KR850004660A - 감-방사선 조성물 - Google Patents
감-방사선 조성물 Download PDFInfo
- Publication number
- KR850004660A KR850004660A KR1019840008116A KR840008116A KR850004660A KR 850004660 A KR850004660 A KR 850004660A KR 1019840008116 A KR1019840008116 A KR 1019840008116A KR 840008116 A KR840008116 A KR 840008116A KR 850004660 A KR850004660 A KR 850004660A
- Authority
- KR
- South Korea
- Prior art keywords
- onium salt
- composition
- group
- phenolic resin
- radiation
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims 5
- 150000003839 salts Chemical class 0.000 claims 10
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 7
- 229920001568 phenolic resin Polymers 0.000 claims 7
- 239000005011 phenolic resin Substances 0.000 claims 7
- 230000003595 spectral effect Effects 0.000 claims 5
- 150000001412 amines Chemical class 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 239000003504 photosensitizing agent Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- -1 polycyclic hydrocarbon Chemical class 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 claims 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 1
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims 1
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 claims 1
- JNRLEMMIVRBKJE-UHFFFAOYSA-N 4,4'-Methylenebis(N,N-dimethylaniline) Chemical compound C1=CC(N(C)C)=CC=C1CC1=CC=C(N(C)C)C=C1 JNRLEMMIVRBKJE-UHFFFAOYSA-N 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 claims 1
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 239000004593 Epoxy Substances 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- 125000000174 L-prolyl group Chemical group [H]N1C([H])([H])C([H])([H])C([H])([H])[C@@]1([H])C(*)=O 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- VUEDNLCYHKSELL-UHFFFAOYSA-N arsonium Chemical class [AsH4+] VUEDNLCYHKSELL-UHFFFAOYSA-N 0.000 claims 1
- IWNNBBVLEFUBNE-UHFFFAOYSA-N bromonium Chemical compound [BrH2+] IWNNBBVLEFUBNE-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- IGJWHVUMEJASKV-UHFFFAOYSA-N chloronium Chemical compound [ClH2+] IGJWHVUMEJASKV-UHFFFAOYSA-N 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229960000956 coumarin Drugs 0.000 claims 1
- 235000001671 coumarin Nutrition 0.000 claims 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 claims 1
- 239000000975 dye Substances 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- FYAQQULBLMNGAH-UHFFFAOYSA-N hexane-1-sulfonic acid Chemical compound CCCCCCS(O)(=O)=O FYAQQULBLMNGAH-UHFFFAOYSA-N 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 claims 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims 1
- 229920003986 novolac Polymers 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 claims 1
- 229920000412 polyarylene Polymers 0.000 claims 1
- 229920006267 polyester film Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 229910052711 selenium Inorganic materials 0.000 claims 1
- 239000011669 selenium Substances 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000011734 sodium Substances 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims 1
- 125000005537 sulfoxonium group Chemical group 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 229910052714 tellurium Inorganic materials 0.000 claims 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical group CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 조성물에 있어서 비노출 영역과 노출 영역간의 용해도 차이를 나타낸 그라프.
Claims (17)
- 알칼리-용해성 페놀계수지 및 방-사선 오늄염으로 이루어져 있으며, 광 용해성임을 특징으로 한 -감방사선 조성.
- 제1항에 있어서, 오늄염이 요오드늄, 술포늄, 포스포늄, 브로모늄, 클로로늄, 옥시술폭소늄, 옥시술포늄, 술폭소늄, 셀레노늄, 텔루로늄 밑 아르소늄염 중에서 선택된 조성물.
- 제1항 또는 2항에 있어서, 페놀계 수지가 노볼락수지이며 오늄염이 페놀계 수지와 오늄염 총 중량의 1내지 40중량%인 조성물.
- 제1항 또는 2항에 있어서, 페놀계 수지가 레롤 수지이며 오늄염이 페놀계 수지와 오늄염 총 중량의 5내지 40중량%인 조성물.
