KR870004417A - 자기 디스크의 제조법 - Google Patents

자기 디스크의 제조법 Download PDF

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Publication number
KR870004417A
KR870004417A KR1019860008267A KR860008267A KR870004417A KR 870004417 A KR870004417 A KR 870004417A KR 1019860008267 A KR1019860008267 A KR 1019860008267A KR 860008267 A KR860008267 A KR 860008267A KR 870004417 A KR870004417 A KR 870004417A
Authority
KR
South Korea
Prior art keywords
magnetic
magnetic film
substrate
film
disk
Prior art date
Application number
KR1019860008267A
Other languages
English (en)
Other versions
KR900007484B1 (ko
Inventor
도시로 아베
도시까즈 니시하라
Original Assignee
이노우에 도시야
니뽕 빅터 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP22186185A external-priority patent/JPS6282517A/ja
Application filed by 이노우에 도시야, 니뽕 빅터 가부시끼 가이샤 filed Critical 이노우에 도시야
Publication of KR870004417A publication Critical patent/KR870004417A/ko
Application granted granted Critical
Publication of KR900007484B1 publication Critical patent/KR900007484B1/ko

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/85—Coating a support with a magnetic layer by vapour deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/90—Magnetic feature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/928—Magnetic property
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

내용 없음

Description

자기 디스크의 제조법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1 및 2도는 본 발명에 관한 자기 디스크의 제조법의 실시에 있어서 사용하는 환상 마그네트톤 스피터 장치의 요부의 개략을 도시하는 설명도이다.
도면의 주요부분에 대한 부호의 설명
1:기판, 2:타겟트, 3:침식 영역, 4:Cr막(자성 하지막), 5:Co-Ni자성막(자성막), 6:마스크, 7:중심 축 가상선.

Claims (2)

  1. 기판 위에 자성하지 막 및/또는 자성 막을 물리 증착법에 의해 형성하여 자기 디스크를 제조하는 경우에, 기판 위에 피착하는 자성하지 막 및/또는 자성막을 구성하는 입자의 비례원의 위치가 자기 디스크의 자성 막 기록부보다 내쪽에 대응하는 위치에 있도록 하여 물리 증착하는 것을 특징으로 하는 자기 디스크의 제조법.
  2. 기판 위에 자성하지 막 및/또는 자성 막을 스피터 법에 의해 형성하여 자기 디스크를 제조하는 경우에, 실질상 상기 기판의 중심축 가상선을 넘도록 비례하는 자성하지 막 및/또는 자성 막을 구성하는 증발 입자만이 기판위에 피착되고 자성하지 막 및/또는 자성 막을 형성하도록 한 것을 특징으로 하는 자기디스크의 제조법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019860008267A 1985-10-07 1986-10-02 자기디스크의 제조법 KR900007484B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP221860 1985-10-07
JP221861 1985-10-07
JP60221860A JPS6282516A (ja) 1985-10-07 1985-10-07 磁気デイスクの製造法
JP22186185A JPS6282517A (ja) 1985-10-07 1985-10-07 磁気デイスクの製造法

Publications (2)

Publication Number Publication Date
KR870004417A true KR870004417A (ko) 1987-05-09
KR900007484B1 KR900007484B1 (ko) 1990-10-10

Family

ID=26524541

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860008267A KR900007484B1 (ko) 1985-10-07 1986-10-02 자기디스크의 제조법

Country Status (3)

