KR880700260A - 합금피막의 피막두께 및 조성측정방법 - Google Patents

합금피막의 피막두께 및 조성측정방법

Info

Publication number
KR880700260A
KR880700260A KR1019860700334A KR860700334A KR880700260A KR 880700260 A KR880700260 A KR 880700260A KR 1019860700334 A KR1019860700334 A KR 1019860700334A KR 860700334 A KR860700334 A KR 860700334A KR 880700260 A KR880700260 A KR 880700260A
Authority
KR
South Korea
Prior art keywords
composition
measuring
film thickness
film
alloy
Prior art date
Application number
KR1019860700334A
Other languages
English (en)
Other versions
KR900008955B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59209098A external-priority patent/JPS6188129A/ja
Priority claimed from JP59209097A external-priority patent/JPH0610660B2/ja
Application filed filed Critical
Publication of KR880700260A publication Critical patent/KR880700260A/ko
Application granted granted Critical
Publication of KR900008955B1 publication Critical patent/KR900008955B1/ko

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
KR1019860700334A 1984-05-10 1985-10-03 합금피막의 피막두께 및 조성 측정방법 KR900008955B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP??59.209098 1984-05-10
JP??59.209097 1984-05-10
JP59209098A JPS6188129A (ja) 1984-10-05 1984-10-05 合金被膜の膜厚及び組成測定方法
JP59209097A JPH0610660B2 (ja) 1984-10-05 1984-10-05 合金被膜の膜厚及び組成測定方法
PCT/JP1985/000551 WO1986002164A1 (en) 1984-10-05 1985-10-03 Method of determining thickness and composition of alloy film

Publications (2)

Publication Number Publication Date
KR880700260A true KR880700260A (ko) 1988-02-22
KR900008955B1 KR900008955B1 (ko) 1990-12-15

Family

ID=26517217

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860700334A KR900008955B1 (ko) 1984-05-10 1985-10-03 합금피막의 피막두께 및 조성 측정방법

Country Status (6)

