KR830001767B1 - 비소멸성 정지형 등속호출 기억장치 - Google Patents
비소멸성 정지형 등속호출 기억장치 Download PDFInfo
- Publication number
- KR830001767B1 KR830001767B1 KR1019800000256A KR800000256A KR830001767B1 KR 830001767 B1 KR830001767 B1 KR 830001767B1 KR 1019800000256 A KR1019800000256 A KR 1019800000256A KR 800000256 A KR800000256 A KR 800000256A KR 830001767 B1 KR830001767 B1 KR 830001767B1
- Authority
- KR
- South Korea
- Prior art keywords
- destructive
- floating gate
- memory
- ram
- capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000015654 memory Effects 0.000 title claims description 66
- 238000007667 floating Methods 0.000 claims description 103
- 230000001066 destructive effect Effects 0.000 claims description 85
- 239000012634 fragment Substances 0.000 claims description 46
- 238000003860 storage Methods 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 claims description 19
- 230000008878 coupling Effects 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 14
- 238000005859 coupling reaction Methods 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 5
- 230000003362 replicative effect Effects 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 48
- 239000000758 substrate Substances 0.000 description 35
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 27
- 229920005591 polysilicon Polymers 0.000 description 26
- 230000005641 tunneling Effects 0.000 description 12
- 230000003068 static effect Effects 0.000 description 10
- 230000008033 biological extinction Effects 0.000 description 9
- 238000005520 cutting process Methods 0.000 description 9
- 238000007796 conventional method Methods 0.000 description 8
- 230000005684 electric field Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000009825 accumulation Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000008034 disappearance Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000027756 respiratory electron transport chain Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C14/00—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
- H10D30/683—Floating-gate IGFETs having only two programming levels programmed by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
- Static Random-Access Memory (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/006,029 US4300212A (en) | 1979-01-24 | 1979-01-24 | Nonvolatile static random access memory devices |
US6029 | 2001-12-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR830001767B1 true KR830001767B1 (ko) | 1983-09-03 |
Family
ID=21718940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019800000256A Expired KR830001767B1 (ko) | 1979-01-24 | 1980-01-24 | 비소멸성 정지형 등속호출 기억장치 |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS55101192A (enrdf_load_stackoverflow) |
KR (1) | KR830001767B1 (enrdf_load_stackoverflow) |
BE (1) | BE881329A (enrdf_load_stackoverflow) |
DE (1) | DE3002492A1 (enrdf_load_stackoverflow) |
FR (1) | FR2447587B1 (enrdf_load_stackoverflow) |
GB (1) | GB2042296B (enrdf_load_stackoverflow) |
NL (1) | NL192015C (enrdf_load_stackoverflow) |
SE (1) | SE8000392L (enrdf_load_stackoverflow) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4486769A (en) * | 1979-01-24 | 1984-12-04 | Xicor, Inc. | Dense nonvolatile electrically-alterable memory device with substrate coupling electrode |
WO1980001965A1 (en) * | 1979-03-13 | 1980-09-18 | Ncr Co | Static volatile/non-volatile ram system |
JPS57199264A (en) * | 1981-06-03 | 1982-12-07 | Toshiba Corp | Semiconductor memory |
JPS57199265A (en) * | 1981-06-03 | 1982-12-07 | Toshiba Corp | Semiconductor memory |
US4388704A (en) * | 1980-09-30 | 1983-06-14 | International Business Machines Corporation | Non-volatile RAM cell with enhanced conduction insulators |
JPS5792865A (en) * | 1980-11-29 | 1982-06-09 | Toshiba Corp | Manufacture of semiconductor memory device |
JPS5792490A (en) * | 1980-11-29 | 1982-06-09 | Toshiba Corp | Semiconductor storage device |
GB2094086B (en) * | 1981-03-03 | 1985-08-14 | Tokyo Shibaura Electric Co | Non-volatile semiconductor memory system |
