KR890008603A - 양화형 감광성 전착 피복 조성물 - Google Patents
양화형 감광성 전착 피복 조성물Info
- Publication number
- KR890008603A KR890008603A KR1019880014529A KR880014529A KR890008603A KR 890008603 A KR890008603 A KR 890008603A KR 1019880014529 A KR1019880014529 A KR 1019880014529A KR 880014529 A KR880014529 A KR 880014529A KR 890008603 A KR890008603 A KR 890008603A
- Authority
- KR
- South Korea
- Prior art keywords
- composition
- water
- resin
- weight
- group
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (14)
- 분자내에 하기 일반식(Ⅰ)의 변형 퀴논디아지드 술폰단위를 함유하는 수용성 또는 물-분산성 수지를 주성분으로 함유하는 양화형 감광성 전착 피복 조성물 :(식중, R1은또는이고, R2는 수소원자, 알킬기, 시클로알킬기 또는 알킬 에테르기이고, R3는 알킬렌기, 시클로알킬렌기 또는 알킬렌 에테르기이다).
- 제1항에 있어서, R2가 1 내지 6탄소원자를 갖는 알킬기인 조성물.
- 제2항에 있어서, R2가 메틸기인 조성물.
- 제1항에 있어서, R3가 2 내지 6탄소원자를 갖는 직쇄 알킬렌기인 조성물.
- 제1항에 있어서, 일반식(Ⅰ)의 변형 퀴논디아지드술폰단위가 수지내의 이소시아네트기를 하기 일반식(Ⅴ)의 히드록실-함유 퀴논디아지드 화합물과 반응시킴으로써 수득된 조성물 :(식중, R1, R2, 및 R3는 상기 정의와 동일하다).
- 제5항에 있어서, 히드록실-함유 퀴논디아지드 화합물이 하기 화합물에서 선택되는 조성물 :
- 제1항에 있어서, 수용성 또는 물-분산성 수지가 수지를 기준으로 5 내지 60중량%의 일반식(Ⅰ)의 변형 퀴논디아지드술폰산 단위를 함유하는 조성물.
- 제1항에 있어서, 수용성 또는 물-분산성 수지가 3,000 내지 100,000의 수평균 분자량을 갖는 조성물.
- 제1항에 있어서, 수용성 또는 물-분산성 수지가 10 내지 250(㎎ KOH g 수지)의 산 값을 갖는 조성물.
- 제1항에 있어서, 수용성 또는 물-분산성 수지가 30 내지 250의 아민값을 갖는 양이온 수지인 조성물.
- 제1항에 있어서, 100중량부의 수지당 300중량부 이하의 친수성 용매를 더 함유하는 조성물.
- 제1항에 있어서, 100중량부의 수지당 200중량부 이하의 소수성 용매를 더 함유하는 조성물.
- 인쇄 회로 기판의 제조를 위한 청구범위 제1항의 조성물의 용도.
- 청구범위 제1항의 조성물을 사용하여 제조된 인쇄 회로 기판.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-279288 | 1987-11-06 | ||
JP62279288A JPH07119374B2 (ja) | 1987-11-06 | 1987-11-06 | ポジ型感光性カチオン電着塗料組成物 |
JP279288/87 | 1987-11-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890008603A true KR890008603A (ko) | 1989-03-12 |
KR940002539B1 KR940002539B1 (ko) | 1994-03-25 |
Family
ID=17609077
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880014529A KR940002539B1 (ko) | 1987-11-06 | 1988-11-05 | 양화형 감광성 전착 피복 조성물 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4975351A (ko) |
EP (1) | EP0315165B1 (ko) |
JP (1) | JPH07119374B2 (ko) |
KR (1) | KR940002539B1 (ko) |
CA (1) | CA1331927C (ko) |
DE (1) | DE3883154T2 (ko) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3822522A1 (de) * | 1988-07-04 | 1990-03-22 | Hoechst Ag | 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten |
JP2804579B2 (ja) * | 1989-02-14 | 1998-09-30 | 関西ペイント株式会社 | ポジ型感光性電着塗料組成物及びこれを用いた回路板の製造方法 |
JPH02302092A (ja) * | 1989-05-16 | 1990-12-14 | Kansai Paint Co Ltd | プリント配線板の製造方法 |
JP2865147B2 (ja) * | 1990-06-20 | 1999-03-08 | 関西ペイント株式会社 | ポジ型感光性電着塗料組成物 |
US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
CA2048164C (en) * | 1990-08-02 | 1998-11-10 | Kurt G. Olson | Photoimageable electrodepositable photoresist composition |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
GB9101345D0 (en) * | 1991-01-22 | 1991-03-06 | Ciba Geigy | Electrodeposition method |
US5223373A (en) * | 1991-04-29 | 1993-06-29 | Industrial Technology Research Institute | Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom |
US5314789A (en) * | 1991-10-01 | 1994-05-24 | Shipley Company Inc. | Method of forming a relief image comprising amphoteric compositions |