Country Link
US (2) US4776938A (ko)
JP (1) JPS6282516A (ko)
KR (1) KR900007484B1 (ko)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3800449A1 (de) * 1988-01-09 1989-07-20 Leybold Ag Verfahren und einrichtung zur herstellung magnetooptischer, speicher- und loeschfaehiger datentraeger
US5063120A (en) * 1988-02-25 1991-11-05 International Business Machines Corporation Thin film magentic media
DE69007261D1 (de) * 1989-12-27 1994-04-14 Mitsubishi Chem Ind Langgestreckter magnetischer Aufzeichnungsträger.
US5198090A (en) * 1990-08-31 1993-03-30 International Business Machines Corporation Sputtering apparatus for producing thin films of material
JPH04205916A (ja) * 1990-11-30 1992-07-28 Victor Co Of Japan Ltd 磁気記録媒体
US5693198A (en) * 1992-06-30 1997-12-02 Hmt Technology Corporation Method of producing a magnetic recording medium
US5616218A (en) * 1994-09-12 1997-04-01 Matereials Research Corporation Modification and selection of the magnetic properties of magnetic recording media through selective control of the crystal texture of the recording layer
DE19734633C2 (de) * 1997-08-11 1999-08-26 Forschungszentrum Juelich Gmbh Hochdruck-Magnetron-Kathode
US7294242B1 (en) * 1998-08-24 2007-11-13 Applied Materials, Inc. Collimated and long throw magnetron sputtering of nickel/iron films for magnetic recording head applications
DE10004824B4 (de) * 2000-02-04 2009-06-25 Oc Oerlikon Balzers Ag Verfahren zur Herstellung von Substraten, Magnetronquelle, Sputterbeschichtungskammer und Verwendung des Verfahrens
US6914749B2 (en) * 2000-07-25 2005-07-05 Seagate Technology Llc Magnetic anisotropy of soft-underlayer induced by magnetron field
JP4502160B2 (ja) * 2000-09-27 2010-07-14 キヤノンアネルバ株式会社 磁性膜作成方法及び磁性膜作成装置並びに磁気記録ディスク製造方法
US6761982B2 (en) 2000-12-28 2004-07-13 Showa Denko Kabushiki Kaisha Magnetic recording medium, production process and apparatus thereof, and magnetic recording and reproducing apparatus
JP2002260218A (ja) * 2001-03-05 2002-09-13 Anelva Corp 磁気記録ディスク、磁気記録ディスク製造方法及び磁気記録ディスク製造装置
KR100763285B1 (ko) 2001-08-29 2007-10-04 데이빗 엔. 램베스 자성장치
US6808830B2 (en) 2001-12-28 2004-10-26 Showa Denko K.K. Magnetic recording medium, production process and apparatus thereof, and magnetic recording and reproducing apparatus
JP4170083B2 (ja) * 2002-12-02 2008-10-22 富士通株式会社 多結晶構造膜および磁気記録媒体並びに磁気記憶装置
US7482069B2 (en) 2002-12-02 2009-01-27 Fujitsu Limited Polycrystalline structure film having inclined lattice surfaces
JP4234684B2 (ja) 2003-05-02 2009-03-04 富士通株式会社 磁気記録媒体、磁気記憶装置及び磁気記録媒体の製造方法
GB2406860A (en) * 2003-10-09 2005-04-13 Univ Southampton Vapour deposition method
US7553426B2 (en) * 2005-03-01 2009-06-30 Hitachi Global Storage Technologies Netherlands B.V. Apparatus, system, and method for increasing data storage density in patterned media
US7667929B2 (en) * 2005-04-04 2010-02-23 Hitachi Global Storage Technologies Netherlands B.V. Apparatus, method and system for fabricating a patterned media imprint master
US7236324B2 (en) * 2005-10-18 2007-06-26 Hitachi Global Storage Technologies Apparatus, method and system for fabricating servo patterns on high density patterned media
US8084654B2 (en) * 2007-10-23 2011-12-27 Sk Chemicals Co., Ltd. Manufacturing process for iodinated aromatic compounds

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59178617A (ja) * 1983-03-30 1984-10-09 Tdk Corp 磁気記録媒体の製造方法
JPS6130017A (ja) * 1984-07-20 1986-02-12 Nippon Telegr & Teleph Corp <Ntt> 酸化物垂直磁化薄膜の製造方法
US4698251A (en) * 1985-01-22 1987-10-06 Victor Company Of Japan, Limited Magnetic recording medium and method of producing the same
JPS61187125A (ja) * 1985-02-14 1986-08-20 Hitachi Ltd 磁気デイスクの磁場配向方法

Also Published As

Publication number Publication date
US4776938A (en) 1988-10-11
JPS6282516A (ja) 1987-04-16
KR900007484B1 (ko) 1990-10-10
JPH0447891B2 (ko) 1992-08-05
US4808489A (en) 1989-02-28

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