EP EP89102992A patent/EP0330141B1/en not_active Expired - Lifetime
- 1989-02-22 KR KR1019890002086A patent/KR920009563B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100702538B1 (ko) * | 2005-02-28 | 2007-04-04 | 네오세미테크 주식회사 | 액상봉입형 초크랄스키법에 의한 갈륨비소 단결정 성장용반응용기 인상 장치 |
Also Published As
Publication number | Publication date |
---|---|
DE68908435D1 (de) | 1993-09-23 |
US5021225A (en) | 1991-06-04 |
JP2755588B2 (ja) | 1998-05-20 |
EP0330141B1 (en) | 1993-08-18 |
JPH01215788A (ja) | 1989-08-29 |
EP0330141A1 (en) | 1989-08-30 |
DE68908435T2 (de) | 1994-01-05 |
KR920009563B1 (ko) | 1992-10-19 |
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Legal Events
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20030930 Year of fee payment: 12 |
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LAPS | Lapse due to unpaid annual fee |