KR860001139A - 방사선 중합성 혼합물 - Google Patents

방사선 중합성 혼합물 Download PDF

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Publication number
KR860001139A
KR860001139A KR1019850005320A KR850005320A KR860001139A KR 860001139 A KR860001139 A KR 860001139A KR 1019850005320 A KR1019850005320 A KR 1019850005320A KR 850005320 A KR850005320 A KR 850005320A KR 860001139 A KR860001139 A KR 860001139A
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KR
South Korea
Prior art keywords
polymerizable mixture
compound
radiation polymerizable
copolymer
carboxylic acid
Prior art date
Application number
KR1019850005320A
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English (en)
Other versions
KR930007506B1 (ko
Inventor
가이쓸러 울리히 (외 1)
Original Assignee
베틀라우퍼, 게르만
훽스트 아크티엔 게젤샤프트(외 1)
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Application filed by 베틀라우퍼, 게르만, 훽스트 아크티엔 게젤샤프트(외 1) filed Critical 베틀라우퍼, 게르만
Publication of KR860001139A publication Critical patent/KR860001139A/ko
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Publication of KR930007506B1 publication Critical patent/KR930007506B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1806—C6-(meth)acrylate, e.g. (cyclo)hexyl (meth)acrylate or phenyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Abstract

내용 없음

Description

방사선 중합성 혼합물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. ⒜에틸렌적으로 불포화된 말단그룹을 2개이상 함유하고 대기압하에서 약 100℃의 비검을 갖는, 유리라디칼 중합가능한 화합물; ⒝ 화학선 작용하에 화합물(a)의중합반응을 개시시킬 수 있는 화합물; 및 (c) α,β-불포화된 지방족 카복실산(C1), 알킬부위의 4개이상의 탄소원자를 함유하는 알킬메타크릴 레이드(C2), 및 필요시, 전술된 카복실산 및 알킬메타크릴레이드와 공중합 가능하고 이의 상응하는 단일 중합체의 유리전이온도가 80℃이상인 에틸렌적으로 불포화된 단량체 화합물(C3)로 이루어진, 평균분자량 약 50,000 내지 200,000의 수-불용성 알킬리수용액-가용성, 방사선 중합성 혼합물.
  2. 제1항에 있어서, 언급된 공중합체가 매스중합반응으로 제조되는 방사선 중합성 혼합물.
  3. 제1항에 있어서, 언급된 공중합체가 성분(C3)로서 스티렌 또는 치환된 스티렌을 함유하는 방사선 중합성 혼합물.
  4. 제1항에 있어서, 언급된 중합성 화합물이 다가알콜의 아크릴레이트 또는 메타크릴레이트인 방사선 중합성 혼합물.
  5. 제1항에 있어서, 언급된 공중합체가 20내지 60몰%의 α,β-불포화된 카복실산을 함유하는 방사선 중합성 혼합물.
  6. 제1항에 있어서, 언급된 α,β-불포화된 지방족 카복실산이 아크릴산 또는 메타크릴산인 방사선 중합성 혼합물.
  7. α,β-불포화된 지방족 카복실산, 알킬부위에 4개이상의 탄소원자를 갖는 알킬메타크릴레이트, 및 필요시 불포화된 카복실산 및 알킬메타크릴레이트와 공중합가능하고 이의 상응하는 단일중합체의 유리전이 온도가 80℃이상인 에틸렌적으로 불포화된 단량체 화합물 1종이상을, 유리라디칼 중합반응개시제의 존재하에 매스중합시켜, 평균분자량 약 50,000 내지 200,000의공중합체(C)를 제조하는 방법.
  8. 제7항에 있어서, 쇄조절제를 첨가하는 방법.
  9. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850005320A 1984-07-26 1985-07-25 방사선 중합가능한 혼합물 KR930007506B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19843427519 DE3427519A1 (de) 1984-07-26 1984-07-26 Durch strahlung polymerisierbares gemisch, darin enthaltenes mischpolymerisat und verfahren zur herstellung des mischpolymerisats
DEP3427519.3 1984-07-26

Publications (2)

Publication Number Publication Date
KR860001139A true KR860001139A (ko) 1986-02-22
KR930007506B1 KR930007506B1 (ko) 1993-08-12

Family

ID=6241595

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850005320A KR930007506B1 (ko) 1984-07-26 1985-07-25 방사선 중합가능한 혼합물

