SE8500419L - Forfarande for framstellning av elektrod - Google Patents

Forfarande for framstellning av elektrod

Info

Publication number
SE8500419L
SE8500419L SE8500419A SE8500419A SE8500419L SE 8500419 L SE8500419 L SE 8500419L SE 8500419 A SE8500419 A SE 8500419A SE 8500419 A SE8500419 A SE 8500419A SE 8500419 L SE8500419 L SE 8500419L
Authority
SE
Sweden
Prior art keywords
electrode
component metal
procedure
manufacturing electrodes
composition containing
Prior art date
Application number
SE8500419A
Other languages
English (en)
Swedish (sv)
Other versions
SE8500419D0 (sv
Inventor
H Asano
T Shimamune
Y Matsumoto
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Publication of SE8500419D0 publication Critical patent/SE8500419D0/xx
Publication of SE8500419L publication Critical patent/SE8500419L/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/86Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88Processes of manufacture
    • H01M4/8825Methods for deposition of the catalytic active composition
    • H01M4/8828Coating with slurry or ink
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/86Inert electrodes with catalytic activity, e.g. for fuel cells
    • H01M4/88Processes of manufacture
    • H01M4/8878Treatment steps after deposition of the catalytic active composition or after shaping of the electrode being free-standing body
    • H01M4/8882Heat treatment, e.g. drying, baking
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemically Coating (AREA)
  • Inert Electrodes (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
SE8500419A 1984-01-31 1985-01-30 Forfarande for framstellning av elektrod SE8500419L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59014412A JPS60159185A (ja) 1984-01-31 1984-01-31 電極の製造方法

Publications (2)

Publication Number Publication Date
SE8500419D0 SE8500419D0 (sv) 1985-01-30
SE8500419L true SE8500419L (sv) 1985-08-01

Family

ID=11860321

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8500419A SE8500419L (sv) 1984-01-31 1985-01-30 Forfarande for framstellning av elektrod

Country Status (12)

