JP2019520701A - 12面形の移送チャンバ、及び、かかる移送チャンバを有する処理システム - Google Patents
12面形の移送チャンバ、及び、かかる移送チャンバを有する処理システム Download PDFInfo
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- JP2019520701A JP2019520701A JP2018562289A JP2018562289A JP2019520701A JP 2019520701 A JP2019520701 A JP 2019520701A JP 2018562289 A JP2018562289 A JP 2018562289A JP 2018562289 A JP2018562289 A JP 2018562289A JP 2019520701 A JP2019520701 A JP 2019520701A
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- chamber
- transfer
- substrate
- transfer chamber
- load lock
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- 238000012546 transfer Methods 0.000 title claims abstract description 200
- 238000012545 processing Methods 0.000 title claims abstract description 153
- 239000000758 substrate Substances 0.000 claims abstract description 189
- 239000012636 effector Substances 0.000 claims abstract description 46
- 238000000034 method Methods 0.000 claims abstract description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910004541 SiN Inorganic materials 0.000 claims description 2
- 230000008569 process Effects 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 210000000707 wrist Anatomy 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000012800 visualization Methods 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 239000013529 heat transfer fluid Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000001010 compromised effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
大面積基板は、フラットパネルディスプレイ(すなわち、LCD、OLED、及びその他の種類のフラットパネルディスプレイ)やソーラーパネルなどを製造するために使用される。大面積基板は、通常、様々な堆積、エッチング、プラズマ処理、並びに、その他の回路及び/又はデバイスの製造プロセスが実施される、一又は複数の真空処理チャンバ内で処理される。真空処理チャンバ同士は、典型的には、共通の一真空移送チャンバによって連結されており、この真空移送チャンバは、種々の真空処理チャンバ間で基板を移送するロボットを包含する。移送チャンバと、この移送チャンバに接続された他のチャンバ(処理チャンバなど)との集合体は、処理システムと称されることが多い。
Claims (15)
- 移送チャンバであって、
リッドと、
前記リッドの反対側に配置された底部と、
前記リッドと前記底部とを密封連結し、かつ内部空間を画定している複数の側壁であって、別のチャンバに連結するよう構成された12の面を含み、各面が、当該各面を貫通して形成された開口であって、基板が通過可能に構成されている開口を有する、複数の側壁と、
前記内部空間の中に配置された移送ロボットであって、前記開口を通して基板を移送するよう構成された少なくとも1つのエフェクタを有する、移送ロボットとを備える、移送チャンバ。 - 前記移送ロボットが、
上側エンドエフェクタ及び下側エンドエフェクタを備え、各エンドエフェクタが当該各エンドエフェクタ上に基板を支持するよう構成されており、前記移送ロボットの前記上側エンドエフェクタ及び前記下側エンドエフェクタは、水平方向に少なくとも約5000ミリメートルの距離だけ伸張し、かつ、垂直方向に少なくとも約540ミリメートルの距離だけ動きうる 、請求項1に記載の移送チャンバ。 - 複数の基板を処理するための処理システムであって
リッドと、
