KR830006021A - 석판인쇄 공정 및 이 공정에 의한 제품 - Google Patents
석판인쇄 공정 및 이 공정에 의한 제품Info
- Publication number
- KR830006021A KR830006021A KR1019810001989A KR810001989A KR830006021A KR 830006021 A KR830006021 A KR 830006021A KR 1019810001989 A KR1019810001989 A KR 1019810001989A KR 810001989 A KR810001989 A KR 810001989A KR 830006021 A KR830006021 A KR 830006021A
- Authority
- KR
- South Korea
- Prior art keywords
- metal
- radiation
- product
- removal
- regions
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims 5
- 238000001459 lithography Methods 0.000 title claims 2
- 239000002184 metal Substances 0.000 claims 6
- 229910052751 metal Inorganic materials 0.000 claims 6
- 230000005855 radiation Effects 0.000 claims 4
- 239000011521 glass Substances 0.000 claims 3
- 239000007769 metal material Substances 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 238000009434 installation Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000004876 x-ray fluorescence Methods 0.000 claims 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Glass Compositions (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (1)
- 본문에서 설명된 바와 같이제품의 설비에 대한 공정이 적어도 한 단계의 석판인쇄 작업을 포함하며, 이러한 작업동안 제품이 적어도 일시적으로 유리층 및 이에 접촉한 원료금속재료를 포함하며, 상기 제품의 영역들은 방사공급원으로부터의 방사에 의하여 조사되어지며 명/암 공유영역에 의해선 분리된 영역들을 생성하도록 변조된 복사가 조사된 영역들내에서 우선적으로 상기 유리층내로 금속의 이전을 야기시키므로, 제거의 용이성이 다른 유리재료의 패턴을 정의하며 이러한 다른 제거의 용이성에 응답하는 현상제에 의해서 유리재료의 선택적인 제거가 이루어지는 것에 있어서, 방사 및 원료금속재료 내의 금속의 양은 x-ray형광에 의해서 측정된 바와 같이 노출된 영역들 내에세 최소 40펴센트 금속을 감소하도록 특정화되므로써, 금속이 증가된 연부정예도를 생성하도록 그리고 공유영역의 조명된 부분에서 금속을 증가시키도록 명/암 공유영역을 거쳐서 금속의 농도 기울기에 따라 측방향으로 확산하는 특성을 갖는 석판인쇄 공정 및 이 공정에 의한 제품.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15602980A | 1980-06-03 | 1980-06-03 | |
US156029 | 1980-06-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830006021A true KR830006021A (ko) | 1983-09-17 |
KR840001590B1 KR840001590B1 (ko) | 1984-10-11 |
Family
ID=22557781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019810001989A KR840001590B1 (ko) | 1980-06-03 | 1981-06-03 | 석판 인쇄 공정 |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0042109B1 (ko) |
JP (1) | JPS5723225A (ko) |
KR (1) | KR840001590B1 (ko) |
CA (1) | CA1166879A (ko) |
DE (1) | DE3172493D1 (ko) |
ES (1) | ES502672A0 (ko) |
GB (1) | GB2078386B (ko) |
IE (1) | IE51206B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58155722A (ja) * | 1982-03-11 | 1983-09-16 | Nippon Telegr & Teleph Corp <Ntt> | 無機薄膜の製造方法 |
JP6708594B2 (ja) | 2017-09-15 | 2020-06-10 | 日立建機株式会社 | 転圧機械 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4856423A (ko) * | 1971-11-16 | 1973-08-08 | ||
JPS5133726A (ja) * | 1974-09-17 | 1976-03-23 | Hitachi Ltd | Renzokuchuzoki |
JPS5565365A (en) * | 1978-11-07 | 1980-05-16 | Nippon Telegr & Teleph Corp <Ntt> | Pattern forming method |
US4276368A (en) * | 1979-05-04 | 1981-06-30 | Bell Telephone Laboratories, Incorporated | Photoinduced migration of silver into chalcogenide layer |
-
1981
- 1981-05-14 CA CA000377556A patent/CA1166879A/en not_active Expired
- 1981-06-01 ES ES502672A patent/ES502672A0/es active Granted
- 1981-06-02 GB GB8116861A patent/GB2078386B/en not_active Expired
- 1981-06-02 IE IE1210/81A patent/IE51206B1/en not_active IP Right Cessation
- 1981-06-03 DE DE8181104277T patent/DE3172493D1/de not_active Expired
- 1981-06-03 JP JP8451781A patent/JPS5723225A/ja active Pending
- 1981-06-03 KR KR1019810001989A patent/KR840001590B1/ko active
- 1981-06-03 EP EP81104277A patent/EP0042109B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE3172493D1 (en) | 1985-11-07 |
EP0042109A3 (en) | 1982-06-30 |
CA1166879A (en) | 1984-05-08 |
JPS5723225A (en) | 1982-02-06 |
IE811210L (en) | 1981-12-03 |
ES8203549A1 (es) | 1982-04-01 |
GB2078386B (en) | 1984-04-18 |
KR840001590B1 (ko) | 1984-10-11 |
EP0042109A2 (en) | 1981-12-23 |
IE51206B1 (en) | 1986-10-29 |
ES502672A0 (es) | 1982-04-01 |
EP0042109B1 (en) | 1985-10-02 |
GB2078386A (en) | 1982-01-06 |
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