JPS60185297A (ja) * | 1984-03-02 | 1985-09-20 | Fujitsu Ltd | 不揮発性ランダムアクセスメモリ装置 |
US4630238A (en) * | 1983-10-14 | 1986-12-16 | Fujitsu Limited | Semiconductor memory device |
JPH0638502B2 (ja) * | 1984-06-13 | 1994-05-18 | セイコー電子工業株式会社 | 不揮発性ram |
US4616245A (en) * | 1984-10-29 | 1986-10-07 | Ncr Corporation | Direct-write silicon nitride EEPROM cell |
JPS61225860A (ja) * | 1985-03-30 | 1986-10-07 | Toshiba Corp | 半導体記憶装置 |
JPH07120716B2 (ja) * | 1985-03-30 | 1995-12-20 | 株式会社東芝 | 半導体記憶装置 |
JPH01214993A (ja) * | 1988-02-23 | 1989-08-29 | Nissan Motor Co Ltd | データ記憶装置 |
DE10211337B4 (de) * | 2002-03-14 | 2009-12-31 | Infineon Technologies Ag | Schaltkreis-Anordnung und Verfahren zum Betreiben einer Schaltkreis-Anordnung |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4070655A (en) * | 1976-11-05 | 1978-01-24 | The United States Of America As Represented By The Secretary Of The Air Force | Virtually nonvolatile static random access memory device |
US4099196A (en) * | 1977-06-29 | 1978-07-04 | Intel Corporation | Triple layer polysilicon cell |
US4128773A (en) * | 1977-11-07 | 1978-12-05 | Hughes Aircraft Company | Volatile/non-volatile logic latch circuit |
-
1980
- 1980-01-16 GB GB8001429A patent/GB2042296B/en not_active Expired
- 1980-01-17 SE SE8000392A patent/SE8000392L/ not_active Application Discontinuation
- 1980-01-23 FR FR8001399A patent/FR2447587B1/fr not_active Expired
- 1980-01-23 NL NL8000435A patent/NL192015C/xx not_active IP Right Cessation
- 1980-01-24 KR KR1019800000256A patent/KR830001767B1/ko not_active Expired
- 1980-01-24 BE BE0/199093A patent/BE881329A/fr not_active IP Right Cessation
- 1980-01-24 JP JP738980A patent/JPS55101192A/ja active Granted
- 1980-01-24 DE DE19803002492 patent/DE3002492A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
DE3002492A1 (de) | 1980-07-31 |
JPH0115959B2 (enrdf_load_stackoverflow) | 1989-03-22 |
FR2447587B1 (fr) | 1986-02-28 |
FR2447587A1 (fr) | 1980-08-22 |
NL192015C (nl) | 1996-12-03 |
JPS55101192A (en) | 1980-08-01 |
SE8000392L (sv) | 1980-07-25 |
NL8000435A (nl) | 1980-07-28 |
BE881329A (fr) | 1980-05-16 |
DE3002492C2 (enrdf_load_stackoverflow) | 1990-12-20 |
GB2042296A (en) | 1980-09-17 |
NL192015B (nl) | 1996-08-01 |
GB2042296B (en) | 1983-05-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19800124 |
|
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19830323 Patent event code: PE09021S01D |
|
PG1605 | Publication of application before grant of patent |
Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19830730 |
|
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19831116 |
|
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 19831213 Patent event code: PR07011E01D |
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PR1002 | Payment of registration fee |
Payment date: 19831213 End annual number: 3 Start annual number: 1 |
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PR1001 | Payment of annual fee |
Payment date: 19860821 Start annual number: 4 End annual number: 4 |
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PR1001 | Payment of annual fee |
Payment date: 19871013 Start annual number: 5 End annual number: 5 |
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Payment date: 19900830 Start annual number: 8 End annual number: 8 |
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PR1001 | Payment of annual fee |
Payment date: 19910729 Start annual number: 9 End annual number: 9 |
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Payment date: 19920821 Start annual number: 10 End annual number: 10 |
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Payment date: 19930811 Start annual number: 11 End annual number: 11 |
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Payment date: 19940829 Start annual number: 12 End annual number: 12 |
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PC1801 | Expiration of term |