ES8203549A1 - Procedimiento para la fabricacion de articulos mediante li- tografia - Google Patents

Procedimiento para la fabricacion de articulos mediante li- tografia

Info

Publication number
ES8203549A1
ES8203549A1 ES502672A ES502672A ES8203549A1 ES 8203549 A1 ES8203549 A1 ES 8203549A1 ES 502672 A ES502672 A ES 502672A ES 502672 A ES502672 A ES 502672A ES 8203549 A1 ES8203549 A1 ES 8203549A1
Authority
ES
Spain
Prior art keywords
silver
lithographic process
resulting article
acuity
photomigration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES502672A
Other languages
English (en)
Other versions
ES502672A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of ES8203549A1 publication Critical patent/ES8203549A1/es
Publication of ES502672A0 publication Critical patent/ES502672A0/es
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0044Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PROCEDIMIENTO PARA LA FABRICACION DE ARTICULOS MEDIANTE LITOGRAFIA. CONSTA DE UNA OPERACION DE LITOGRAFIA DURANTE LA CUAL EL ARTICULOS COMPRENDE, AL MENOS TEMPORALMENTE, UNA CAPA VITREA Y UN MATERIAL DE METAL FUENTE DE CONTACTO CON LA CAPA VITREA, EN EL CUAL SE IRRADIAN REGIONES DEL ARTICULO PRODUCIENDOSE REGIONES DEMARCADAS POR ZONAS INTERFACIALES DE LUZ/OSCURIDAD PARA PRODUCIR MIGRACION DEL METAL A LA CAPA VITREA, PRINCIPALMENTE DENTREO DE LAS REGIONES IRRADIADAS, DEFINIENDOSE UN MODELO DE MATERIAL VITREO CON UNA FACILIDAD DIFERENTE DE CAPACIDAD DE REMOCION.
ES502672A 1980-06-03 1981-06-01 Procedimiento para la fabricacion de articulos mediante li- tografia Granted ES502672A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15602980A 1980-06-03 1980-06-03

Publications (2)

Publication Number Publication Date
ES8203549A1 true ES8203549A1 (es) 1982-04-01
ES502672A0 ES502672A0 (es) 1982-04-01

Family

ID=22557781

Family Applications (1)

Application Number Title Priority Date Filing Date
ES502672A Granted ES502672A0 (es) 1980-06-03 1981-06-01 Procedimiento para la fabricacion de articulos mediante li- tografia

Country Status (8)

Country Link
EP (1) EP0042109B1 (es)
JP (1) JPS5723225A (es)
KR (1) KR840001590B1 (es)
CA (1) CA1166879A (es)
DE (1) DE3172493D1 (es)
ES (1) ES502672A0 (es)
GB (1) GB2078386B (es)
IE (1) IE51206B1 (es)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155722A (ja) * 1982-03-11 1983-09-16 Nippon Telegr & Teleph Corp <Ntt> 無機薄膜の製造方法
JP6708594B2 (ja) 2017-09-15 2020-06-10 日立建機株式会社 転圧機械

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856423A (es) * 1971-11-16 1973-08-08
JPS5133726A (ja) * 1974-09-17 1976-03-23 Hitachi Ltd Renzokuchuzoki
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
US4276368A (en) * 1979-05-04 1981-06-30 Bell Telephone Laboratories, Incorporated Photoinduced migration of silver into chalcogenide layer

Also Published As

Publication number Publication date
KR840001590B1 (ko) 1984-10-11
GB2078386A (en) 1982-01-06
IE51206B1 (en) 1986-10-29
EP0042109A3 (en) 1982-06-30
KR830006021A (ko) 1983-09-17
JPS5723225A (en) 1982-02-06
CA1166879A (en) 1984-05-08
EP0042109B1 (en) 1985-10-02
GB2078386B (en) 1984-04-18
ES502672A0 (es) 1982-04-01
DE3172493D1 (en) 1985-11-07
EP0042109A2 (en) 1981-12-23
IE811210L (en) 1981-12-03

Similar Documents

Publication Publication Date Title
ES2032449T3 (es) Estratificados opacos polimeros en pelicula.
EP0238362A3 (en) Mask-surrogate semiconductor process employing dopant-opaque region
EP0266654A3 (en) Light sensitive composition, material containing it and process for producing positive or negative relief copies by using this material
JPS56126916A (en) Manufacture of semiconductor device
ES8203549A1 (es) Procedimiento para la fabricacion de articulos mediante li- tografia
FR2555362B1 (fr) Procede et dispositif de traitement d&#39;un materiau semi-conducteur, par plasma
FR2338902A1 (fr) Procede d&#39;evacuation d&#39;effluents contenant des ions ammonium et sulfate et des substances organiques
EP0304969A3 (en) Process for forming a pattern film
JPS5332735A (en) Processing method for use in silver halide color photographic light sensitive material
JPS5461931A (en) Forming method of photo resist patterns
BR8201402A (pt) Pelicula fina,e,processo para obturar orificios diminutos em peliculas finas
JPS57192027A (en) Forming method of photosensitive resin window
JPS5726467A (en) Manufacture of semiconductor device
EP0282201A3 (en) Pattern forming method
CA2090468A1 (en) Silver recovery process
JPS5742043A (en) Photosensitive material
JPS57147634A (en) Photomask blank
DK371781A (da) Fremgangsmaade til immobilisering af globulaere mikrobeceller ved adhaesion til en fast baerer
FR2562835B1 (fr) Procede et dispositif pour la fabrication de film etirable pour la palettisation
JPS5646230A (en) Exposing method
FR2562456B1 (fr) Procede et dispositif de traitement de surface d&#39;un barreau en verre.
IT7805214A0 (it) Pendente in metallo, preferibilmente prezioso, con pellicola, riproducente motivi ornamentali, trattata secondo il processo dei cristalli liquidi, o trattata secondo processi che attuano lo stesso effetto.
JPS5382444A (en) Surface treating method of liquid crystal panel
JPS6444935A (en) Pattern forming method
Visser Production of Flat Formed Components by the Spray Etching Process

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20010203