前記リッドの反対側に配置された底部と、
前記リッドと前記底部とを密封連結し、かつ内部空間を画定している複数の側壁であって、別のチャンバに連結するよう構成された12の面を含み、各面が、当該各面を貫通して形成された開口であって、基板が通過可能に構成されている開口を有する、複数の側壁と、
前記内部空間の中に配置された移送ロボットであって、前記開口を通して基板を移送するよう構成された少なくとも1つのエフェクタを有する、移送ロボットとを備える、移送チャンバ、
前記移送チャンバの前記面のうちの1つに連結され、かつ開口を有する第1ロードロックチャンバであって、前記第1ロードロックチャンバの前記開口は、前記第1ロードロックチャンバと前記移送チャンバとの間での基板の移送を可能にするために、前記移送チャンバの前記開口のうちの1つと位置が合っている、第1ロードロックチャンバ、
前記移送チャンバの前記面のうちの1つに連結され、かつ開口を有するマスクチャンバであって、前記マスクチャンバの前記開口は、前記マスクチャンバと前記移送チャンバとの間でのマスクの移送を可能にするために、前記移送チャンバの前記開口のうちの1つと位置が合っている、マスクチャンバ、及び、
前記移送チャンバの前記面のうちの1つに連結された複数の処理チャンバ であって、各々が、前記処理チャンバと前記移送チャンバとの間での基板及びマスクの移送を可能にするために、前記移送チャンバの前記開口のうちの1つと位置合わせされた開口を有する、複数の処理チャンバを備える、処理システム。 - 開口を有するバッファチャンバを更に備え、前記開口は前記移送チャンバの前記開口のうちの1つと位置が合っており、前記バッファチャンバは、真空環境で5つ以上の基板を保持するよう構成されている、請求項3に記載の処理システム。
- 前記移送ロボットが、別々の基板を支持するための上側エンドエフェクタと下側エンドエフェクタとを有する、請求項3に記載の処理システム又は請求項1に記載の移送チャンバ 。
- 前記移送ロボットが、少なくとも約5000ミリメートルだけ基板を水平に動かし、かつ、少なくとも約540ミリメートルだけ基板を垂直に動かすよう構成されている、請求項5に記載の処理システム。
- 前記移送チャンバの前記内部空間に流体連結されている真空ポンプを更に備え、前記真空ポンプは、前記内部空間の中に約10Torr〜約50mTorrの雰囲気を創出するよう動作可能である、請求項3に記載の処理システム又は請求項1に記載の移送チャンバ。
- 前記移送チャンバの前記面のうちの1つに連結され、かつ開口を有する第2ロードロックチャンバであって、前記第2ロードロックチャンバの前記開口は、前記第2ロードロックチャンバと前記移送チャンバとの間での基板の移送を可能にするために、前記移送チャンバの前記開口のうちの1つと位置が合っている、第2ロードロックチャンバを更に備える、請求項3に記載の処理システム。
- 前記第2ロードロックチャンバは2つの基板受容キャビティを伴って構成され、前記第1ロードロックチャンバは単一の基板受容キャビティを伴って構成されている、請求項8に記載の処理システム。
- 各面を貫通して形成されている前記開口が、約925mmを上回る幅を有する、請求項3に記載の処理システム又は請求項1に記載の移送チャンバ。
- 前記複数の処理チャンバが、SiO2、SiON、及びSiNからなる群から選択されたケイ素含有膜を堆積させるよう構成されている、請求項3に記載の処理システム。
- 複数の基板を処理する方法であって、
処理システムの移送チャンバに7つの基板を移送することと、
前記移送チャンバに直接取り付けられた7つの別個の処理チャンバ内で、前記7つの基板にケイ素含有膜を堆積させることと、
前記ケイ素含有膜堆積物だけを堆積させた後に、前記移送チャンバに連結されたロードロックチャンバ内へと、前記7つの基板を移送することとを含む、方法。 - 前記ケイ素含有膜がSiO2、SiON、SiNのうちの1つである、請求項12に記載の方法。
- 前記7つの基板のうちの一又は複数をバッファチャンバに移送することを更に含む、請求項12に記載の方法。
- マスクを、前記移送チャンバに直接取り付けられたマスクチャンバから、前記処理チャンバのうちの一又は複数に移送することと、
前記マスク及び前記基板を、前記移送チャンバ内に配置された共通の移送チャンバロボットで移送することとを更に含む、請求項12に記載の方法。
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US15/171,783 US20170352562A1 (en) | 2016-06-02 | 2016-06-02 | Dodecadon transfer chamber and processing system having the same |
US15/171,783 | 2016-06-02 | ||
PCT/US2017/030516 WO2017209881A1 (en) | 2016-06-02 | 2017-05-02 | Dodecadon transfer chamber and processing system having the same |
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