KR890008603A - 양화형 감광성 전착 피복 조성물 - Google Patents

양화형 감광성 전착 피복 조성물

Info

Publication number
KR890008603A
KR890008603A KR1019880014529A KR880014529A KR890008603A KR 890008603 A KR890008603 A KR 890008603A KR 1019880014529 A KR1019880014529 A KR 1019880014529A KR 880014529 A KR880014529 A KR 880014529A KR 890008603 A KR890008603 A KR 890008603A
Authority
KR
South Korea
Prior art keywords
composition
water
resin
weight
group
Prior art date
Application number
KR1019880014529A
Other languages
English (en)
Other versions
KR940002539B1 (ko
Inventor
유우 아까끼
겐지 세꼬
도시오 곤도오
나오즈미 이와사와
Original Assignee
야마다 모또조오
간사이 뻬인또 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 야마다 모또조오, 간사이 뻬인또 가부시끼가이샤 filed Critical 야마다 모또조오
Publication of KR890008603A publication Critical patent/KR890008603A/ko
Application granted granted Critical
Publication of KR940002539B1 publication Critical patent/KR940002539B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음

Description

양화형 감광성 전착 피복 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (14)

  1. 분자내에 하기 일반식(Ⅰ)의 변형 퀴논디아지드 술폰단위를 함유하는 수용성 또는 물-분산성 수지를 주성분으로 함유하는 양화형 감광성 전착 피복 조성물 :
    (식중, R1은또는이고, R2는 수소원자, 알킬기, 시클로알킬기 또는 알킬 에테르기이고, R3는 알킬렌기, 시클로알킬렌기 또는 알킬렌 에테르기이다).
  2. 제1항에 있어서, R2가 1 내지 6탄소원자를 갖는 알킬기인 조성물.
  3. 제2항에 있어서, R2가 메틸기인 조성물.
  4. 제1항에 있어서, R3가 2 내지 6탄소원자를 갖는 직쇄 알킬렌기인 조성물.
  5. 제1항에 있어서, 일반식(Ⅰ)의 변형 퀴논디아지드술폰단위가 수지내의 이소시아네트기를 하기 일반식(Ⅴ)의 히드록실-함유 퀴논디아지드 화합물과 반응시킴으로써 수득된 조성물 :
    (식중, R1, R2, 및 R3는 상기 정의와 동일하다).
  6. 제5항에 있어서, 히드록실-함유 퀴논디아지드 화합물이 하기 화합물에서 선택되는 조성물 :
  7. 제1항에 있어서, 수용성 또는 물-분산성 수지가 수지를 기준으로 5 내지 60중량%의 일반식(Ⅰ)의 변형 퀴논디아지드술폰산 단위를 함유하는 조성물.
  8. 제1항에 있어서, 수용성 또는 물-분산성 수지가 3,000 내지 100,000의 수평균 분자량을 갖는 조성물.
  9. 제1항에 있어서, 수용성 또는 물-분산성 수지가 10 내지 250(㎎ KOH g 수지)의 산 값을 갖는 조성물.
  10. 제1항에 있어서, 수용성 또는 물-분산성 수지가 30 내지 250의 아민값을 갖는 양이온 수지인 조성물.
  11. 제1항에 있어서, 100중량부의 수지당 300중량부 이하의 친수성 용매를 더 함유하는 조성물.
  12. 제1항에 있어서, 100중량부의 수지당 200중량부 이하의 소수성 용매를 더 함유하는 조성물.
  13. 인쇄 회로 기판의 제조를 위한 청구범위 제1항의 조성물의 용도.
  14. 청구범위 제1항의 조성물을 사용하여 제조된 인쇄 회로 기판.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880014529A 1987-11-06 1988-11-05 양화형 감광성 전착 피복 조성물 KR940002539B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62-279288 1987-11-06
JP62279288A JPH07119374B2 (ja) 1987-11-06 1987-11-06 ポジ型感光性カチオン電着塗料組成物
JP279288/87 1987-11-06

Publications (2)

Publication Number Publication Date
KR890008603A true KR890008603A (ko) 1989-03-12
KR940002539B1 KR940002539B1 (ko) 1994-03-25

Family

ID=17609077

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880014529A KR940002539B1 (ko) 1987-11-06 1988-11-05 양화형 감광성 전착 피복 조성물

Country Status (6)