Country Status (9)

Country Link
US (1) US4705740A (ko)
EP (2) EP0173057B1 (ko)
JP (1) JPH0668057B2 (ko)
KR (1) KR930007506B1 (ko)
AT (2) ATE40846T1 (ko)
DE (3) DE3427519A1 (ko)
HK (1) HK94691A (ko)
SG (1) SG79891G (ko)
ZA (1) ZA855194B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287616B1 (en) 1996-08-21 2001-09-11 Nestec S.A. Cold water soluble creamer
US6589586B2 (en) 1996-08-21 2003-07-08 Nestec S.A. Cold beverage creamer

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CA1292011C (en) * 1985-10-25 1991-11-12 Susan S. Romm Storage stable (meth)acrylate plastisols
DE3878349T2 (de) * 1987-03-17 1993-05-27 Hitachi Chemical Co Ltd Substituierte acridin-derivate und deren verwendung.
US5026626A (en) * 1987-08-03 1991-06-25 Barton Oliver A Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition
US4952482A (en) * 1987-08-03 1990-08-28 Hoechst Calanese Corporation Method of imaging oxygen resistant radiation polymerizable composition and element containing a photopolymer composition
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
KR940004022B1 (ko) * 1989-05-17 1994-05-11 아사히가세이고오교 가부시끼가이샤 광경화성 수지 적층체 및 그것을 사용하는 프린트 배선판의 제조방법
CA2025198A1 (en) * 1989-10-25 1991-04-26 Daniel F. Varnell Liquid solder mask composition
EP0493317B2 (de) * 1990-12-18 2001-01-10 Ciba SC Holding AG Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungsmittel
DE4216167A1 (de) * 1992-05-18 1993-11-25 Roehm Gmbh Wasserlösliche Polymerdispersionen
DE4406624A1 (de) * 1994-03-01 1995-09-07 Roehm Gmbh Vernetzte wasserlösliche Polymerdispersionen
JP3638660B2 (ja) * 1995-05-01 2005-04-13 松下電器産業株式会社 感光性樹脂組成物、それを用いたサンドブラスト用感光性ドライフィルム及びそれを用いた食刻方法
US6004725A (en) * 1997-12-01 1999-12-21 Morton International, Inc. Photoimageable compositions
WO2011014011A2 (ko) * 2009-07-28 2011-02-03 주식회사 동진쎄미켐 가교성 경화 물질을 포함하는 포토레지스트 조성물
JP5737656B2 (ja) * 2009-08-19 2015-06-17 国立大学法人茨城大学 透明含フッ素重合物

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DE1619150A1 (de) * 1966-09-10 1969-08-21 Roehm & Haas Gmbh Textilschlichten
US3554913A (en) * 1969-08-15 1971-01-12 Us Army Friction reduction by copolymer of n-alkyl methacrylates and methacrylic acid in solution
US3833384A (en) * 1972-04-26 1974-09-03 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2509473A1 (de) * 1975-03-05 1976-09-16 Roehm Gmbh Bitumenverbesserungsmittel
US4296196A (en) * 1978-05-20 1981-10-20 Hoechst Aktiengesellschaft Photopolymerizable mixture in a transfer element
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
JPS57204032A (en) * 1981-06-10 1982-12-14 Somar Corp Photosensitive material
US4361640A (en) * 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287616B1 (en) 1996-08-21 2001-09-11 Nestec S.A. Cold water soluble creamer
US6589586B2 (en) 1996-08-21 2003-07-08 Nestec S.A. Cold beverage creamer

Also Published As

Publication number Publication date
DE3427519A1 (de) 1986-02-06
HK94691A (en) 1991-11-29
EP0271077A1 (de) 1988-06-15
ATE66681T1 (de) 1991-09-15
EP0173057B1 (de) 1989-02-15
US4705740A (en) 1987-11-10
ATE40846T1 (de) 1989-03-15
EP0271077B1 (de) 1991-08-28
EP0173057A2 (de) 1986-03-05
ZA855194B (en) 1986-02-26
DE3583945D1 (de) 1991-10-02
JPS6140310A (ja) 1986-02-26
DE3568296D1 (en) 1989-03-23
KR930007506B1 (ko) 1993-08-12
EP0173057A3 (en) 1986-11-20
SG79891G (en) 1991-11-15
JPH0668057B2 (ja) 1994-08-31

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