- 제1항 내지 4항중의 어느 하나에 있어서, 오늄염이 다음 일반식(I)-(V) 및 중합체(VI)로 표시되는 것중의 하나인 조성물.위의 식에서, R1,R2및 R3는 임의로 치환된 방향록 그룹이며, (단, 일반식 (Ⅲ), (IV) 및 (V)에서 이들 각각은 임의로 치환된 지방록 그룹일 수 있다.) : Q는 탄소-결합이거나 O,S, 〉S=O, 〉C=O, O또는N-R6중에서 선택된 연결 그룹이며, R4및 R5는, 독립적으로, H,C1-C4알킬그룹, 및 C2-C4알케닐 그룹중에서 선택되며; R6는 C6-C20아릴그룹이거나 C2-C20아실그룹이며; |는 음이온 이며 : Ar1및 Ar2는, 독립적으로, 임의로 치환된 방향록 그룹을 나타내고 또한 서로 임의로 연결되어 고리구조 내에 요오드 원자를 포함시키는 방향록 그룹을 나타낸다.
- 제5항에 있어서, 음이온의 할라이드,(여기서 R8은 임의로 치환된 알킬 또는 페닐그룹임), 및 할로겐-함유 착물이온 중에서 선택된 조성물.
- 제1항 내지 6항중의 어느 하나에 있어서, 페놀계 수지, 오늄염 및 스펙트럼 감광제 총 중량의 최고 10중량%에 달하는 스펙트럼 감광제로 추가로 이루어진 조성물.
- 제7항에 있어서, 스펙트럼 감광제가 디페닐메탄, 크사텐, 아크리딘, 메틴 및 폴리메틴(옥소놀, 시아닌 및 메로시아닌을 포함) 염료, 티아롤, 티아진, 아진, 아미노케톤, 프로피린, 착색된 방향록 다환 탄화수소, 파라-치환된 아미노스티릴 화합물 아미노트리아질 메탄, 폴리아릴렌, 폴리아릴폴리엔, 2,5-디페닐이소벤조푸란, 2,5-디아릴사이클로펜타디엔, 다아릴푸란, 디아릴티오푸란, 디아릴피롤, 폴리아릴페닐렌, 코우마린 및 폴리아릴-2-피라졸린 중에서 선택된 조성물.
- 제7항 또는 8항에 있어서, 스펙트럼 감광제가 다음 일반식 (Ⅶ) 또는 (Ⅷ)로 표시되는 조성물.위의 식에서, R7은 C1-C6알킬그룹을 나타내며 : Y는 4-퍼플루오로에틸사이클로 헥실술포네이트 또는를 나타내고, P는 1 또는 2의 수이다.
- 제1항 또는 9항중의 어느 하나에 있어서, 페놀계수지, 오늄염 및 아민 총 중량의 최고 25중량 %에 달하는 아민으로 추가로 이루어진 조성물.
- 제10항에 있어서, 아민/오늄염의 몰비가 대략 1 : 1인 조성물.
- 제10항 또는 11항에 있어서, 아민이 트리 -n-부틸아민 또는 비스 (4-디메틸아미노페닐) 메탄인 조성물
- 기판상에 피복된 제1항 내지 12항중의 어느 하나의 조성물 층으로 이루어진 감-방사선 엘레엔트.
- 제13항에 있어서, 기판이 종이, 알루미늄, 구리, 구리-에폭시 적층판, 폴리에스테르 필름 또는 실리카인 엘레엔트.
- 제13항 또는 14항에 따른 엘레엔트를 화학 방사선에 영상방향 노출 시키고, 인쇄판을 알칼리계 현상액으로 현상시켜 조성물을 조사영역에서 제거해 상기 영상을 형성시키는 석판 영상의 형성 방법.
- 제13항 또는 14항에 따른 엘레엔트를 화학 방사선에 영상방향 노출시키고; 엘레엔트를 가열해 조사 영역내의 피복물을 알칼리에 불용성인 형태로 전환시키고; 추가로 모든 엘레엔트를 화학방사선에 노출시켜 사전에 노출되지 않은 영역을 알칼리-용해성으로 만들고; 엘레엔트를 알칼리계 현상액으로 현상시켜 알칼리 용해성인 엘레엔트의 영역에서 피복물을 제거해 영상을 형성시키는 석판 영상의 형성방법.
