DE3172493D1 - Lithographic process and resulting article - Google Patents

Lithographic process and resulting article

Info

Publication number
DE3172493D1
DE3172493D1 DE8181104277T DE3172493T DE3172493D1 DE 3172493 D1 DE3172493 D1 DE 3172493D1 DE 8181104277 T DE8181104277 T DE 8181104277T DE 3172493 T DE3172493 T DE 3172493T DE 3172493 D1 DE3172493 D1 DE 3172493D1
Authority
DE
Germany
Prior art keywords
lithographic process
resulting article
article
resulting
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181104277T
Other languages
English (en)
Inventor
King Lien Tai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of DE3172493D1 publication Critical patent/DE3172493D1/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0044Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8181104277T 1980-06-03 1981-06-03 Lithographic process and resulting article Expired DE3172493D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15602980A 1980-06-03 1980-06-03

Publications (1)

Publication Number Publication Date
DE3172493D1 true DE3172493D1 (en) 1985-11-07

Family

ID=22557781

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181104277T Expired DE3172493D1 (en) 1980-06-03 1981-06-03 Lithographic process and resulting article

Country Status (8)

Country Link
EP (1) EP0042109B1 (de)
JP (1) JPS5723225A (de)
KR (1) KR840001590B1 (de)
CA (1) CA1166879A (de)
DE (1) DE3172493D1 (de)
ES (1) ES502672A0 (de)
GB (1) GB2078386B (de)
IE (1) IE51206B1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155722A (ja) * 1982-03-11 1983-09-16 Nippon Telegr & Teleph Corp <Ntt> 無機薄膜の製造方法
JP6708594B2 (ja) 2017-09-15 2020-06-10 日立建機株式会社 転圧機械

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856423A (de) * 1971-11-16 1973-08-08
JPS5133726A (ja) * 1974-09-17 1976-03-23 Hitachi Ltd Renzokuchuzoki
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
US4276368A (en) * 1979-05-04 1981-06-30 Bell Telephone Laboratories, Incorporated Photoinduced migration of silver into chalcogenide layer

Also Published As

Publication number Publication date
EP0042109A3 (en) 1982-06-30
KR830006021A (ko) 1983-09-17
CA1166879A (en) 1984-05-08
JPS5723225A (en) 1982-02-06
IE811210L (en) 1981-12-03
ES8203549A1 (es) 1982-04-01
GB2078386B (en) 1984-04-18
KR840001590B1 (ko) 1984-10-11
EP0042109A2 (de) 1981-12-23
IE51206B1 (en) 1986-10-29
ES502672A0 (es) 1982-04-01
EP0042109B1 (de) 1985-10-02
GB2078386A (en) 1982-01-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN

8339 Ceased/non-payment of the annual fee