ZA849517B - Radiation-sensitive compositions - Google Patents

Radiation-sensitive compositions

Info

Publication number
ZA849517B
ZA849517B ZA849517A ZA849517A ZA849517B ZA 849517 B ZA849517 B ZA 849517B ZA 849517 A ZA849517 A ZA 849517A ZA 849517 A ZA849517 A ZA 849517A ZA 849517 B ZA849517 B ZA 849517B
Authority
ZA
South Africa
Prior art keywords
radiation
sensitive compositions
sensitive
compositions
Prior art date
Application number
ZA849517A
Other languages
English (en)
Inventor
Stephen Newman
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10553566&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA849517(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of ZA849517B publication Critical patent/ZA849517B/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
ZA849517A 1983-12-20 1984-12-05 Radiation-sensitive compositions ZA849517B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB838333901A GB8333901D0 (en) 1983-12-20 1983-12-20 Radiationsensitive compositions

Publications (1)

Publication Number Publication Date
ZA849517B true ZA849517B (en) 1986-07-30

Family

ID=10553566

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA849517A ZA849517B (en) 1983-12-20 1984-12-05 Radiation-sensitive compositions

Country Status (11)

Country Link
EP (1) EP0146411B1 (ko)
JP (1) JP2577718B2 (ko)
KR (1) KR910008778B1 (ko)
AR (1) AR244895A1 (ko)
AU (1) AU583485B2 (ko)
BR (1) BR8406563A (ko)
CA (1) CA1262793A (ko)
DE (1) DE3484868D1 (ko)
ES (1) ES8705302A1 (ko)
GB (1) GB8333901D0 (ko)
ZA (1) ZA849517B (ko)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3541534A1 (de) * 1985-11-25 1987-05-27 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
JPS62160441A (ja) * 1986-01-09 1987-07-16 Hitachi Chem Co Ltd ホトレジスト用感光性組成物
US5362607A (en) * 1986-06-13 1994-11-08 Microsi, Inc. Method for making a patterned resist substrate composite
US5310619A (en) * 1986-06-13 1994-05-10 Microsi, Inc. Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
EP0249139B2 (en) * 1986-06-13 1998-03-11 MicroSi, Inc. (a Delaware corporation) Resist compositions and use
MY103006A (en) * 1987-03-30 1993-03-31 Microsi Inc Photoresist compositions
DE3721741A1 (de) * 1987-07-01 1989-01-12 Basf Ag Strahlungsempfindliches gemisch fuer lichtempfindliche beschichtungsmaterialien
US4873176A (en) * 1987-08-28 1989-10-10 Shipley Company Inc. Reticulation resistant photoresist coating
DE3817010A1 (de) * 1988-05-19 1989-11-30 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
DE3817009A1 (de) * 1988-05-19 1989-11-30 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefmustern
DE3817012A1 (de) * 1988-05-19 1989-11-30 Basf Ag Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern
JPH02101462A (ja) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd パターン形成材料
DE3914407A1 (de) * 1989-04-29 1990-10-31 Basf Ag Strahlungsempfindliche polymere und positiv arbeitendes aufzeichnungsmaterial
GB8923459D0 (en) * 1989-10-18 1989-12-06 Minnesota Mining & Mfg Positive-acting photoresist compositions
GB9105750D0 (en) * 1991-03-19 1991-05-01 Minnesota Mining & Mfg Speed stabilised positive-acting photoresist compositions
JP3010607B2 (ja) * 1992-02-25 2000-02-21 ジェイエスアール株式会社 感放射線性樹脂組成物
DE4222968A1 (de) * 1992-07-13 1994-01-20 Hoechst Ag Positiv-arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
US5372915A (en) * 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5814431A (en) * 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3645362B2 (ja) * 1996-07-22 2005-05-11 富士写真フイルム株式会社 ネガ型画像記録材料
JP3814961B2 (ja) 1996-08-06 2006-08-30 三菱化学株式会社 ポジ型感光性印刷版
US6432610B1 (en) * 1998-09-08 2002-08-13 Regents Of The University Of California Dye precursor molecules chemically reactive with the light-altered form of light-sensitive molecules to form stable fluorescent dye, particularly for optical memories including two-photon three-dimensional optical memories
JP3024128B2 (ja) * 1998-11-27 2000-03-21 ジェイエスアール株式会社 ポジ型感放射線性樹脂組成物
JP3996305B2 (ja) 1999-02-15 2007-10-24 富士フイルム株式会社 ポジ型平版印刷用材料
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6368400B1 (en) 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
JP3909818B2 (ja) * 2001-11-12 2007-04-25 富士フイルム株式会社 ポジ型レジスト組成物
KR20040075866A (ko) 2001-11-15 2004-08-30 허니웰 인터내셔날 인코포레이티드 포토리소그래피용 스핀-온 무반사 코팅
JP4163964B2 (ja) 2003-01-07 2008-10-08 岡本化学工業株式会社 画像形成組成物およびそれを用いた感光性平版印刷版
JP2005099348A (ja) 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 平版印刷版原版
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4825130B2 (ja) * 2004-07-22 2011-11-30 関西ペイント株式会社 近赤外線活性型ポジ型樹脂組成物
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5763433B2 (ja) * 2010-06-29 2015-08-12 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR101413074B1 (ko) * 2011-12-26 2014-06-30 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN109851539A (zh) * 2017-11-30 2019-06-07 罗门哈斯电子材料有限责任公司 盐和包含其的光致抗蚀剂