- 제15항 또는 16항에 있어서, 현상액이 수성 나트륨 메타실리게이트인 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB838333901A GB8333901D0 (en) | 1983-12-20 | 1983-12-20 | Radiationsensitive compositions |
| GB8333901 | 1983-12-20 | ||
| GB33901 | 1983-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR850004660A true KR850004660A (ko) | 1985-07-25 |
| KR910008778B1 KR910008778B1 (ko) | 1991-10-21 |
Family
ID=10553566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019840008116A KR910008778B1 (ko) | 1983-12-20 | 1984-12-19 | 감방사선 조성물 |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP0146411B1 (ko) |
| JP (1) | JP2577718B2 (ko) |
| KR (1) | KR910008778B1 (ko) |
| AR (1) | AR244895A1 (ko) |
| AU (1) | AU583485B2 (ko) |
| BR (1) | BR8406563A (ko) |
| CA (1) | CA1262793A (ko) |
| DE (1) | DE3484868D1 (ko) |
| ES (1) | ES8705302A1 (ko) |
| GB (1) | GB8333901D0 (ko) |
| ZA (1) | ZA849517B (ko) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3541534A1 (de) * | 1985-11-25 | 1987-05-27 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
| JPS62160441A (ja) * | 1986-01-09 | 1987-07-16 | Hitachi Chem Co Ltd | ホトレジスト用感光性組成物 |
| US5362607A (en) * | 1986-06-13 | 1994-11-08 | Microsi, Inc. | Method for making a patterned resist substrate composite |
| US5310619A (en) * | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
| EP0249139B2 (en) * | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Resist compositions and use |
| MY103006A (en) * | 1987-03-30 | 1993-03-31 | Microsi Inc | Photoresist compositions |
| DE3721741A1 (de) * | 1987-07-01 | 1989-01-12 | Basf Ag | Strahlungsempfindliches gemisch fuer lichtempfindliche beschichtungsmaterialien |
| US4873176A (en) * | 1987-08-28 | 1989-10-10 | Shipley Company Inc. | Reticulation resistant photoresist coating |
| DE3817010A1 (de) * | 1988-05-19 | 1989-11-30 | Basf Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern |
| DE3817012A1 (de) * | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
| DE3817009A1 (de) * | 1988-05-19 | 1989-11-30 | Basf Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern |
| JPH02101462A (ja) * | 1988-10-11 | 1990-04-13 | Matsushita Electric Ind Co Ltd | パターン形成材料 |
| DE3914407A1 (de) * | 1989-04-29 | 1990-10-31 | Basf Ag | Strahlungsempfindliche polymere und positiv arbeitendes aufzeichnungsmaterial |
| GB8923459D0 (en) * | 1989-10-18 | 1989-12-06 | Minnesota Mining & Mfg | Positive-acting photoresist compositions |
| GB9105750D0 (en) * | 1991-03-19 | 1991-05-01 | Minnesota Mining & Mfg | Speed stabilised positive-acting photoresist compositions |
| JP3010607B2 (ja) * | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
| DE4222968A1 (de) * | 1992-07-13 | 1994-01-20 | Hoechst Ag | Positiv-arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial |
| US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| EP0672954B1 (en) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
| US5814431A (en) * | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
| JP3645362B2 (ja) * | 1996-07-22 | 2005-05-11 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| JP3814961B2 (ja) † | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| US6432610B1 (en) * | 1998-09-08 | 2002-08-13 | Regents Of The University Of California | Dye precursor molecules chemically reactive with the light-altered form of light-sensitive molecules to form stable fluorescent dye, particularly for optical memories including two-photon three-dimensional optical memories |
| JP3024128B2 (ja) * | 1998-11-27 | 2000-03-21 | ジェイエスアール株式会社 | ポジ型感放射線性樹脂組成物 |
| JP3996305B2 (ja) | 1999-02-15 | 2007-10-24 | 富士フイルム株式会社 | ポジ型平版印刷用材料 |
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US6368400B1 (en) | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| JP3909818B2 (ja) * | 2001-11-12 | 2007-04-25 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| EP1472574A4 (en) | 2001-11-15 | 2005-06-08 | Honeywell Int Inc | ANTI-REFLECTIVE COATINGS DESIGNED TO BE INSTALLED BY ROTATION FOR PHOTOLITHOGRAPHY |
| JP4163964B2 (ja) | 2003-01-07 | 2008-10-08 | 岡本化学工業株式会社 | 画像形成組成物およびそれを用いた感光性平版印刷版 |
| JP2005099348A (ja) | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US7544461B2 (en) | 2004-07-22 | 2009-06-09 | Kansai Paint Co., Ltd. | Near infrared ray activation type positive resin composition |
