JPS5514883A - Preventing method for oxidation evaporation of platinum group metal material - Google Patents

Preventing method for oxidation evaporation of platinum group metal material

Info

Publication number
JPS5514883A
JPS5514883A JP8876778A JP8876778A JPS5514883A JP S5514883 A JPS5514883 A JP S5514883A JP 8876778 A JP8876778 A JP 8876778A JP 8876778 A JP8876778 A JP 8876778A JP S5514883 A JPS5514883 A JP S5514883A
Authority
JP
Japan
Prior art keywords
metal material
platinum group
group metal
thin film
oxidation evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8876778A
Other languages
Japanese (ja)
Inventor
Jun Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP8876778A priority Critical patent/JPS5514883A/en
Publication of JPS5514883A publication Critical patent/JPS5514883A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To form the thin film of silicon oxide on the surface and to prevent the oxidation evaporation of platinum group metal material under high temperature oxygen atmosphere, by applying and heating organic silicon compound on the surface of the above metal material.
CONSTITUTION: silicic acid ester of organic silicon compound is applied on the surface of platinum group metal material as high temperature heat resisting material and the above metal material is heated at more than 200°C under oxygen contained atmosphere. Hereby, closely adhered silicon oxide thin film is formed at about 5W100μ of thickness on the material surface. After the thin film is formed, each minute crystal of silicon dioxide is sintered well and dense thin film is made by treating with heat at 1300W1600°C for several minutes moreover and preventing effect of oxidation evaporation of platinum group metal material is heightened. The above film is able to easily remove by fluroic acid at the time of recasting etc.
COPYRIGHT: (C)1980,JPO&Japio
JP8876778A 1978-07-19 1978-07-19 Preventing method for oxidation evaporation of platinum group metal material Pending JPS5514883A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8876778A JPS5514883A (en) 1978-07-19 1978-07-19 Preventing method for oxidation evaporation of platinum group metal material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8876778A JPS5514883A (en) 1978-07-19 1978-07-19 Preventing method for oxidation evaporation of platinum group metal material

Publications (1)

Publication Number Publication Date
JPS5514883A true JPS5514883A (en) 1980-02-01

Family

ID=13952001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8876778A Pending JPS5514883A (en) 1978-07-19 1978-07-19 Preventing method for oxidation evaporation of platinum group metal material

Country Status (1)

Country Link
JP (1) JPS5514883A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002167674A (en) * 2000-11-29 2002-06-11 Furuya Kinzoku:Kk Metallic material for glass melting treatment and its production method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002167674A (en) * 2000-11-29 2002-06-11 Furuya Kinzoku:Kk Metallic material for glass melting treatment and its production method

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