Country Link
US (1) US4668531A (ko)
JP (1) JPS60159185A (ko)
KR (1) KR890003165B1 (ko)
AU (1) AU567789B2 (ko)
CA (1) CA1233370A (ko)
DE (1) DE3502876A1 (ko)
FR (1) FR2558851B1 (ko)
GB (1) GB2154248B (ko)
IT (1) IT1182155B (ko)
MY (1) MY101996A (ko)
NL (1) NL188953C (ko)
SE (1) SE8500419L (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4906493A (en) * 1985-04-26 1990-03-06 Sri International Method of preparing coatings of metal carbides and the like
FR2625364B1 (fr) * 1987-12-23 1990-05-04 Thomson Csf Procede de fabrication d'une cathode impregnee et cathode obtenue par ce procede
US5281635A (en) * 1991-05-17 1994-01-25 Johnson Matthey Public Limited Company Precious metal composition
GB2290308A (en) * 1994-06-14 1995-12-20 British Ceramic Res Ltd Decorative material
JP3520403B2 (ja) 1998-01-23 2004-04-19 セイコーエプソン株式会社 圧電体薄膜素子、アクチュエータ、インクジェット式記録ヘッド、及びインクジェット式記録装置
US20050070126A1 (en) * 2003-04-21 2005-03-31 Yoshihide Senzaki System and method for forming multi-component dielectric films
TW200506093A (en) * 2003-04-21 2005-02-16 Aviza Tech Inc System and method for forming multi-component films
EP1489200A1 (en) * 2003-06-19 2004-12-22 Akzo Nobel N.V. Electrode
US20060255692A1 (en) * 2005-03-22 2006-11-16 Motohiro Yasui Piezoelectric Actuator, Ink-Jet Head, Method Of Producing Piezoelectric Actuator, And Method Of Producing Ink-Jet Head
JP4961825B2 (ja) * 2006-05-09 2012-06-27 アタカ大機株式会社 電気化学反応用陽極
DE102010043085A1 (de) 2010-10-28 2012-05-03 Bayer Materialscience Aktiengesellschaft Elektrode für die elektrolytische Chlorherstellung
JP6221067B2 (ja) * 2013-12-03 2017-11-01 パナソニックIpマネジメント株式会社 ギ酸生成装置および方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3081200A (en) * 1959-04-10 1963-03-12 Armour Res Found Method of applying an oxide coating onto a non-porous refractory substrate
CH415228A (de) * 1960-08-26 1966-06-15 Degussa Verfahren zur Abscheidung von Überzügen von Metallen der Platingruppe
GB1025897A (en) * 1962-02-09 1966-04-14 Ethyl Corp Process of metal plating
GB1109890A (en) * 1965-12-21 1968-04-18 Int Nickel Ltd Preparation of finely divided metals
GB1249623A (en) * 1967-05-24 1971-10-13 Secr Defence Improvements in or relating to metal coatings
GB1249624A (en) * 1967-05-24 1971-10-13 Secr Defence Improvements in or relating to metal coatings
CA936676A (en) * 1968-07-02 1973-11-13 Courty Philippe Preparation of homogeneous oxides of mixed metallic elements
US3562008A (en) * 1968-10-14 1971-02-09 Ppg Industries Inc Method for producing a ruthenium coated titanium electrode
DE1915951A1 (de) * 1969-03-28 1970-10-08 Basf Ag Verfahren zur Herstellung von Elektroden
US3625755A (en) * 1969-04-14 1971-12-07 Du Pont Supported metal salt/phosphine complexes and metallized products therefrom
US3573970A (en) * 1969-04-16 1971-04-06 Engelhard Min & Chem Method for depositing os films
US3663414A (en) * 1969-06-27 1972-05-16 Ppg Industries Inc Electrode coating
US3711385A (en) * 1970-09-25 1973-01-16 Chemnor Corp Electrode having platinum metal oxide coating thereon,and method of use thereof
US3850665A (en) * 1971-07-08 1974-11-26 Glaverbel Process for forming a metal oxide coating on a substrate and resulting products
GB1402414A (en) * 1971-09-16 1975-08-06 Ici Ltd Electrodes for electrochemical processes
BE789853A (fr) * 1971-10-07 1973-04-09 Hoechst Ag Electrode d'electrochimie a dimensions stables et resistant auxcorrosions
JPS4911782A (ko) * 1972-05-16 1974-02-01
JPS4945222A (ko) * 1972-09-05 1974-04-30
JPS5298685A (en) * 1976-02-16 1977-08-18 Tdk Corp Manufacture of metallic electrode
SU729284A1 (ru) * 1976-06-28 1980-04-25 Норильский Ордена Ленина Горнометаллургический Комбинат Им. А.П. Завенягина Способ изготовлени электрода
JPS54125197A (en) * 1978-03-24 1979-09-28 Berumeretsuku Denkiyoku Kk Electrolytic electrode and its manufacture
US4181586A (en) * 1978-06-19 1980-01-01 Ppg Industries, Inc. Cathode electrocatalyst
JPS556715A (en) * 1978-06-28 1980-01-18 Nippon Sheet Glass Co Ltd Method of heating by induction
US4214971A (en) * 1978-08-14 1980-07-29 The Dow Chemical Company Electrode coating process
CA1134903A (en) * 1979-02-12 1982-11-02 Mary R. Suchanski Electrode having mixed metal oxide catalysts
DE3004080C2 (de) * 1980-02-05 1986-03-20 Sigri GmbH, 8901 Meitingen Verfahren zum Beschichten einer porösen Elektrode
DD207814A3 (de) * 1982-06-02 1984-03-14 Univ Berlin Humboldt Verfahren zur herstellung dimensionsstabiler anoden

Also Published As

Publication number Publication date
AU567789B2 (en) 1987-12-03
IT8547611A1 (it) 1986-12-27
JPS60159185A (ja) 1985-08-20
FR2558851B1 (fr) 1990-07-27
MY101996A (en) 1992-02-29
CA1233370A (en) 1988-03-01
DE3502876C2 (ko) 1988-11-10
JPS6342715B2 (ko) 1988-08-25
KR890003165B1 (ko) 1989-08-25
NL188953B (nl) 1992-06-16
FR2558851A1 (fr) 1985-08-02
AU3821985A (en) 1985-08-08
SE8500419D0 (sv) 1985-01-30
NL188953C (nl) 1992-11-16
GB2154248A (en) 1985-09-04
US4668531A (en) 1987-05-26
IT8547611A0 (it) 1985-01-29
GB8501713D0 (en) 1985-02-27
KR850005512A (ko) 1985-08-26
NL8500156A (nl) 1985-08-16
IT1182155B (it) 1987-09-30
GB2154248B (en) 1988-02-03
DE3502876A1 (de) 1985-08-08

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