US5242780A (en) * | 1991-10-18 | 1993-09-07 | Industrial Technology Research Institute | Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups |
JPH05287222A (ja) * | 1992-04-10 | 1993-11-02 | Kansai Paint Co Ltd | ポジ型感光性電着塗料組成物及びそれを用いる回路板の製造方法 |
US5384229A (en) * | 1992-05-07 | 1995-01-24 | Shipley Company Inc. | Photoimageable compositions for electrodeposition |
US5624781A (en) * | 1993-05-28 | 1997-04-29 | Kansai Paint Co., Ltd. | Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition |
JPH07278471A (ja) * | 1994-04-15 | 1995-10-24 | Kansai Paint Co Ltd | ポジ型感光性アニオン電着塗料組成物及びそれを用いるパターンの形成方法 |
US5600035A (en) * | 1994-07-13 | 1997-02-04 | Ppg Industries, Inc. | Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups |
US5449834A (en) * | 1994-07-13 | 1995-09-12 | Ppg Industries, Inc. | Method of synthesizing 2,6-dinitro benzyl compounds |
JP4859437B2 (ja) * | 2005-10-25 | 2012-01-25 | 大阪有機化学工業株式会社 | 被膜形成用樹脂組成物 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE510151A (ko) * | 1949-07-23 | |||
NL247588A (ko) * | 1959-01-21 | |||
DE1114705C2 (de) * | 1959-04-16 | 1962-04-12 | Kalle Ag | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen |
NL255517A (ko) * | 1959-09-04 | |||
US3785825A (en) * | 1971-07-19 | 1974-01-15 | Polychrome Corp | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate |
JPS5221526B2 (ko) * | 1972-01-10 | 1977-06-11 | ||
JPS5024641B2 (ko) * | 1972-10-17 | 1975-08-18 | ||
US4289838A (en) * | 1972-12-14 | 1981-09-15 | Polychrome Corporation | Diazo-unsaturated monomer light sensitive compositions |
US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
CA1005673A (en) * | 1972-12-22 | 1977-02-22 | Constantine C. Petropoulos | Positive printing plate incorporating diazoquinone |
US4189320A (en) * | 1975-04-29 | 1980-02-19 | American Hoechst Corporation | Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures |
US4342820A (en) * | 1980-12-10 | 1982-08-03 | Toray Industries, Inc. | Dry planographic printing plate and preparation thereof |
EP0155231B2 (de) * | 1984-03-07 | 1997-01-15 | Ciba-Geigy Ag | Verfahren zur Herstellung von Abbildungen |
JPS61206293A (ja) * | 1985-03-08 | 1986-09-12 | 日本ペイント株式会社 | 回路板の製造方法 |
-
1987
- 1987-11-06 JP JP62279288A patent/JPH07119374B2/ja not_active Expired - Lifetime
-
1988
- 1988-11-02 CA CA000581945A patent/CA1331927C/en not_active Expired - Fee Related
- 1988-11-03 EP EP88118311A patent/EP0315165B1/en not_active Expired - Lifetime
- 1988-11-03 DE DE88118311T patent/DE3883154T2/de not_active Expired - Fee Related
- 1988-11-05 KR KR1019880014529A patent/KR940002539B1/ko not_active IP Right Cessation
- 1988-11-07 US US07/268,547 patent/US4975351A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0315165A3 (en) | 1990-08-01 |
KR940002539B1 (ko) | 1994-03-25 |
DE3883154D1 (de) | 1993-09-16 |
CA1331927C (en) | 1994-09-13 |
EP0315165B1 (en) | 1993-08-11 |
US4975351A (en) | 1990-12-04 |
DE3883154T2 (de) | 1994-01-27 |
JPH07119374B2 (ja) | 1995-12-20 |
JPH01121375A (ja) | 1989-05-15 |
EP0315165A2 (en) | 1989-05-10 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20010127 Year of fee payment: 8 |
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LAPS | Lapse due to unpaid annual fee |