KR20230114197A - 열처리 장치, 열처리 방법 - Google Patents
열처리 장치, 열처리 방법 Download PDFInfo
- Publication number
- KR20230114197A KR20230114197A KR1020230004193A KR20230004193A KR20230114197A KR 20230114197 A KR20230114197 A KR 20230114197A KR 1020230004193 A KR1020230004193 A KR 1020230004193A KR 20230004193 A KR20230004193 A KR 20230004193A KR 20230114197 A KR20230114197 A KR 20230114197A
- Authority
- KR
- South Korea
- Prior art keywords
- opening
- chamber
- heater
- closing door
- heat treatment
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 84
- 238000000034 method Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 abstract description 13
- 230000005855 radiation Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 89
- 239000000112 cooling gas Substances 0.000 description 25
- 239000002245 particle Substances 0.000 description 11
- 238000001816 cooling Methods 0.000 description 6
- 238000007599 discharging Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/0013—Controlling the temperature of the process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
- B05D3/0426—Cooling with air
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Furnace Details (AREA)
- Furnace Housings, Linings, Walls, And Ceilings (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2022-008471 | 2022-01-24 | ||
| JP2022008471A JP2023107329A (ja) | 2022-01-24 | 2022-01-24 | 熱処理装置、熱処理方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230114197A true KR20230114197A (ko) | 2023-08-01 |
Family
ID=87210817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020230004193A KR20230114197A (ko) | 2022-01-24 | 2023-01-11 | 열처리 장치, 열처리 방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2023107329A (ja) |
| KR (1) | KR20230114197A (ja) |
| CN (1) | CN116475034A (ja) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019117250A (ja) | 2017-12-27 | 2019-07-18 | 京セラドキュメントソリューションズ株式会社 | 画像形成装置 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4210788B2 (ja) * | 2002-09-24 | 2009-01-21 | 株式会社協真エンジニアリング | 加工装置の扉開閉装置 |
| JP3718806B2 (ja) * | 2003-01-16 | 2005-11-24 | エスペック株式会社 | スライドスリット式熱処理装置 |
| EP1801529B1 (en) * | 2004-09-16 | 2010-03-10 | IHI Corporation | Change-over apparatus for cooling gas passages in vacuum heat treatment furnace |
| DE102012103275A1 (de) * | 2012-04-16 | 2013-10-17 | Benteler Automobiltechnik Gmbh | Schichtofenanlage sowie Verfahren zum Betreiben der Schichtofenanlage |
| JP5861080B2 (ja) * | 2012-04-26 | 2016-02-16 | パナソニックＩｐマネジメント株式会社 | 熱風循環式加熱装置 |
| KR101982726B1 (ko) * | 2013-04-16 | 2019-05-27 | 주식회사 탑 엔지니어링 | 기판 열처리 장치 |
| CN203704561U (zh) * | 2013-11-22 | 2014-07-09 | 深圳市腾达工业自动设备有限公司 | 一种三门真空烤箱 |
| TWI698944B (zh) * | 2013-12-23 | 2020-07-11 | 南韓商圓益Ｉｐｓ股份有限公司 | 批量式基板處理裝置 |
| TWI703637B (zh) * | 2016-03-08 | 2020-09-01 | 瑞士商艾維太克股份有限公司 | 熱處理腔室、包括該腔室之設備、工件處理系統及製造熱處理工件的方法 |
| CN205607042U (zh) * | 2016-03-29 | 2016-09-28 | 徐州伊维达技术有限公司 | 机械手制样密封恒温烘箱 |
| KR101796294B1 (ko) * | 2016-06-17 | 2017-11-15 | 주식회사 테라세미콘 | 기판처리 장치 |
| JP6871959B2 (ja) * | 2018-03-30 | 2021-05-19 | 芝浦メカトロニクス株式会社 | 有機膜形成装置、および有機膜の製造方法 |
| KR102226624B1 (ko) * | 2018-03-30 | 2021-03-12 | 시바우라 메카트로닉스 가부시끼가이샤 | 유기막 형성 장치, 및 유기막의 제조 방법 |
| KR101935806B1 (ko) * | 2018-05-31 | 2019-01-07 | 아진산업(주) | 멀티 챔버형 가열기 |
| CN108895805A (zh) * | 2018-06-07 | 2018-11-27 | 广州四为科技有限公司 | 烘干炉 |
| CN111326447B (zh) * | 2018-12-17 | 2023-08-04 | 圆益Ips股份有限公司 | 基板处理装置 |
| CN209655776U (zh) * | 2019-01-19 | 2019-11-19 | 江苏盛达飞建筑材料有限公司 | 一种恒温干燥箱 |
| JP7079044B2 (ja) * | 2019-05-31 | 2022-06-01 | 株式会社九州日昌 | 加熱装置および加熱方法 |
| CN112611176A (zh) * | 2020-12-18 | 2021-04-06 | 邦达诚环境监测中心（江苏）有限公司 | 一种可倒挂式节能烘箱 |
-
2022
- 2022-01-24 JP JP2022008471A patent/JP2023107329A/ja active Pending
-
2023
- 2023-01-11 KR KR1020230004193A patent/KR20230114197A/ko unknown
- 2023-01-18 CN CN202310059026.2A patent/CN116475034A/zh active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019117250A (ja) | 2017-12-27 | 2019-07-18 | 京セラドキュメントソリューションズ株式会社 | 画像形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116475034A (zh) | 2023-07-25 |
| JP2023107329A (ja) | 2023-08-03 |
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