JPS56150888A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPS56150888A
JPS56150888A JP5451680A JP5451680A JPS56150888A JP S56150888 A JPS56150888 A JP S56150888A JP 5451680 A JP5451680 A JP 5451680A JP 5451680 A JP5451680 A JP 5451680A JP S56150888 A JPS56150888 A JP S56150888A
Authority
JP
Japan
Prior art keywords
substrate
electrode
induction
junction
clad layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5451680A
Other languages
Japanese (ja)
Other versions
JPS6211796B2 (en
Inventor
Masafumi Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5451680A priority Critical patent/JPS56150888A/en
Publication of JPS56150888A publication Critical patent/JPS56150888A/en
Publication of JPS6211796B2 publication Critical patent/JPS6211796B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To enable the detection of the output of a semiconductor laser device while induction radiating from a region of the device and to simply and sensitively detect the variation of the oscillation output of the device by forming a P-N junction for detecting the induction radiation output in the vicinity of the region for induction radiating. CONSTITUTION:A P-N junction semiconductor crystalline substrate 11 bonded in the removed state to form a strip-shaped recess groove at B part is formed at a P type semiconductor crystalline substrate 22 on an N type semiconductor crystalline substrate 21, the first clad layer 23, an active layer 24, the second clad layer 25 and an insulator thin film 26 are sequentially formed over the recess groove on a part of the substrate 11, and ohmic electrodes and hence the third electrode 28, the second electrode 29 and the first electrode 27 are sequentially formed respectively on the substrate 21, 22 and the second clad layer 25. When a suitable voltage is applied between the electrodes 27 and 28, an induction radiation (laser oscillation) occurs, and a laser spot 10 can be observed. When a voltage is so applied between the electrodes 29 and 28 as to apply a reverse bias to the junction 12 of the substrate 11, the laser light can be detected.
JP5451680A 1980-04-23 1980-04-23 Semiconductor laser device Granted JPS56150888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5451680A JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5451680A JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS56150888A true JPS56150888A (en) 1981-11-21
JPS6211796B2 JPS6211796B2 (en) 1987-03-14

Family

ID=12972806

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5451680A Granted JPS56150888A (en) 1980-04-23 1980-04-23 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS56150888A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5789289A (en) * 1980-11-25 1982-06-03 Sharp Corp Semiconductor device
JPS594192A (en) * 1982-06-30 1984-01-10 Sharp Corp Semiconductor laser device
JPS60198885A (en) * 1984-03-23 1985-10-08 Toshiba Corp Integrated semiconductor laser
JPS6218079A (en) * 1985-07-17 1987-01-27 Matsushita Electric Ind Co Ltd Optical integrated circuit device
EP0449636A2 (en) * 1990-03-28 1991-10-02 Xerox Corporation Laser apparatus with means for detecting the laser power level
US5252513A (en) * 1990-03-28 1993-10-12 Xerox Corporation Method for forming a laser and light detector on a semiconductor substrate
CN107132866A (en) * 2016-02-26 2017-09-05 捷温有限责任公司 Temperature equipment and the inspection functional method of sensor device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5789289A (en) * 1980-11-25 1982-06-03 Sharp Corp Semiconductor device
JPS6342870B2 (en) * 1980-11-25 1988-08-25 Sharp Kk
JPS594192A (en) * 1982-06-30 1984-01-10 Sharp Corp Semiconductor laser device
JPS60198885A (en) * 1984-03-23 1985-10-08 Toshiba Corp Integrated semiconductor laser
JPS6218079A (en) * 1985-07-17 1987-01-27 Matsushita Electric Ind Co Ltd Optical integrated circuit device
EP0449636A2 (en) * 1990-03-28 1991-10-02 Xerox Corporation Laser apparatus with means for detecting the laser power level
US5252513A (en) * 1990-03-28 1993-10-12 Xerox Corporation Method for forming a laser and light detector on a semiconductor substrate
CN107132866A (en) * 2016-02-26 2017-09-05 捷温有限责任公司 Temperature equipment and the inspection functional method of sensor device
CN107132866B (en) * 2016-02-26 2019-04-05 捷温有限责任公司 Temperature equipment and the inspection functional method of sensor device
US10605497B2 (en) 2016-02-26 2020-03-31 Gentherm Gmbh Device for regulating the temperature of at least one object and method for checking the functional capability of a sensor device having at least two sensors

Also Published As

Publication number Publication date
JPS6211796B2 (en) 1987-03-14

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