Country Link
US (1) US4764945A (ko)
EP (1) EP0197157B1 (ko)
KR (1) KR900008955B1 (ko)
CA (1) CA1250061A (ko)
DE (1) DE3583436D1 (ko)
WO (1) WO1986002164A1 (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4959848A (en) * 1987-12-16 1990-09-25 Axic Inc. Apparatus for the measurement of the thickness and concentration of elements in thin films by means of X-ray analysis
GB8811459D0 (en) * 1988-05-13 1988-06-15 Dmc Boyle Ltd Method & apparatus for measuring thickness of coating on substrate
JPH0739987B2 (ja) * 1988-06-28 1995-05-01 川崎製鉄株式会社 皮膜の厚みと組成の同時測定方法
JPH0754244B2 (ja) * 1989-03-17 1995-06-07 工業技術院長 有機薄膜のｘ線による膜厚測定法
US5081658A (en) * 1989-03-30 1992-01-14 Nkk Corporation Method of measuring plating amount and plating film composition of plated steel plate and apparatus therefor
JP2745428B2 (ja) * 1989-11-30 1998-04-28 日新製鋼株式会社 Ｘ線回折法による高加工用合金化亜鉛めつき鋼板の加工性能評価方法
DE4021617C2 (de) * 1990-07-06 1993-12-02 Kugelfischer G Schaefer & Co Vorrichtung zum kontinuierlichen Messen des Eisengehaltes in Zinkschichten
NO171524C (no) * 1990-10-18 1993-03-24 Dag Brune Fremgangsmaate for paavisning av korrosjonsangrep i metalloverflater
EP0523566B1 (en) * 1991-07-11 2001-11-21 International Superconductivity Technology Center Apparatus for solid surface analysis using x-ray spectroscopy
EP0602519B1 (de) * 1992-12-12 1997-01-15 Klinger AG Absperrventil und Dichtungsring
DE4304938C2 (de) * 1993-02-18 1996-04-25 Daimler Benz Ag Goniometer mit mehreren Achsen
US5723791A (en) 1993-09-28 1998-03-03 Defelsko Corporation High resolution ultrasonic coating thickness gauge
JPH11502025A (ja) * 1995-10-03 1999-02-16 フィリップス エレクトロニクス エヌ ベー 同時ｘ線回折及びｘ線蛍光測定のための装置
DE19618774A1 (de) * 1996-05-10 1997-11-13 Helmut Fischer Gmbh & Co Röntgenfluoreszenz-Verfahren zum Bestimmen der Zusammensetzung eines Materiales sowie Vorrichtung zur Durchführung eines solchen Verfahrens
US5742658A (en) * 1996-05-23 1998-04-21 Advanced Micro Devices, Inc. Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer
US6005915A (en) * 1997-11-07 1999-12-21 Advanced Micro Devices, Inc. Apparatus and method for measuring the roughness of a target material surface based upon the scattering of incident X-ray photons
JP3820049B2 (ja) * 1998-07-16 2006-09-13 パナリティカル ビー ヴィ 薄膜の蛍光ｘ線分析方法及び装置
JP2000311146A (ja) * 1999-04-28 2000-11-07 Rigaku Industrial Co 蛍光ｘ線分析装置
EP1076222A1 (en) * 1999-08-10 2001-02-14 Corus Aluminium Walzprodukte GmbH X-ray fluorescence measurement of aluminium sheet thickness
CN1392956A (zh) * 2000-09-22 2003-01-22 川崎制铁株式会社 采用x射线衍射法的金属相定量测定方法、装置及采用该方法和装置的电镀钢板制造方法
US6611576B1 (en) * 2001-02-12 2003-08-26 Advanced Micro Devices, Inc. Automated control of metal thickness during film deposition
US6792075B2 (en) * 2002-08-21 2004-09-14 Hypernex, Inc. Method and apparatus for thin film thickness mapping
JP2006266689A (ja) * 2005-03-22 2006-10-05 Fujitsu Ltd 蛍光ｘ線分析装置、蛍光ｘ線分析方法、蛍光ｘ線分析プログラム
JP4247559B2 (ja) * 2005-06-07 2009-04-02 株式会社リガク 蛍光ｘ線分析装置およびそれに用いるプログラム
CA2623002A1 (en) * 2005-09-22 2007-03-29 Jfe Steel Corporation Method of evaluating press-formability of galvanized steel sheet
DE102006009247B4 (de) * 2006-02-28 2007-12-27 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Abschätzen der kristallinen Textur gestapelter Metallleitungen in Mikrostrukturbauelementen
CN105444706B (zh) * 2016-01-29 2018-02-02 工业和信息化部电子第五研究所 具有复合金属镀层的电子元件中各镀层厚度的测量方法
JP6477984B1 (ja) * 2017-04-25 2019-03-06 新日鐵住金株式会社 スケール組成判定システム、スケール組成判定方法、およびプログラム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2711480A (en) * 1948-06-29 1955-06-21 Friedman Herbert Method of measuring thickness of thin layers
US2897371A (en) * 1956-08-01 1959-07-28 Applied Res Lab Inc Spectroscopy
IL41592A (en) * 1973-02-20 1976-02-29 Tech Res & Dev Found Ltd X-ray spectrodiffractometer
JPS5017695A (ko) * 1973-06-14 1975-02-25
DE2336652A1 (de) * 1973-07-18 1975-01-30 Siemens Ag Schichtsystem zur absorption von roentgenstrahlen
JPS5847659B2 (ja) * 1975-08-12 1983-10-24 日新製鋼株式会社 ゴウキンカアエンテツバンノ ゴウキンカドノ ソクテイホウホウ
DE2727505A1 (de) * 1977-06-18 1979-01-04 Ibm Deutschland Roentgenfluoreszenzanalyse zur untersuchung oberflaechennaher schichten
JPS57157145A (en) * 1981-03-24 1982-09-28 Sumitomo Metal Ind Ltd X-ray analyzer
DE3129049A1 (de) * 1981-07-23 1983-02-24 Hoesch Werke Ag, 4600 Dortmund Verfahren und vorrichtung zur zerstoerungsfreien bestimmung der dicke der eisen-zinn-zwischenschicht an elektrolytisch verzinntem blech
JPS58150845A (ja) * 1982-03-04 1983-09-07 Kawatetsu Kousen Kogyo Kk Ｘ線測定による多元系合金めつき層の定量分析法
JPS58223047A (ja) * 1982-06-18 1983-12-24 Sumitomo Metal Ind Ltd 螢光ｘ線分析方法

Also Published As

Publication number Publication date
EP0197157A4 (en) 1988-10-24
DE3583436D1 (de) 1991-08-14
US4764945A (en) 1988-08-16
EP0197157A1 (en) 1986-10-15
WO1986002164A1 (en) 1986-04-10
EP0197157B1 (en) 1991-07-10
CA1250061A (en) 1989-02-14
KR900008955B1 (ko) 1990-12-15

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