Country Link
US (1) US4975351A (ko)
EP (1) EP0315165B1 (ko)
JP (1) JPH07119374B2 (ko)
KR (1) KR940002539B1 (ko)
CA (1) CA1331927C (ko)
DE (1) DE3883154T2 (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
JP2804579B2 (ja) * 1989-02-14 1998-09-30 関西ペイント株式会社 ポジ型感光性電着塗料組成物及びこれを用いた回路板の製造方法
JPH02302092A (ja) * 1989-05-16 1990-12-14 Kansai Paint Co Ltd プリント配線板の製造方法
JP2865147B2 (ja) * 1990-06-20 1999-03-08 関西ペイント株式会社 ポジ型感光性電着塗料組成物
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
CA2048164C (en) * 1990-08-02 1998-11-10 Kurt G. Olson Photoimageable electrodepositable photoresist composition
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
GB9101345D0 (en) * 1991-01-22 1991-03-06 Ciba Geigy Electrodeposition method
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5314789A (en) * 1991-10-01 1994-05-24 Shipley Company Inc. Method of forming a relief image comprising amphoteric compositions
US5242780A (en) * 1991-10-18 1993-09-07 Industrial Technology Research Institute Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups
JPH05287222A (ja) * 1992-04-10 1993-11-02 Kansai Paint Co Ltd ポジ型感光性電着塗料組成物及びそれを用いる回路板の製造方法
US5384229A (en) * 1992-05-07 1995-01-24 Shipley Company Inc. Photoimageable compositions for electrodeposition
US5624781A (en) * 1993-05-28 1997-04-29 Kansai Paint Co., Ltd. Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition
JPH07278471A (ja) * 1994-04-15 1995-10-24 Kansai Paint Co Ltd ポジ型感光性アニオン電着塗料組成物及びそれを用いるパターンの形成方法
US5600035A (en) * 1994-07-13 1997-02-04 Ppg Industries, Inc. Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups
US5449834A (en) * 1994-07-13 1995-09-12 Ppg Industries, Inc. Method of synthesizing 2,6-dinitro benzyl compounds
JP4859437B2 (ja) * 2005-10-25 2012-01-25 大阪有機化学工業株式会社 被膜形成用樹脂組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510151A (ko) * 1949-07-23
NL247588A (ko) * 1959-01-21
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
NL255517A (ko) * 1959-09-04
US3785825A (en) * 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
JPS5221526B2 (ko) * 1972-01-10 1977-06-11
JPS5024641B2 (ko) * 1972-10-17 1975-08-18
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
CA1005673A (en) * 1972-12-22 1977-02-22 Constantine C. Petropoulos Positive printing plate incorporating diazoquinone
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
US4342820A (en) * 1980-12-10 1982-08-03 Toray Industries, Inc. Dry planographic printing plate and preparation thereof
EP0155231B2 (de) * 1984-03-07 1997-01-15 Ciba-Geigy Ag Verfahren zur Herstellung von Abbildungen
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法

Also Published As

Publication number Publication date
EP0315165A3 (en) 1990-08-01
KR940002539B1 (ko) 1994-03-25
DE3883154D1 (de) 1993-09-16
CA1331927C (en) 1994-09-13
EP0315165B1 (en) 1993-08-11
US4975351A (en) 1990-12-04
DE3883154T2 (de) 1994-01-27
JPH07119374B2 (ja) 1995-12-20
JPH01121375A (ja) 1989-05-15
EP0315165A2 (en) 1989-05-10

Similar Documents

Publication Publication Date Title
KR890008603A (ko) 양화형 감광성 전착 피복 조성물
KR960038489A (ko) 감광성 수지 조성물 및 그를 이용한 감광소자
KR830007745A (ko) 폴리우레탄 혼합물의 제조방법
KR880002051A (ko) 포지티브형 포토레지스트 조성물용 현상액
KR860001779A (ko) 퀴논 유도체의 제조방법
KR830010403A (ko) 방사선-중합성 혼합물 및 그 광중합 복사물집
AU585898B2 (en) Photosensitive composition
ES2004256A6 (es) Una composicion antioxidante a base de compuestos hidroxiarilicos y aminoarilicos.
KR870009262A (ko) 전자사진 감광체
KR880014418A (ko) 폴리실란 및 감광성 조성물
KR870002213A (ko) 도료 조성물
KR900013348A (ko) 포지티브형 감광성 전착도료 조성물 및 회로판의 제조방법
KR850003394A (ko) 신규의 벤젠설포닐-락탐을 활성물질로서 포함하는 약학적 조성물과 그 제조방법
KR920701869A (ko) 포지티브 레지스트 조성물
KR880004031A (ko) 저장 안정성이 양호한 수지 조성물
KR890014523A (ko) 피리미딘유도체, 그것의 제조방법 및 그것을 함유하는 제초조성물
KR960042214A (ko) 포지티브형 내식막 조성물
KR870009255A (ko) 감광성 조성물
KR830009509A (ko) 감광성 조성물
KR870008830A (ko) 질산염 유도체의 제조 방법
KR870008219A (ko) 비스-1,2-나프토퀴논-2-디아지드-설폰산아미드-함유 감광성 혼합물
KR850007582A (ko) 모노아실 폴리알킬렌 폴리아민의 제조방법
KR920010355A (ko) 광감제 축합물의 제조방법
KR900018194A (ko) 자기성 피복처리 제제 및 자기 기록 매체
KR910000959A (ko) 양이온성 전기 영동 피복 조성물 및 피복방법

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20010127

Year of fee payment: 8

LAPS Lapse due to unpaid annual fee