KR850005512A - 전극 제작 방법 - Google Patents

전극 제작 방법 Download PDF

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Publication number
KR850005512A
KR850005512A KR1019850000413A KR850000413A KR850005512A KR 850005512 A KR850005512 A KR 850005512A KR 1019850000413 A KR1019850000413 A KR 1019850000413A KR 850000413 A KR850000413 A KR 850000413A KR 850005512 A KR850005512 A KR 850005512A
Authority
KR
South Korea
Prior art keywords
electrode
metal
component metal
fluid composition
fabrication method
Prior art date
Application number
KR1019850000413A
Other languages
English (en)
Other versions
KR890003165B1 (ko
Inventor
히로시(외 2) 아사노
Original Assignee
나까가와 세이지
페르멜렉 덴꼬꾸 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나까가와 세이지, 페르멜렉 덴꼬꾸 가부시기 가이샤 filed Critical 나까가와 세이지
Publication of KR850005512A publication Critical patent/KR850005512A/ko
Application granted granted Critical
Publication of KR890003165B1 publication Critical patent/KR890003165B1/ko

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/86Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88Processes of manufacture
    • H01M4/8825Methods for deposition of the catalytic active composition
    • H01M4/8828Coating with slurry or ink
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/86Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88Processes of manufacture
    • H01M4/8878Treatment steps after deposition of the catalytic active composition or after shaping of the electrode being free-standing body
    • H01M4/8882Heat treatment, e.g. drying, baking
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemically Coating (AREA)
  • Inert Electrodes (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

내용 없음

Description

전극 제작 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. 전극 성분 금속을 포함하는 유동체 조성물을 가열시켜 열적으로 처리하여 전극 재질 또는 전극 코팅을 형성하기 위한 방법에 있어서, 유동체 조성물을 상기 전극 성분 금속의 금속이온과 복합체 형태로 될 수 있는 리간드로서 유기질 혼합물을 포함하는 것을 특징으로 하는 전극 제작 방법.
  2. 제1항의 방법에 있어서, 전극 성분 금속을 포함하는 상기 유동체 조성물을 금속 기질상에 코팅하며 상기 코팅된 기질을 열적으로 처리하는 것을 특징으로하는 전극제작방법.
  3. 제1항의 방법에 있어서, 상기 열처리는 산화성 대기내에서 약 250℃에서 약 800℃까지의 온도로 처리되는 것을 특징으로 하는 전극제작방법.
  4. 제1항의 방법에 있어서, 상기 전극 성분 금속은 Al,Sn,Sb,Ge,Bi,Ga,In, Ti,Zr,Ta,Hf,V,Mo,W,Ru,Pd 및 Ir로 구성되어 있는 그룹으로부터 최소한 하나가 선택되는 것을 특징으로 하는 전극제작방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850000413A 1984-01-31 1985-01-23 전극 제작 방법 KR890003165B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP59014412A JPS60159185A (ja) 1984-01-31 1984-01-31 電極の製造方法
JP14412 1984-01-31
JP59-14412 1984-01-31

Publications (2)

Publication Number Publication Date
KR850005512A true KR850005512A (ko) 1985-08-26
KR890003165B1 KR890003165B1 (ko) 1989-08-25

Family

ID=11860321

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850000413A KR890003165B1 (ko) 1984-01-31 1985-01-23 전극 제작 방법

Country Status (12)

