GB1025897A - Process of metal plating - Google Patents

Process of metal plating

Info

Publication number
GB1025897A
GB1025897A GB378363A GB378363A GB1025897A GB 1025897 A GB1025897 A GB 1025897A GB 378363 A GB378363 A GB 378363A GB 378363 A GB378363 A GB 378363A GB 1025897 A GB1025897 A GB 1025897A
Authority
GB
United Kingdom
Prior art keywords
plating
substrate
compounds
metal
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB378363A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ethyl Corp
Original Assignee
Ethyl Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ethyl Corp filed Critical Ethyl Corp
Publication of GB1025897A publication Critical patent/GB1025897A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Abstract

In a thermal decomposition process of metal coating a substrate, the substrate is heated to above the decomposition temperature of a carbon containing metal plating compound which is dissolved in an organic solvent and contacted with the substrate. The substrate may be contacted with the solution either before or preferably after being heated and it may also be reheated after contact which is preferably effected by dipping or spraying. The temperature of the solution is controlled and the process may be carried out under vacuum or an inert atomosphere of N2, H2, CO or CH4. The metals of the plating compounds are those in Groups NB to VA of Deming's Periodic Chart namely: Ti, Zr, Hf, V, Nb, Ta, Cx, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, Al, Ga, In, Tl, Ge, Sn, Pb, Sb, Bi. The carbon containing compounds are preferably those containing up to 40 carbon atoms such as alkyl amine complexes of aluminium hydride, organometallics, inorganic metal carbonyls, nitrosyl substituted metal carbonyls and organic metal chelates: A large selection of these compounds is included in the specification. The organic solvents are those next to the plating compounds and preferably those with up to 25 carbon atoms e.g. alkanes, aromatics, cycloalkanes, fused ring aromatics, ethers, fluorocarbons, silicone oils, alcohols and ketones. A large selection of typical solvents is given. The preferred weight ratio of plating compound to solvent is from 1 : 10 to 7 : 10. The preferred substrates to be plated are aluminium, steel, magnesium, cobalt-nickel base alloys, spun glass, "Pyrex" (Registered Trade Mark) ceramics, refractories and graphite. The preferred temperature range for the plating process is 100 DEG -500 DEG C. and in one embodiment gases may be bubbled through the plating compound to introduce Alloying or hardening constituents into the plating. Furthermore the solvent may be so chosen that it breaks down and supplies carbon for forming metal carbides in the plating. A large number of different examples are included in the Specification.
GB378363A 1962-02-09 1963-01-30 Process of metal plating Expired GB1025897A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17211362A 1962-02-09 1962-02-09

Publications (1)

Publication Number Publication Date
GB1025897A true GB1025897A (en) 1966-04-14

Family

ID=22626417

Family Applications (1)

Application Number Title Priority Date Filing Date
GB378363A Expired GB1025897A (en) 1962-02-09 1963-01-30 Process of metal plating

Country Status (1)

Country Link
GB (1) GB1025897A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154248A (en) * 1984-01-31 1985-09-04 Permelec Electrode Ltd Improvements in the manufacture of electrodes
DE19738880A1 (en) * 1997-09-05 1999-03-11 Alsthom Cge Alcatel Method and apparatus for coating a substrate with a metal
US7387815B2 (en) 2003-09-19 2008-06-17 Akzo Nobel N.V. Metallization of substrate(s) by a liquid/vapor deposition process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154248A (en) * 1984-01-31 1985-09-04 Permelec Electrode Ltd Improvements in the manufacture of electrodes
DE19738880A1 (en) * 1997-09-05 1999-03-11 Alsthom Cge Alcatel Method and apparatus for coating a substrate with a metal
US7387815B2 (en) 2003-09-19 2008-06-17 Akzo Nobel N.V. Metallization of substrate(s) by a liquid/vapor deposition process

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