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
US3793033A (en) * 1972-09-05 1974-02-19 Minnesota Mining & Mfg Development-free printing plate
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
JPS56501064A (ko) * 1979-08-17 1981-07-30
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4500629A (en) * 1982-04-08 1985-02-19 Ciba-Geigy Corporation Method of forming images from liquid masses
JPS6071657A (ja) * 1983-09-27 1985-04-23 Agency Of Ind Science & Technol 感光性樹脂組成物

Also Published As

Publication number Publication date
JP2577718B2 (ja) 1997-02-05
AU583485B2 (en) 1989-05-04
KR910008778B1 (ko) 1991-10-21
GB8333901D0 (en) 1984-02-01
EP0146411A3 (en) 1987-02-04
ES8705302A1 (es) 1987-05-01
JPS60175046A (ja) 1985-09-09
EP0146411A2 (en) 1985-06-26
KR850004660A (ko) 1985-07-25
AU3648184A (en) 1985-06-27
EP0146411B1 (en) 1991-07-31
AR244895A1 (es) 1993-11-30
ES538520A0 (es) 1987-05-01
DE3484868D1 (de) 1991-09-05
BR8406563A (pt) 1985-10-15
CA1262793A (en) 1989-11-07

Similar Documents

Publication Publication Date Title
ZA849517B (en) Radiation-sensitive compositions
GB8406898D0 (en) Bis-maleimide-epoxy compositions
GB8407501D0 (en) Photopolymerizable compositions
GB8417625D0 (en) Compounds and compositions
GB8417624D0 (en) Compounds and compositions
GB8417626D0 (en) Compounds and compositions
ZA84734B (en) Compositions
DE3460573D1 (en) Aluminium-filled compositions
GB8334423D0 (en) Composition
GB8301374D0 (en) Siloxane-polyester compositions
GB8502534D0 (en) Compositions
GB8422629D0 (en) Vesicular compositions
DE3475969D1 (en) Light-sensitive composition
DE3262847D1 (en) Heat-polymerisable compositions
KR920009397B1 (en) Bitumenous compositions
DE3475838D1 (en) Radiation-sensitive polymer composition
GB8321178D0 (en) Compositions
DE3467821D1 (en) Photopolymerizable compositions
GB2148309B (en) Radiation-sensitive polymer composition
GB8334422D0 (en) Composition
GB8420001D0 (en) Compositions
DE3263502D1 (en) Flavour-release compositions
GB2105190B (en) Light-screen compositions
DE3471377D1 (en) Photosensitive compositions
GB2133783B (en) Oxidising compositions