KR880700260A - 합금피막의 피막두께 및 조성측정방법 - Google Patents
합금피막의 피막두께 및 조성측정방법Info
- Publication number
- KR880700260A KR880700260A KR1019860700334A KR860700334A KR880700260A KR 880700260 A KR880700260 A KR 880700260A KR 1019860700334 A KR1019860700334 A KR 1019860700334A KR 860700334 A KR860700334 A KR 860700334A KR 880700260 A KR880700260 A KR 880700260A
- Authority
- KR
- South Korea
- Prior art keywords
- composition
- measuring
- film thickness
- film
- alloy
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Electromagnetism (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP??59.209098 | 1984-05-10 | ||
JP??59.209097 | 1984-05-10 | ||
JP59209098A JPS6188129A (ja) | 1984-10-05 | 1984-10-05 | 合金被膜の膜厚及び組成測定方法 |
JP59209097A JPH0610660B2 (ja) | 1984-10-05 | 1984-10-05 | 合金被膜の膜厚及び組成測定方法 |
PCT/JP1985/000551 WO1986002164A1 (en) | 1984-10-05 | 1985-10-03 | Method of determining thickness and composition of alloy film |
Publications (2)
Publication Number | Publication Date |
---|---|
KR880700260A true KR880700260A (ko) | 1988-02-22 |
KR900008955B1 KR900008955B1 (ko) | 1990-12-15 |
Family
ID=26517217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019860700334A KR900008955B1 (ko) | 1984-05-10 | 1985-10-03 | 합금피막의 피막두께 및 조성 측정방법 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4764945A (ko) |
EP (1) | EP0197157B1 (ko) |
KR (1) | KR900008955B1 (ko) |
CA (1) | CA1250061A (ko) |
DE (1) | DE3583436D1 (ko) |
WO (1) | WO1986002164A1 (ko) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4959848A (en) * | 1987-12-16 | 1990-09-25 | Axic Inc. | Apparatus for the measurement of the thickness and concentration of elements in thin films by means of X-ray analysis |
GB8811459D0 (en) * | 1988-05-13 | 1988-06-15 | Dmc Boyle Ltd | Method & apparatus for measuring thickness of coating on substrate |
JPH0739987B2 (ja) * | 1988-06-28 | 1995-05-01 | 川崎製鉄株式会社 | 皮膜の厚みと組成の同時測定方法 |
JPH0754244B2 (ja) * | 1989-03-17 | 1995-06-07 | 工業技術院長 | 有機薄膜のx線による膜厚測定法 |
US5081658A (en) * | 1989-03-30 | 1992-01-14 | Nkk Corporation | Method of measuring plating amount and plating film composition of plated steel plate and apparatus therefor |
JP2745428B2 (ja) * | 1989-11-30 | 1998-04-28 | 日新製鋼株式会社 | X線回折法による高加工用合金化亜鉛めつき鋼板の加工性能評価方法 |
DE4021617C2 (de) * | 1990-07-06 | 1993-12-02 | Kugelfischer G Schaefer & Co | Vorrichtung zum kontinuierlichen Messen des Eisengehaltes in Zinkschichten |
NO171524C (no) * | 1990-10-18 | 1993-03-24 | Dag Brune | Fremgangsmaate for paavisning av korrosjonsangrep i metalloverflater |
EP0523566B1 (en) * | 1991-07-11 | 2001-11-21 | International Superconductivity Technology Center | Apparatus for solid surface analysis using x-ray spectroscopy |
EP0602519B1 (de) * | 1992-12-12 | 1997-01-15 | Klinger AG | Absperrventil und Dichtungsring |
DE4304938C2 (de) * | 1993-02-18 | 1996-04-25 | Daimler Benz Ag | Goniometer mit mehreren Achsen |
US5723791A (en) | 1993-09-28 | 1998-03-03 | Defelsko Corporation | High resolution ultrasonic coating thickness gauge |
JPH11502025A (ja) * | 1995-10-03 | 1999-02-16 | フィリップス エレクトロニクス エヌ ベー | 同時x線回折及びx線蛍光測定のための装置 |
DE19618774A1 (de) * | 1996-05-10 | 1997-11-13 | Helmut Fischer Gmbh & Co | Röntgenfluoreszenz-Verfahren zum Bestimmen der Zusammensetzung eines Materiales sowie Vorrichtung zur Durchführung eines solchen Verfahrens |
US5742658A (en) * | 1996-05-23 | 1998-04-21 | Advanced Micro Devices, Inc. | Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer |
US6005915A (en) * | 1997-11-07 | 1999-12-21 | Advanced Micro Devices, Inc. | Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons |
JP3820049B2 (ja) * | 1998-07-16 | 2006-09-13 | パナリティカル ビー ヴィ | 薄膜の蛍光x線分析方法及び装置 |
