KR850003476A - 광전 장치 및 그 제조방법 - Google Patents

광전 장치 및 그 제조방법 Download PDF

Info

Publication number
KR850003476A
KR850003476A KR1019830004960A KR830004960A KR850003476A KR 850003476 A KR850003476 A KR 850003476A KR 1019830004960 A KR1019830004960 A KR 1019830004960A KR 830004960 A KR830004960 A KR 830004960A KR 850003476 A KR850003476 A KR 850003476A
Authority
KR
South Korea
Prior art keywords
circuit current
current line
bias
short
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019830004960A
Other languages
English (en)
Korean (ko)
Inventor
마사쯔구 이주 (외1)
Original Assignee
원본미기재
에너지 컨버젼 디바이스 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/520,054 external-priority patent/US4464823A/en
Application filed by 원본미기재, 에너지 컨버젼 디바이스 인코포레이티드 filed Critical 원본미기재
Publication of KR850003476A publication Critical patent/KR850003476A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/10Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68Organic materials, e.g. photoresists
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/17Photovoltaic cells having only PIN junction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/10Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/107Continuous treatment of the devices, e.g. roll-to roll processes or multi-chamber deposition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
KR1019830004960A 1983-08-03 1983-10-20 광전 장치 및 그 제조방법 Withdrawn KR850003476A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/520,054 US4464823A (en) 1982-10-21 1983-08-03 Method for eliminating short and latent short circuit current paths in photovoltaic devices
US520054 1983-08-03

Publications (1)

Publication Number Publication Date
KR850003476A true KR850003476A (ko) 1985-06-17

Family

ID=24071012

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830004960A Withdrawn KR850003476A (ko) 1983-08-03 1983-10-20 광전 장치 및 그 제조방법

Country Status (8)

Country Link
EP (1) EP0134364A3 (https=)
JP (1) JPS6046080A (https=)
KR (1) KR850003476A (https=)
AU (1) AU2042183A (https=)
BR (1) BR8305792A (https=)
ES (1) ES8503889A1 (https=)
IN (1) IN160221B (https=)
MX (1) MX159519A (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU594359B2 (en) * 1985-08-24 1990-03-08 Semiconductor Energy Laboratory Co. Ltd. Semiconductor device free from the current leakage through a semiconductor layer and method for manufacturing same
US6228662B1 (en) 1999-03-24 2001-05-08 Kaneka Corporation Method for removing short-circuited sections of a solar cell
ATE240589T1 (de) * 1999-03-25 2003-05-15 Kaneka Corp Verfahren zum herstellen von dünnschicht- solarzellen-modulen
JP4627575B2 (ja) * 1999-08-12 2011-02-09 株式会社カネカ 太陽電池の短絡部除去方法
AU766466B2 (en) * 1999-05-14 2003-10-16 Kaneka Corporation Reverse biasing apparatus for solar battery module
JP2007189199A (ja) 2005-12-12 2007-07-26 Tdk Corp キャパシタおよびその製造方法
CN101809761B (zh) 2008-09-09 2011-12-28 三洋电机株式会社 太阳能电池组件的制造方法
WO2013072988A1 (ja) 2011-11-14 2013-05-23 株式会社日本マイクロニクス シート状電池のリペア装置
DE102018001057B4 (de) * 2018-02-07 2025-12-04 Ce Cell Engineering Gmbh Verfahren zur Verbesserung des ohmschen Kontaktverhaltens zwischen einem Kontaktgitter und einer Emitterschicht einer Siliziumsolarzelle
CN108233329B (zh) * 2018-03-16 2024-05-31 西安赛诺克新能源科技有限公司 一种提高主电路断开响应速度的保护电路
CN117353651B (zh) * 2023-10-16 2024-04-16 中科宏一教育科技集团有限公司 光伏系统控制方法、装置、设备和介质

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197141A (en) * 1978-01-31 1980-04-08 Massachusetts Institute Of Technology Method for passivating imperfections in semiconductor materials
US4166918A (en) * 1978-07-19 1979-09-04 Rca Corporation Method of removing the effects of electrical shorts and shunts created during the fabrication process of a solar cell
JPS5683981A (en) * 1979-12-13 1981-07-08 Matsushita Electric Ind Co Ltd Semiconductor device and manufacture
US4385971A (en) * 1981-06-26 1983-05-31 Rca Corporation Electrolytic etch for eliminating shorts and shunts in large area amorphous silicon solar cells

Also Published As

Publication number Publication date
ES526597A0 (es) 1985-03-01
EP0134364A3 (en) 1986-06-04
JPS6046080A (ja) 1985-03-12
ES8503889A1 (es) 1985-03-01
AU2042183A (en) 1985-02-07
BR8305792A (pt) 1985-05-21
IN160221B (https=) 1987-07-04
EP0134364A2 (en) 1985-03-20
JPH0572756B2 (https=) 1993-10-12
MX159519A (es) 1989-06-26

Similar Documents

Publication Publication Date Title
KR840006566A (ko) 전류선로 제거방법 및 시스템
KR850003476A (ko) 광전 장치 및 그 제조방법
ATE2984T1 (de) Solarzellen-anordnung.
US4885622A (en) Pin photodiode and method of fabrication of the same
ATE47919T1 (de) Optischer artikel mit leitender, reflexfreier beschichtung.
KR970004102A (ko) 집적화 박막 태양전지와 그 제조방법
GB1448048A (en) Etching semiconductor oxide layers
KR910008841A (ko) 과전압 보호 기능부 반도체 장치 및 이의 제조방법
KR850003062A (ko) 글로우 방전에 의한 반도체층 퇴적 방법
KR970018753A (ko) 수광소자
FR2443746A1 (fr) Dispositif photovoltaique, notamment pile solaire
JPS62269358A (ja) イメ−ジセンサ
KR910003842A (ko) 수광소자 및 그 동작방법
KR840006101A (ko) 수광소자
JPS56150888A (en) Semiconductor laser device
CN1185717C (zh) 光电二极管
JPS56148874A (en) Semiconductor photoelectric converter
US2948823A (en) Electroluminescent device
JPS5730246A (en) Image pick-up device
JPH0222874A (ja) 薄膜素子の製造方法
JPS57211073A (en) Detector of surface leakage current
KR960039446A (ko) 반도체 광전소자
JPS548989A (en) Control rectifying device
Drizhuk et al. CdS-GaN heterostructure photodetector with switching and memory
SU618758A1 (ru) Оптоэлектронное устройство дл определени интеграла типа свертки

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PC1203 Withdrawal of no request for examination

St.27 status event code: N-1-6-B10-B12-nap-PC1203

WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid
R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000