Country Link
US (1) US4668531A (ko)
JP (1) JPS60159185A (ko)
KR (1) KR890003165B1 (ko)
AU (1) AU567789B2 (ko)
CA (1) CA1233370A (ko)
DE (1) DE3502876A1 (ko)
FR (1) FR2558851B1 (ko)
GB (1) GB2154248B (ko)
IT (1) IT1182155B (ko)
MY (1) MY101996A (ko)
NL (1) NL188953C (ko)
SE (1) SE8500419L (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4906493A (en) * 1985-04-26 1990-03-06 Sri International Method of preparing coatings of metal carbides and the like
FR2625364B1 (fr) * 1987-12-23 1990-05-04 Thomson Csf Procede de fabrication d'une cathode impregnee et cathode obtenue par ce procede
US5281635A (en) * 1991-05-17 1994-01-25 Johnson Matthey Public Limited Company Precious metal composition
GB2290308A (en) * 1994-06-14 1995-12-20 British Ceramic Res Ltd Decorative material
JP3520403B2 (ja) 1998-01-23 2004-04-19 セイコーエプソン株式会社 圧電体薄膜素子、アクチュエータ、インクジェット式記録ヘッド、及びインクジェット式記録装置
US20050070126A1 (en) * 2003-04-21 2005-03-31 Yoshihide Senzaki System and method for forming multi-component dielectric films
TW200506093A (en) * 2003-04-21 2005-02-16 Aviza Tech Inc System and method for forming multi-component films
EP1489200A1 (en) * 2003-06-19 2004-12-22 Akzo Nobel N.V. Electrode
US20060255692A1 (en) * 2005-03-22 2006-11-16 Motohiro Yasui Piezoelectric Actuator, Ink-Jet Head, Method Of Producing Piezoelectric Actuator, And Method Of Producing Ink-Jet Head
JP4961825B2 (ja) * 2006-05-09 2012-06-27 アタカ大機株式会社 電気化学反応用陽極
DE102010043085A1 (de) 2010-10-28 2012-05-03 Bayer Materialscience Aktiengesellschaft Elektrode für die elektrolytische Chlorherstellung
JP6221067B2 (ja) * 2013-12-03 2017-11-01 パナソニックIpマネジメント株式会社 ギ酸生成装置および方法

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US3081200A (en) * 1959-04-10 1963-03-12 Armour Res Found Method of applying an oxide coating onto a non-porous refractory substrate
CH415228A (de) * 1960-08-26 1966-06-15 Degussa Verfahren zur Abscheidung von Überzügen von Metallen der Platingruppe
GB1025897A (en) * 1962-02-09 1966-04-14 Ethyl Corp Process of metal plating
GB1109890A (en) * 1965-12-21 1968-04-18 Int Nickel Ltd Preparation of finely divided metals
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GB1249623A (en) * 1967-05-24 1971-10-13 Secr Defence Improvements in or relating to metal coatings
CA936676A (en) * 1968-07-02 1973-11-13 Courty Philippe Preparation of homogeneous oxides of mixed metallic elements
US3562008A (en) * 1968-10-14 1971-02-09 Ppg Industries Inc Method for producing a ruthenium coated titanium electrode
DE1915951A1 (de) * 1969-03-28 1970-10-08 Basf Ag Verfahren zur Herstellung von Elektroden
US3625755A (en) * 1969-04-14 1971-12-07 Du Pont Supported metal salt/phosphine complexes and metallized products therefrom
US3573970A (en) * 1969-04-16 1971-04-06 Engelhard Min & Chem Method for depositing os films
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BE789853A (fr) * 1971-10-07 1973-04-09 Hoechst Ag Electrode d'electrochimie a dimensions stables et resistant auxcorrosions
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JPS5298685A (en) * 1976-02-16 1977-08-18 Tdk Corp Manufacture of metallic electrode
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Also Published As

Publication number Publication date
SE8500419D0 (sv) 1985-01-30
CA1233370A (en) 1988-03-01
AU3821985A (en) 1985-08-08
GB2154248B (en) 1988-02-03
DE3502876A1 (de) 1985-08-08
DE3502876C2 (ko) 1988-11-10
MY101996A (en) 1992-02-29
JPS60159185A (ja) 1985-08-20
IT8547611A0 (it) 1985-01-29
FR2558851B1 (fr) 1990-07-27
US4668531A (en) 1987-05-26
GB2154248A (en) 1985-09-04
IT1182155B (it) 1987-09-30
NL8500156A (nl) 1985-08-16
JPS6342715B2 (ko) 1988-08-25
NL188953B (nl) 1992-06-16
NL188953C (nl) 1992-11-16
IT8547611A1 (it) 1986-12-27
GB8501713D0 (en) 1985-02-27
KR890003165B1 (ko) 1989-08-25
SE8500419L (sv) 1985-08-01
AU567789B2 (en) 1987-12-03
FR2558851A1 (fr) 1985-08-02

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