| US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| JP5763433B2 (ja) * | 2010-06-29 | 2015-08-12 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| KR101413074B1 (ko) * | 2011-12-26 | 2014-06-30 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| TWI683816B (zh) * | 2017-11-30 | 2020-02-01 | 美商羅門哈斯電子材料有限公司 | 鹽及包含其之光阻 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
| US3793033A (en) * | 1972-09-05 | 1974-02-19 | Minnesota Mining & Mfg | Development-free printing plate |
| US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
| DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
| JPS56501064A (ko) * | 1979-08-17 | 1981-07-30 | ||
| DE3107109A1 (de) * | 1981-02-26 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
| US4500629A (en) * | 1982-04-08 | 1985-02-19 | Ciba-Geigy Corporation | Method of forming images from liquid masses |
| JPS6071657A (ja) * | 1983-09-27 | 1985-04-23 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
-
1983
- 1983-12-20 GB GB838333901A patent/GB8333901D0/en active Pending
-
1984
- 1984-12-05 ZA ZA849517A patent/ZA849517B/xx unknown
- 1984-12-11 AU AU36481/84A patent/AU583485B2/en not_active Ceased
- 1984-12-12 ES ES538520A patent/ES8705302A1/es not_active Expired
- 1984-12-17 CA CA000470287A patent/CA1262793A/en not_active Expired
- 1984-12-19 DE DE8484308904T patent/DE3484868D1/de not_active Expired - Fee Related
- 1984-12-19 BR BR8406563A patent/BR8406563A/pt not_active IP Right Cessation
- 1984-12-19 KR KR1019840008116A patent/KR910008778B1/ko not_active IP Right Cessation
- 1984-12-19 EP EP84308904A patent/EP0146411B1/en not_active Expired - Lifetime
- 1984-12-19 AR AR84299027A patent/AR244895A1/es active
- 1984-12-19 JP JP59268201A patent/JP2577718B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE3484868D1 (de) | 1991-09-05 |
| GB8333901D0 (en) | 1984-02-01 |
| JP2577718B2 (ja) | 1997-02-05 |
| CA1262793A (en) | 1989-11-07 |
| AR244895A1 (es) | 1993-11-30 |
| KR910008778B1 (ko) | 1991-10-21 |
| ES8705302A1 (es) | 1987-05-01 |
| ES538520A0 (es) | 1987-05-01 |
| BR8406563A (pt) | 1985-10-15 |
| JPS60175046A (ja) | 1985-09-09 |
| EP0146411A3 (en) | 1987-02-04 |
| AU583485B2 (en) | 1989-05-04 |
| EP0146411B1 (en) | 1991-07-31 |
| AU3648184A (en) | 1985-06-27 |
| EP0146411A2 (en) | 1985-06-26 |
| ZA849517B (en) | 1986-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR850004660A (ko) | 감-방사선 조성물 | |
| US3671251A (en) | Sensitized pyrylium photobleachable dye in gelatin | |
| US5554465A (en) | Process for forming a pattern using a resist composition having a siloxane-bond structure | |
| JP2525568B2 (ja) | 光可溶化組成物 | |
| US4708925A (en) | Photosolubilizable compositions containing novolac phenolic resin | |
| US3617288A (en) | Propenone sensitizers for the photolysis of organic halogen compounds | |
| CA1094379A (en) | Photosensitive composition | |
| US4619998A (en) | Light-sensitive triazines possessing trichloromethyl groups | |
| JP2571115B2 (ja) | 感光性組成物の増感方法及び増感された感光性組成物 | |
| EP0130599B1 (en) | Photosolubilizable composition | |
| EP0488525B1 (en) | Alkoxyalkyl ester solubility inhibitors for phenolic resins | |
| JPH0464063B2 (ko) | ||
| JPS6358440A (ja) | 感光性組成物 | |
| EP0672954A2 (en) | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a traizine and use thereof in lithographic printing plates | |
| JPH04365048A (ja) | 感光性組成物 | |
| JPH0481788B2 (ko) | ||
| EP0424124B1 (en) | Positive-acting photoresist compositions | |
| JP2599007B2 (ja) | ポジ型感光性組成物 | |
| US3778274A (en) | Spectrally sensitized diazo material | |
| JP2547627B2 (ja) | ポジ型感光性組成物 | |
| US4399210A (en) | Photosensitive compositions | |
| US3369902A (en) | Lithographic plates sensitized with oxacarbocyanine and benzimidazole carbocyanine dyes | |
| JPH11176750A (ja) | 水性塩基現像可能なフォトレジスト組成物およびそれを用いたパターン形成方法 | |
| EP0505094A1 (en) | Speed stabilised positive-acting photoresist compositions | |
| US5776652A (en) | Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| G160 | Decision to publish patent application | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 19961004 Year of fee payment: 6 |
|
| LAPS | Lapse due to unpaid annual fee |