KR840001590B1 - 석판 인쇄 공정 - Google Patents

석판 인쇄 공정 Download PDF

Info

Publication number
KR840001590B1
KR840001590B1 KR1019810001989A KR810001989A KR840001590B1 KR 840001590 B1 KR840001590 B1 KR 840001590B1 KR 1019810001989 A KR1019810001989 A KR 1019810001989A KR 810001989 A KR810001989 A KR 810001989A KR 840001590 B1 KR840001590 B1 KR 840001590B1
Authority
KR
South Korea
Prior art keywords
metal
light
glass
pattern
exposure
Prior art date
Application number
KR1019810001989A
Other languages
English (en)
Korean (ko)
Other versions
KR830006021A (ko
Inventor
타이 킹린
Original Assignee
웨스턴 일렉트릭 캄파니, 인코포레이티드
오레그 이. 알버
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 웨스턴 일렉트릭 캄파니, 인코포레이티드, 오레그 이. 알버 filed Critical 웨스턴 일렉트릭 캄파니, 인코포레이티드
Publication of KR830006021A publication Critical patent/KR830006021A/ko
Application granted granted Critical
Publication of KR840001590B1 publication Critical patent/KR840001590B1/ko

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0044Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019810001989A 1980-06-03 1981-06-03 석판 인쇄 공정 KR840001590B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15602980A 1980-06-03 1980-06-03
US156029 1980-06-03

Publications (2)

Publication Number Publication Date
KR830006021A KR830006021A (ko) 1983-09-17
KR840001590B1 true KR840001590B1 (ko) 1984-10-11

Family

ID=22557781

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019810001989A KR840001590B1 (ko) 1980-06-03 1981-06-03 석판 인쇄 공정

Country Status (8)

Country Link
EP (1) EP0042109B1 (de)
JP (1) JPS5723225A (de)
KR (1) KR840001590B1 (de)
CA (1) CA1166879A (de)
DE (1) DE3172493D1 (de)
ES (1) ES8203549A1 (de)
GB (1) GB2078386B (de)
IE (1) IE51206B1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155722A (ja) * 1982-03-11 1983-09-16 Nippon Telegr & Teleph Corp <Ntt> 無機薄膜の製造方法
JP6708594B2 (ja) 2017-09-15 2020-06-10 日立建機株式会社 転圧機械

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856423A (de) * 1971-11-16 1973-08-08
JPS5133726A (ja) * 1974-09-17 1976-03-23 Hitachi Ltd Renzokuchuzoki
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
US4276368A (en) * 1979-05-04 1981-06-30 Bell Telephone Laboratories, Incorporated Photoinduced migration of silver into chalcogenide layer

Also Published As

Publication number Publication date
GB2078386A (en) 1982-01-06
DE3172493D1 (en) 1985-11-07
CA1166879A (en) 1984-05-08
KR830006021A (ko) 1983-09-17
ES502672A0 (es) 1982-04-01
JPS5723225A (en) 1982-02-06
IE811210L (en) 1981-12-03
EP0042109A3 (en) 1982-06-30
EP0042109A2 (de) 1981-12-23
IE51206B1 (en) 1986-10-29
GB2078386B (en) 1984-04-18
EP0042109B1 (de) 1985-10-02
ES8203549A1 (es) 1982-04-01

Similar Documents

Publication Publication Date Title
JP2654450B2 (ja) レジスト・パターンの形成方法
US4346164A (en) Photolithographic method for the manufacture of integrated circuits
JPS6358367B2 (de)
US6617265B2 (en) Photomask and method for manufacturing the same
KR100675782B1 (ko) 비 흡수 레티클 및 이를 제조하는 방법
Stevenson et al. The application of photolithography to the fabrication of microcircuits
US5679483A (en) Embedded phase shifting photomasks and method for manufacturing same
KR840001590B1 (ko) 석판 인쇄 공정
US20060134559A1 (en) Method for forming patterns on a semiconductor device
JP4696558B2 (ja) フォトレジストパターン形成方法、及びフォトレジストパターン形成用基板
JPH0446346A (ja) 半導体装置の製造方法
JP2002148809A (ja) レジスト基板の製造方法及びレジスト基板
JPH0527413A (ja) 露光装置用ホトマスク
KR100734672B1 (ko) 이머젼 리소그래피의 패턴형성방법
JPS6128940A (ja) 微細パタ−ン形成法及びその装置
CN115826362A (zh) 光刻方法及集成电路
JP3179127B2 (ja) パターン形成方法
JPH04338960A (ja) レジストパターンの形成方法
JPH06140297A (ja) レジスト塗布方法
KR100272519B1 (ko) 반도체소자의 패터닝방법
KR100277490B1 (ko) 반도체소자의미세패턴형성방법
KR100209366B1 (ko) 반도체 소자의 미세패턴 제조방법
JPH0419697B2 (de)
JPS60122933A (ja) パターン形成方法
Hertlein Practical photolithography for modern semiconductor production