JP2000311146A (ja) * | 1999-04-28 | 2000-11-07 | Rigaku Industrial Co | 蛍光x線分析装置 |
EP1076222A1 (en) * | 1999-08-10 | 2001-02-14 | Corus Aluminium Walzprodukte GmbH | X-ray fluorescence measurement of aluminium sheet thickness |
CN1392956A (zh) * | 2000-09-22 | 2003-01-22 | 川崎制铁株式会社 | 采用x射线衍射法的金属相定量测定方法、装置及采用该方法和装置的电镀钢板制造方法 |
US6611576B1 (en) * | 2001-02-12 | 2003-08-26 | Advanced Micro Devices, Inc. | Automated control of metal thickness during film deposition |
US6792075B2 (en) * | 2002-08-21 | 2004-09-14 | Hypernex, Inc. | Method and apparatus for thin film thickness mapping |
JP2006266689A (ja) * | 2005-03-22 | 2006-10-05 | Fujitsu Ltd | 蛍光x線分析装置、蛍光x線分析方法、蛍光x線分析プログラム |
JP4247559B2 (ja) * | 2005-06-07 | 2009-04-02 | 株式会社リガク | 蛍光x線分析装置およびそれに用いるプログラム |
CA2623002A1 (en) * | 2005-09-22 | 2007-03-29 | Jfe Steel Corporation | Method of evaluating press-formability of galvanized steel sheet |
DE102006009247B4 (de) * | 2006-02-28 | 2007-12-27 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zum Abschätzen der kristallinen Textur gestapelter Metallleitungen in Mikrostrukturbauelementen |
CN105444706B (zh) * | 2016-01-29 | 2018-02-02 | 工业和信息化部电子第五研究所 | 具有复合金属镀层的电子元件中各镀层厚度的测量方法 |
JP6477984B1 (ja) * | 2017-04-25 | 2019-03-06 | 新日鐵住金株式会社 | スケール組成判定システム、スケール組成判定方法、およびプログラム |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2711480A (en) * | 1948-06-29 | 1955-06-21 | Friedman Herbert | Method of measuring thickness of thin layers |
US2897371A (en) * | 1956-08-01 | 1959-07-28 | Applied Res Lab Inc | Spectroscopy |
IL41592A (en) * | 1973-02-20 | 1976-02-29 | Tech Res & Dev Found Ltd | X-ray spectrodiffractometer |
JPS5017695A (ko) * | 1973-06-14 | 1975-02-25 | ||
DE2336652A1 (de) * | 1973-07-18 | 1975-01-30 | Siemens Ag | Schichtsystem zur absorption von roentgenstrahlen |
JPS5847659B2 (ja) * | 1975-08-12 | 1983-10-24 | 日新製鋼株式会社 | ゴウキンカアエンテツバンノ ゴウキンカドノ ソクテイホウホウ |
DE2727505A1 (de) * | 1977-06-18 | 1979-01-04 | Ibm Deutschland | Roentgenfluoreszenzanalyse zur untersuchung oberflaechennaher schichten |
JPS57157145A (en) * | 1981-03-24 | 1982-09-28 | Sumitomo Metal Ind Ltd | X-ray analyzer |
DE3129049A1 (de) * | 1981-07-23 | 1983-02-24 | Hoesch Werke Ag, 4600 Dortmund | Verfahren und vorrichtung zur zerstoerungsfreien bestimmung der dicke der eisen-zinn-zwischenschicht an elektrolytisch verzinntem blech |
JPS58150845A (ja) * | 1982-03-04 | 1983-09-07 | Kawatetsu Kousen Kogyo Kk | X線測定による多元系合金めつき層の定量分析法 |
JPS58223047A (ja) * | 1982-06-18 | 1983-12-24 | Sumitomo Metal Ind Ltd | 螢光x線分析方法 |
-
1985
- 1985-10-03 EP EP85904879A patent/EP0197157B1/en not_active Expired - Lifetime
- 1985-10-03 US US06/860,190 patent/US4764945A/en not_active Expired - Lifetime
- 1985-10-03 DE DE8585904879T patent/DE3583436D1/de not_active Expired - Fee Related
- 1985-10-03 WO PCT/JP1985/000551 patent/WO1986002164A1/ja active IP Right Grant
- 1985-10-03 KR KR1019860700334A patent/KR900008955B1/ko not_active IP Right Cessation
- 1985-10-04 CA CA000492333A patent/CA1250061A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0197157A4 (en) | 1988-10-24 |
DE3583436D1 (de) | 1991-08-14 |
US4764945A (en) | 1988-08-16 |
EP0197157A1 (en) | 1986-10-15 |
WO1986002164A1 (en) | 1986-04-10 |
EP0197157B1 (en) | 1991-07-10 |
CA1250061A (en) | 1989-02-14 |
KR900008955B1 (ko) | 1990-12-15 |
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Legal Events
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G160 | Decision to publish patent application | ||
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GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20011205 Year of fee payment: 12 |
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